Claudia Schäfle
- Biomedical Engineering top 10%
- Materials Chemistry
- Electrical and Electronic Engineering
- Atomic and Molecular Physics, and Optics top 10%
- Surfaces, Coatings and Films top 5%
- Co-authors
- P. LeǐdererFrank BurmeisterJohannes BonebergClemens BechingerThomas MatthesAndreas FeryStephan HerminghausStefan Walheim
- Topics
- Nanofabrication and Lithography Techniques (5 papers)Force Microscopy Techniques and Applications (4 papers)Nanomaterials and Printing Technologies (3 papers)
- Partner nations
- GermanySwitzerland
In The Last Decade
Claudia Schäfle
14 papers receiving 601 citations
Peers
Comparison fields: 5 of 52
- Biomedical Engineering 270
- Materials Chemistry 262
- Electrical and Electronic Engineering 234
- Atomic and Molecular Physics, and Optics 214
- Surfaces, Coatings and Films 124
Countries citing papers authored by Claudia Schäfle
This map shows the geographic impact of Claudia Schäfle's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Claudia Schäfle with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Claudia Schäfle more than expected).
Fields of papers citing papers by Claudia Schäfle
This network shows the impact of papers produced by Claudia Schäfle. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Claudia Schäfle. The network helps show where Claudia Schäfle may publish in the future.
Co-authorship network of co-authors of Claudia Schäfle
This figure shows the co-authorship network connecting the top 25 collaborators of Claudia Schäfle. A scholar is included among the top collaborators of Claudia Schäfle based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Claudia Schäfle. Claudia Schäfle is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 7 | |
| 2 | 1 | |
| 3 | 17 | |
| 4 | 23 | |
| 5 | 33 | |
| 6 | 23 | |
| 7 | 19 | |
| 8 | 41 | |
| 9 | 140 | |
| 10 | 2 | |
| 11 | 13 | |
| 12 | 14 | |
| 13 | 78 | |
| 14 | 213 |
About Claudia Schäfle
Claudia Schäfle is a scholar working on Surfaces, Coatings and Films, Atomic and Molecular Physics, and Optics and Computational Mechanics, having authored 14 papers that have together received 624 indexed citations. Recurring topics across this work include Nanofabrication and Lithography Techniques (5 papers), Force Microscopy Techniques and Applications (4 papers) and Nanomaterials and Printing Technologies (3 papers). The work is most often cited by research in Surfaces, Coatings and Films (124 citations), Atomic and Molecular Physics, and Optics (214 citations) and Biomedical Engineering (270 citations). Claudia Schäfle has collaborated with scholars based in Germany and Switzerland. Frequent co-authors include P. Leǐderer, Frank Burmeister, Johannes Boneberg, Clemens Bechinger, Thomas Matthes, Andreas Fery, Stephan Herminghaus, Stefan Walheim, Christian Dávid and Reinhard Lipowsky. Their work appears in journals such as Physical Review Letters, Advanced Materials and Langmuir.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.