David A. Hutt

1.9k citations
104 papers · 1.6k · h-index 21

Impact in

Papers in

    • Electronic Packaging and Soldering Technologies 37
    • 3D IC and TSV technologies 25
    • Molecular Junctions and Nanostructures 20
    • Nanomaterials and Printing Technologies 15
    • Electrodeposition and Electroless Coatings 14
    • Semiconductor Lasers and Optical Devices 8
    • Nanofabrication and Lithography Techniques 11

David A. Hutt

103 papers receiving 1.5k citations

Peers

David A. Hutt
Comparison fields: 5 of 82
  • Electrical and Electronic Engineering 1.2k
  • Surfaces, Coatings and Films 140
  • Biomedical Engineering 400
  • Electronic, Optical and Magnetic Materials 162
  • Materials Chemistry 388
Replace Jaegab Lee with:
Jaegab Lee South Korea
Wangping Wu China
Young-Bae Park South Korea
Annick Vanhulsel Belgium
Daosheng Deng China
Yan Hong China
Benji Maruyama United States
Zhiqiang Yu China
Yanchun Wang China
David A. Hutt relative to Jaegab Lee South Korea Jaegab Lee's profile →
Citations per field
00.5×1.6×
Jaegab Lee · 1×
Citations per year

Countries citing papers authored by David A. Hutt

Since Specialization
Citations

This map shows the geographic impact of David A. Hutt's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by David A. Hutt with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites David A. Hutt more than expected).

Fields of papers citing papers by David A. Hutt

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by David A. Hutt. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by David A. Hutt. The network helps show where David A. Hutt may publish in the future.

Co-authors

The 25 scholars most cited alongside David A. Hutt, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with David A. Hutt Line = papers co-authored together David A. Hutt links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 104 papers — load more, or switch the sort, to bring in the rest.

#Work
1 2006196
2 1996131
3 2005107
4 1998103
5 199761
6 201258
7 199755
8 200249
9 201141
10 201535
11 201732
12 200332
13 202228
14 199927
15 200925
16 199824
17 201323
18 200622
19 201621
20 200821

About David A. Hutt

David A. Hutt is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering, Computational Mechanics, Materials Chemistry and Atomic and Molecular Physics, and Optics, having authored 104 papers that have together received 1.6k indexed citations. Recurring topics across this work include Electronic Packaging and Soldering Technologies (37 papers), 3D IC and TSV technologies (25 papers), Molecular Junctions and Nanostructures (20 papers), Nanomaterials and Printing Technologies (15 papers), Electrodeposition and Electroless Coatings (14 papers), Nanofabrication and Lithography Techniques (11 papers), Laser Material Processing Techniques (9 papers) and Semiconductor Lasers and Optical Devices (8 papers). The work is most often cited by research in Electrical and Electronic Engineering (1.2k citations), Surfaces, Coatings and Films (140 citations), Biomedical Engineering (400 citations), Electronic, Optical and Magnetic Materials (162 citations) and Materials Chemistry (388 citations). David A. Hutt has collaborated with scholars based in United Kingdom, Canada and Hong Kong. Frequent co-authors include Graham J. Leggett, D.C. Whalley, Paul Conway, Changqing Liu, S.H. Mannan, Elaine Cooper, Jianfeng Li, M.P. Clode, Yingtao Tian and F. Sarvar. Their work appears in journals such as IEEE Transactions on Components and Packaging Technologies, Langmuir, Journal of Materials Chemistry, Acta Materialia and Journal of Materials Processing Technology.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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