E. Steve Putna

875 total citations
17 papers, 683 citations indexed

About

E. Steve Putna is a scholar working on Materials Chemistry, Surfaces, Coatings and Films and Electrical and Electronic Engineering. According to data from OpenAlex, E. Steve Putna has authored 17 papers receiving a total of 683 indexed citations (citations by other indexed papers that have themselves been cited), including 9 papers in Materials Chemistry, 8 papers in Surfaces, Coatings and Films and 8 papers in Electrical and Electronic Engineering. Recurrent topics in E. Steve Putna's work include Catalytic Processes in Materials Science (9 papers), Advancements in Photolithography Techniques (8 papers) and Electron and X-Ray Spectroscopy Techniques (8 papers). E. Steve Putna is often cited by papers focused on Catalytic Processes in Materials Science (9 papers), Advancements in Photolithography Techniques (8 papers) and Electron and X-Ray Spectroscopy Techniques (8 papers). E. Steve Putna collaborates with scholars based in United States and Japan. E. Steve Putna's co-authors include Raymond J. Gorte, John M. Vohs, T. Bunluesin, George W. Graham, Todd R. Younkin, Manish Chandhok, T. Egami, Xudong Fan, Rollin Lakis and Román Caudillo and has published in prestigious journals such as Langmuir, Applied Catalysis B: Environmental and The Journal of Physical Chemistry.

In The Last Decade

E. Steve Putna

17 papers receiving 650 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
E. Steve Putna United States 12 575 413 154 129 101 17 683
Christoph Gleichweit Germany 14 595 1.0× 204 0.5× 174 1.1× 112 0.9× 48 0.5× 19 682
M. Cabala Czechia 10 417 0.7× 171 0.4× 117 0.8× 122 0.9× 38 0.4× 17 461
А. М. Сорокин Russia 10 317 0.6× 97 0.2× 132 0.9× 76 0.6× 53 0.5× 27 400
M. M. Guraya Argentina 12 282 0.5× 140 0.3× 109 0.7× 23 0.2× 52 0.5× 19 354
Martin Datler Austria 7 281 0.5× 96 0.2× 73 0.5× 129 1.0× 51 0.5× 8 381
J. G. Chen United States 10 343 0.6× 62 0.2× 141 0.9× 205 1.6× 46 0.5× 12 442
E. Ehret France 13 257 0.4× 74 0.2× 103 0.7× 79 0.6× 83 0.8× 29 405
Sabrina M. Gericke Sweden 10 203 0.4× 75 0.2× 168 1.1× 177 1.4× 29 0.3× 24 369
Yasheng Maimaiti Ireland 7 304 0.5× 63 0.2× 169 1.1× 72 0.6× 24 0.2× 7 391
Srivats Rajasekaran United States 6 288 0.5× 57 0.1× 105 0.7× 111 0.9× 17 0.2× 7 359

Countries citing papers authored by E. Steve Putna

Since Specialization
Citations

This map shows the geographic impact of E. Steve Putna's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by E. Steve Putna with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites E. Steve Putna more than expected).

Fields of papers citing papers by E. Steve Putna

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by E. Steve Putna. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by E. Steve Putna. The network helps show where E. Steve Putna may publish in the future.

Co-authorship network of co-authors of E. Steve Putna

This figure shows the co-authorship network connecting the top 25 collaborators of E. Steve Putna. A scholar is included among the top collaborators of E. Steve Putna based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with E. Steve Putna. E. Steve Putna is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

17 of 17 papers shown
1.
Putna, E. Steve, et al.. (2011). EUV Resist Testing Status and Post Lithography LWR Reduction. Journal of Photopolymer Science and Technology. 24(2). 127–136. 6 indexed citations
2.
Kloster, Grant M., et al.. (2010). Printability of extreme ultraviolet lithography mask pattern defects for 22-40 nm half-pitch features. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7636. 76360M–76360M. 4 indexed citations
3.
Putna, E. Steve, et al.. (2010). EUV mask defect inspection and defect review strategies for EUV pilot line and high volume manufacturing. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7636. 76361D–76361D. 7 indexed citations
4.
Putna, E. Steve, Todd R. Younkin, Román Caudillo, & Manish Chandhok. (2010). EUV lithography for 22nm half pitch and beyond: exploring resolution, LWR, and sensitivity tradeoffs. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7636. 76360P–76360P. 22 indexed citations
5.
Chandhok, Manish, E. Steve Putna, Todd R. Younkin, et al.. (2009). Demonstration of full-field patterning of 32 nm test chips using EUVL. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7271. 727116–727116. 8 indexed citations
6.
Putna, E. Steve, et al.. (2009). EUV lithography for 30nm half pitch and beyond: exploring resolution, sensitivity, and LWR tradeoffs. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7273. 72731L–72731L. 21 indexed citations
7.
Blackwell, James M., et al.. (2009). Aryl sulfonates as neutral photoacid generators (PAGs) for EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7273. 72733R–72733R. 5 indexed citations
8.
Chandhok, Manish, E. Steve Putna, Todd R. Younkin, et al.. (2008). Improvement in linewidth roughness by postprocessing. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 26(6). 2265–2270. 30 indexed citations
9.
Putna, E. Steve, T. Bunluesin, Xudong Fan, et al.. (1999). Ceria films on zirconia substrates: models for understanding oxygen-storage properties. Catalysis Today. 50(2). 343–352. 96 indexed citations
10.
Putna, E. Steve, Raymond J. Gorte, John M. Vohs, & George W. Graham. (1998). Evidence for Enhanced Dissociation of CO on Rh/Ceria. Journal of Catalysis. 178(2). 598–603. 49 indexed citations
11.
Putna, E. Steve, John M. Vohs, Raymond J. Gorte, & George W. Graham. (1998). An examination of praseodymia as an oxygen‐storage component in three‐way catalysts. Catalysis Letters. 54(1-2). 17–21. 28 indexed citations
12.
Putna, E. Steve, et al.. (1998). Adsorption and reactivity of lanthana with CO. Applied Catalysis B: Environmental. 17(1-2). 101–106. 15 indexed citations
13.
Putna, E. Steve, John M. Vohs, & Raymond J. Gorte. (1997). Characterization of ceria films on α-Al2O3(0001) and polycrystalline zirconia using O2 TPD with labeled 18O2. Catalysis Letters. 45(3-4). 143–147. 35 indexed citations
14.
Putna, E. Steve, John M. Vohs, & Raymond J. Gorte. (1997). Oxygen desorption from α-Al2O3 (0001) supported Rh, Pt and Pd particles. Surface Science. 391(1-3). L1178–L1182. 44 indexed citations
15.
Putna, E. Steve, John M. Vohs, & Raymond J. Gorte. (1996). Evidence for Weakly Bound Oxygen on Ceria Films. The Journal of Physical Chemistry. 100(45). 17862–17865. 91 indexed citations
16.
Bunluesin, T., E. Steve Putna, & Raymond J. Gorte. (1996). A comparison of CO oxidation on ceria-supported Pt, Pd, and Rh. Catalysis Letters. 41(1-2). 1–5. 106 indexed citations
17.
Putna, E. Steve, et al.. (1995). Ceria-Based Anodes for the Direct Oxidation of Methane in Solid Oxide Fuel Cells. Langmuir. 11(12). 4832–4837. 116 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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