David J. Stein
- Spectroscopy top 5%
- Surfaces, Coatings and Films top 10%
- Surface Modification and Superhydrophobicity 2
- Biomedical Engineering top 10%
- Advanced Surface Polishing Techniques 15
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- Advanced machining processes and optimization 7
- Advanced materials and composites 3
- Advanced Measurement and Metrology Techniques 2
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- Integrated Circuits and Semiconductor Failure Analysis 5
- Silicon and Solar Cell Technologies 2
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- Force Microscopy Techniques and Applications 2
- Co-authors
- Dale L. HetheringtonDouglas M. SmithGeorge W. SchererWilliam C. AckermanJulie AndersonJ.L. CecchiT.R. GuilingerAra Philipossian
- Journals
- Journal of The Electrochemical Society (3 papers)Journal of Non-Crystalline Solids (2 papers)Japanese Journal of Applied Physics (1 paper)
- Partner nations
- United StatesGermany
In The Last Decade
David J. Stein
23 papers receiving 562 citations
Peers
Comparison fields: 5 of 49
- Spectroscopy 218
- Surfaces, Coatings and Films 60
- Biomedical Engineering 335
- Materials Chemistry 340
- Ceramics and Composites 32
Countries citing papers authored by David J. Stein
This map shows the geographic impact of David J. Stein's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by David J. Stein with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites David J. Stein more than expected).
Fields of papers citing papers by David J. Stein
This network shows the impact of papers produced by David J. Stein. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by David J. Stein. The network helps show where David J. Stein may publish in the future.
Co-authorship network
The 25 scholars most cited alongside David J. Stein, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2024 | 1 | |
| 2 | 2013 | 2 | |
| 3 | 2007 | 0 | |
| 4 | 2006 | 1 | |
| 5 | 2005 | 6 | |
| 6 | 2005 | 0 | |
| 7 | 2005 | 29 | |
| 8 | 2004 | 4 | |
| 9 | 2004 | 0 | |
| 10 | 2003 | 1 | |
| 11 | 2001 | 11 | |
| 12 | 2001 | 4 | |
| 13 | Using Smart Dummy Fill And Selective Reverse Etchback For Pattern Density Equalization | 2000 | 6 |
| 14 | 1999 | 19 | |
| 15 | 1999 | 9 | |
| 16 | 1999 | 8 | |
| 17 | 1998 | 66 | |
| 18 | 1997 | 2 | |
| 19 | 1994 | 8 | |
| 20 | The Development of NATO Tactical Air Doctrine, 1970-1985 | 1987 | 0 |
About David J. Stein
David J. Stein is a scholar working on Metals and Alloys, Biomedical Engineering, Mechanical Engineering, Surfaces, Coatings and Films and Electrical and Electronic Engineering, having authored 27 papers that have together received 594 indexed citations. Recurring topics across this work include Advanced Surface Polishing Techniques (15 papers), Advanced machining processes and optimization (7 papers), Integrated Circuits and Semiconductor Failure Analysis (5 papers), Advanced materials and composites (3 papers), Force Microscopy Techniques and Applications (2 papers), Advanced Measurement and Metrology Techniques (2 papers), Surface Modification and Superhydrophobicity (2 papers) and Silicon and Solar Cell Technologies (2 papers). The work is most often cited by research in Spectroscopy (218 citations), Surfaces, Coatings and Films (60 citations), Biomedical Engineering (335 citations), Materials Chemistry (340 citations) and Ceramics and Composites (32 citations). David J. Stein has collaborated with scholars based in United States and Germany. Frequent co-authors include Dale L. Hetherington, Douglas M. Smith, George W. Scherer, William C. Ackerman, Julie Anderson, J.L. Cecchi, T.R. Guilinger, Ara Philipossian, L. Borucki and Alok Maskara. Their work appears in journals such as Journal of The Electrochemical Society, Journal of Non-Crystalline Solids, Japanese Journal of Applied Physics, Journal of materials research/Pratt's guide to venture capital sources and Electrochemical and Solid-State Letters.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.