Cecily Andes

767 total citations
18 papers, 686 citations indexed

About

Cecily Andes is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Organic Chemistry. According to data from OpenAlex, Cecily Andes has authored 18 papers receiving a total of 686 indexed citations (citations by other indexed papers that have themselves been cited), including 13 papers in Electrical and Electronic Engineering, 4 papers in Materials Chemistry and 3 papers in Organic Chemistry. Recurrent topics in Cecily Andes's work include Advancements in Photolithography Techniques (8 papers), Plasma Diagnostics and Applications (6 papers) and Semiconductor materials and devices (5 papers). Cecily Andes is often cited by papers focused on Advancements in Photolithography Techniques (8 papers), Plasma Diagnostics and Applications (6 papers) and Semiconductor materials and devices (5 papers). Cecily Andes collaborates with scholars based in United States, Germany and United Kingdom. Cecily Andes's co-authors include Ayusman Sen, Karl D. Oyler, G. S. Oehrlein, Eric A. Hudson, Sebastian Engelmann, David B. Graves, Robert L. Bruce, D. Nest, F. Weilnboeck and S.B. Harkins and has published in prestigious journals such as Journal of the American Chemical Society, Applied Physics Letters and Macromolecules.

In The Last Decade

Cecily Andes

18 papers receiving 676 citations

Peers

Countries citing papers authored by Cecily Andes

Since Specialization

Citations

This map shows the geographic impact of Cecily Andes's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Cecily Andes with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Cecily Andes more than expected).

Fields of papers citing papers by Cecily Andes

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Cecily Andes. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Cecily Andes. The network helps show where Cecily Andes may publish in the future.

Co-authorship network of co-authors of Cecily Andes

This figure shows the co-authorship network connecting the top 25 collaborators of Cecily Andes. A scholar is included among the top collaborators of Cecily Andes based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Cecily Andes. Cecily Andes is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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18 of 18 papers shown

#	Work	Indexed citations
1	Evolution of negative tone development photoresists for ArF lithography 2012 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), Cecily Andes, Thomas Cardolaccia, Young Seok Kim, (unknown)	5
2	Understanding dissolution behavior of 193nm photoresists in organic solvent developers 2012 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Seunghyun Lee, (unknown), Thomas Cardolaccia, (unknown), Cecily Andes, Kathleen O’Connell, George G. Barclay	7
3	Fundamental investigation of negative tone development (NTD) for the 22nm node (and beyond) 2011 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), Yongan Xu, Sean Burns, Kenji Yoshimoto, Martin Burkhardt, (unknown), Karen Petrillo, (unknown), Darı́o L. Goldfarb, Martin Glodde, (unknown), Matthew Colburn, (unknown), Young Chan Bae, (unknown), Cecily Andes, (unknown)	20
4	Effect of Molecular Weights of 193nm Resist Polymers on the Negative Tone Development Process 2011 ·Journal of Photopolymer Science and Technology ·Young Chan Bae, Seunghyun Lee, (unknown), (unknown), Thomas Cardolaccia, (unknown), (unknown), Cecily Andes, Young Seok Kim, G. G. Barclay	3
5	Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry 2010 ·Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ·F. Weilnboeck, Robert L. Bruce, Sebastian Engelmann, G. S. Oehrlein, D. Nest, (unknown), David B. Graves, (unknown), (unknown), Cecily Andes, Eric A. Hudson	44
6	Dependence of Polymer Surface Roughening Rate on Deposited Energy Density During Plasma Processing 2009 ·Plasma Processes and Polymers ·Sebastian Engelmann, Robert L. Bruce, F. Weilnboeck, G. S. Oehrlein, D. Nest, David B. Graves, Cecily Andes, Eric A. Hudson	29
7	Plasma-surface interactions of advanced photoresists with C4F8∕Ar discharges: Plasma parameter dependencies 2009 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Sebastian Engelmann, Robert L. Bruce, (unknown), (unknown), R. J. Phaneuf, G. S. Oehrlein, Cecily Andes, David B. Graves, D. Nest, Eric A. Hudson	21
8	Understanding the Roughening and Degradation of 193 nm Photoresist during Plasma Processing: Synergistic Roles of Vacuum Ultraviolet Radiation and Ion Bombardment 2009 ·Plasma Processes and Polymers ·D. Nest, (unknown), David B. Graves, Sebastian Engelmann, Robert L. Bruce, F. Weilnboeck, G. S. Oehrlein, Deyan Wang, Cecily Andes, Eric A. Hudson	57
9	Dependence of photoresist surface modifications during plasma-based pattern transfer on choice of feedgas composition: Comparison of C4F8- and CF4-based discharges 2009 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Sebastian Engelmann, Robert L. Bruce, F. Weilnboeck, (unknown), (unknown), R. J. Phaneuf, G. S. Oehrlein, Cecily Andes, David B. Graves, D. Nest, Eric A. Hudson	16
10	Synergistic effects of vacuum ultraviolet radiation, ion bombardment, and heating in 193nm photoresist roughening and degradation 2008 ·Applied Physics Letters ·D. Nest, David B. Graves, Sebastian Engelmann, Robert L. Bruce, F. Weilnboeck, G. S. Oehrlein, Cecily Andes, Eric A. Hudson	62
11	Revised particle growth model for supported metallocene catalyst co-polymerization 2007 ·Applied Mathematical Modelling ·Alessio Alexiadis, Cecily Andes	4
12	Plasma-surface interactions of model polymers for advanced photoresists using C4F8∕Ar discharges and energetic ion beams 2007 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Sebastian Engelmann, Robert L. Bruce, (unknown), R. J. Phaneuf, G. S. Oehrlein, Young Chan Bae, Cecily Andes, David B. Graves, D. Nest, Eric A. Hudson, P. Lazzeri, Erica Iacob, M. Anderle	66
13	Etch resistance: comparison and development of etch rate models 2007 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), Cecily Andes, Kap‐Soo Cheon, (unknown), Charles R. Szmanda, George G. Barclay, Peter Trefonas	5
14	Impact of acid diffusion length on resist LER and LWR measured by CD-AFM and CD-SEM 2007 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·J. Foucher, (unknown), Cecily Andes, (unknown)	8
15	Addition Polymerization of Functionalized Norbornenes: The Effect of Size, Stereochemistry, and Coordinating Ability of the Substituent 2004 ·Organometallics ·(unknown), Cecily Andes, Ayusman Sen	95
16	Mathematical Modeling of Homopolymerization on Supported Metallocene Catalysts 2004 ·Macromolecular Materials and Engineering ·Alessio Alexiadis, Cecily Andes, Daniela Ferrari, (unknown), (unknown), Manfred Bochmann, Gerhard Fink	22
17	Copolymerization of Ethene with Norbornene Derivatives Using Neutral Nickel Catalysts 2002 ·Macromolecules ·George M. Benedikt, (unknown), Brian Goodall, (unknown), Lester H. McIntosh, Larry F. Rhodes, (unknown), Cecily Andes, Karl D. Oyler, Ayusman Sen	114
18	New Tantalum-Based Catalyst System for the Selective Trimerization of Ethene to 1-Hexene 2001 ·Journal of the American Chemical Society ·Cecily Andes, S.B. Harkins, Shahid Murtuza, Karl D. Oyler, Ayusman Sen	108

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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