Eiji Yoshida

624 total citations
34 papers, 458 citations indexed

About

Eiji Yoshida is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Computer Networks and Communications. According to data from OpenAlex, Eiji Yoshida has authored 34 papers receiving a total of 458 indexed citations (citations by other indexed papers that have themselves been cited), including 20 papers in Electrical and Electronic Engineering, 9 papers in Atomic and Molecular Physics, and Optics and 8 papers in Computer Networks and Communications. Recurrent topics in Eiji Yoshida's work include Semiconductor materials and devices (11 papers), Advancements in Semiconductor Devices and Circuit Design (8 papers) and Advanced Data Storage Technologies (6 papers). Eiji Yoshida is often cited by papers focused on Semiconductor materials and devices (11 papers), Advancements in Semiconductor Devices and Circuit Design (8 papers) and Advanced Data Storage Technologies (6 papers). Eiji Yoshida collaborates with scholars based in Japan and Taiwan. Eiji Yoshida's co-authors include Tetsu Tanaka, Mitsuhisa Ikeda, Seiichi Miyazaki, Yasuo Hamamoto, M. Hirose, Hong Gao, T. Miyashita, H. Takauchi, Shuichi Satoh and Toshihiko Mori and has published in prestigious journals such as Chemical Engineering Science, IEEE Journal of Solid-State Circuits and Journal of Chemical Theory and Computation.

In The Last Decade

Eiji Yoshida

29 papers receiving 441 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Eiji Yoshida Japan 12 383 108 93 74 17 34 458
K. Ando Japan 10 397 1.0× 137 1.3× 44 0.5× 69 0.9× 10 0.6× 27 459
M. Aldegunde United Kingdom 16 609 1.6× 86 0.8× 114 1.2× 146 2.0× 8 0.5× 66 678
T. Horiuchi Japan 12 764 2.0× 52 0.5× 79 0.8× 66 0.9× 22 1.3× 51 820
Miriam Reshotko United States 11 585 1.5× 77 0.7× 218 2.3× 80 1.1× 20 1.2× 22 646
S. Mudanai United States 16 809 2.1× 51 0.5× 92 1.0× 78 1.1× 15 0.9× 37 835
K. V. R. M. Murali United States 17 639 1.7× 84 0.8× 220 2.4× 112 1.5× 4 0.2× 36 823
M. Togo Japan 14 599 1.6× 66 0.6× 62 0.7× 69 0.9× 19 1.1× 68 619
B. Lakshmi India 10 250 0.7× 29 0.3× 75 0.8× 70 0.9× 17 1.0× 42 325
Shun Fujii Japan 14 397 1.0× 59 0.5× 408 4.4× 57 0.8× 22 1.3× 53 512

Countries citing papers authored by Eiji Yoshida

Since Specialization
Citations

This map shows the geographic impact of Eiji Yoshida's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Eiji Yoshida with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Eiji Yoshida more than expected).

Fields of papers citing papers by Eiji Yoshida

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Eiji Yoshida. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Eiji Yoshida. The network helps show where Eiji Yoshida may publish in the future.

Co-authorship network of co-authors of Eiji Yoshida

This figure shows the co-authorship network connecting the top 25 collaborators of Eiji Yoshida. A scholar is included among the top collaborators of Eiji Yoshida based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Eiji Yoshida. Eiji Yoshida is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
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Yoshida, Eiji, et al.. (2025). Segmentation of PEM fuel cell catalyst layer via electrospray deposition. Chemical Engineering Science. 316. 121898–121898.
3.
Gao, Hong, et al.. (2024). Distributed Implementation of Full Configuration Interaction for One Trillion Determinants. Journal of Chemical Theory and Computation. 20(3). 1185–1192. 31 indexed citations
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Yoshida, Eiji, et al.. (2023). Offline Quantum Circuit Pruning for Quantum Chemical Calculations. 5. 349–355. 1 indexed citations
6.
Yoshida, Eiji, et al.. (2020). Proposal of Profile and Event Sharing by Agent Communication. 6 3. 178–185. 1 indexed citations
7.
Yoshida, Eiji, et al.. (2019). Reducing CPU Power Consumption with Device Utilization-Aware DVFS for Low-Latency SSDs. IEICE Transactions on Information and Systems. E102.D(9). 1740–1749. 2 indexed citations
8.
Yoshida, Eiji. (2014). Efforts to Reuse Software Assets. NTT technical review. 12(12). 24–27. 1 indexed citations
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Yoshida, Eiji, H. Takauchi, Yoichi Kawano, et al.. (2014). A 1.95 GHz Fully Integrated Envelope Elimination and Restoration CMOS Power Amplifier Using Timing Alignment Technique for WCDMA and LTE. IEEE Journal of Solid-State Circuits. 49(12). 2915–2924. 35 indexed citations
11.
Yoshida, Eiji, et al.. (2008). A Very Wideband Active RC Polyphase Filter with Minimum Element Value Spread Using Fully Balanced OTA Based on CMOS Inverters. IEICE Transactions on Electronics. E91-C(6). 879–886. 4 indexed citations
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Yoshida, Eiji, et al.. (2006). Direct measurement of carrier profiles in operating sub-30-nm N-MOSFETs. 22. 894–897. 2 indexed citations
16.
Takahashi, H., et al.. (2002). 600 V CSTBT having ultra low on-state voltage. 445–448. 13 indexed citations
17.
Miyazaki, Seiichi, Yasuo Hamamoto, Eiji Yoshida, Mitsuhisa Ikeda, & M. Hirose. (2000). Control of self-assembling formation of nanometer silicon dots by low pressure chemical vapor deposition. Thin Solid Films. 369(1-2). 55–59. 101 indexed citations
18.
Yoshida, Eiji, et al.. (1991). Multiphoton Ionization of RbCsin the Wavelength Range 540-620 nm. Journal of the Physical Society of Japan. 60(9). 2907–2913. 3 indexed citations
19.
Yoshida, Eiji, et al.. (1990). Two-Photon Ionization of Cs2in the Wavelength Range 5300-6200 Å. Journal of the Physical Society of Japan. 59(6). 1981–1986. 4 indexed citations
20.
Iwaki, Kentaro, et al.. (1990). Behavior of allowed (43D-23P) and forbidden (43F-23P) components of the He 4472 A line in high electron density He Z-pinch plasmas. Journal of Physics B Atomic Molecular and Optical Physics. 23(7). 1129–1137. 13 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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