C. Lehrer

762 total citations
23 papers, 600 citations indexed

About

C. Lehrer is a scholar working on Electrical and Electronic Engineering, Computational Mechanics and Biomedical Engineering. According to data from OpenAlex, C. Lehrer has authored 23 papers receiving a total of 600 indexed citations (citations by other indexed papers that have themselves been cited), including 19 papers in Electrical and Electronic Engineering, 11 papers in Computational Mechanics and 9 papers in Biomedical Engineering. Recurrent topics in C. Lehrer's work include Integrated Circuits and Semiconductor Failure Analysis (15 papers), Ion-surface interactions and analysis (11 papers) and Force Microscopy Techniques and Applications (7 papers). C. Lehrer is often cited by papers focused on Integrated Circuits and Semiconductor Failure Analysis (15 papers), Ion-surface interactions and analysis (11 papers) and Force Microscopy Techniques and Applications (7 papers). C. Lehrer collaborates with scholars based in Germany, Japan and Austria. C. Lehrer's co-authors include L. Frey, H. Ryssel, T. Sulzbach, Bettina Frank, Mathias Rommel, M. Takai, Hans‐Ulrich Danzebrink, W. Arnold, U. Rabe and S. Hirsekorn and has published in prestigious journals such as Nanotechnology, Applied Physics A and Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms.

In The Last Decade

C. Lehrer

23 papers receiving 575 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
C. Lehrer Germany 13 399 274 264 143 139 23 600
T. Morita Japan 7 142 0.4× 121 0.4× 174 0.7× 114 0.8× 44 0.3× 13 362
K. Ansari Singapore 12 266 0.7× 107 0.4× 275 1.0× 75 0.5× 72 0.5× 23 446
W. Erfurth Germany 11 177 0.4× 65 0.2× 158 0.6× 96 0.7× 31 0.2× 23 350
Łukasz Borowik France 11 244 0.6× 138 0.5× 150 0.6× 165 1.2× 44 0.3× 33 487
J. Benedict United States 8 205 0.5× 29 0.1× 79 0.3× 67 0.5× 63 0.5× 19 351
G. J. Pietsch Germany 12 394 1.0× 50 0.2× 277 1.0× 340 2.4× 36 0.3× 17 663
L. Clément France 9 244 0.6× 15 0.1× 102 0.4× 141 1.0× 112 0.8× 34 465
Mitsuaki Morigami Japan 6 291 0.7× 49 0.2× 269 1.0× 57 0.4× 100 0.7× 11 444
Neeraj Shukla India 12 110 0.3× 83 0.3× 85 0.3× 63 0.4× 22 0.2× 38 347
Noriko Nitta Japan 13 289 0.7× 224 0.8× 91 0.3× 61 0.4× 13 0.1× 55 432

Countries citing papers authored by C. Lehrer

Since Specialization
Citations

This map shows the geographic impact of C. Lehrer's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by C. Lehrer with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites C. Lehrer more than expected).

Fields of papers citing papers by C. Lehrer

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by C. Lehrer. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by C. Lehrer. The network helps show where C. Lehrer may publish in the future.

Co-authorship network of co-authors of C. Lehrer

This figure shows the co-authorship network connecting the top 25 collaborators of C. Lehrer. A scholar is included among the top collaborators of C. Lehrer based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with C. Lehrer. C. Lehrer is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Rommel, Mathias, et al.. (2007). Accurate parameter extraction for the simulation of direct structuring by ion beams. Microelectronic Engineering. 84(5-8). 810–813. 11 indexed citations
2.
Rabe, U., et al.. (2006). Influence of the cantilever holder on the vibrations of AFM cantilevers. Nanotechnology. 18(4). 44008–44008. 35 indexed citations
3.
Platzgummer, Elmar, A. Biedermann, Hans Loeschner, et al.. (2006). Simulation of ion beam direct structuring for 3D nanoimprint template fabrication. Microelectronic Engineering. 83(4-9). 936–939. 40 indexed citations
4.
Lehrer, C., et al.. (2004). Integration of field emitters into scanning probe microscopy sensors using focused ion and electron beams. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 22(3). 1402–1406. 9 indexed citations
5.
Frey, L., C. Lehrer, & H. Ryssel. (2003). Nanoscale effects in focused ion beam processing. Applied Physics A. 76(7). 1017–1023. 130 indexed citations
6.
Pászti, F., et al.. (2002). Comparison of FIB-induced physical and chemical etching. Publikationsdatenbank der Fraunhofer-Gesellschaft (Fraunhofer-Gesellschaft). 2. 820–823. 1 indexed citations
7.
Dziomba, Thorsten, et al.. (2001). High‐resolution constant‐height imaging with apertured silicon cantilever probes. Journal of Microscopy. 202(1). 22–27. 12 indexed citations
8.
Lehrer, C., et al.. (2001). Fabrication of silicon aperture probes for scanning near-field optical microscopy by focused ion beam nano machining. Microelectronic Engineering. 57-58. 721–728. 15 indexed citations
9.
Lehrer, C., et al.. (2001). Limitations of focused ion beam nanomachining. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 19(6). 2533–2538. 79 indexed citations
10.
Lehrer, C., et al.. (2000). Defects and gallium-contamination during focused ion beam micro machining. 695–698. 16 indexed citations
11.
Boit, Christian, B. Ebersberger, Hans Zimmermann, et al.. (2000). Wafer Conserving Full Range Construction Analysis for IC Fabrication and Process Development Based on FIB/Dual Beam Inline Application. Proceedings - International Symposium for Testing and Failure Analysis. 30842. 393–396. 4 indexed citations
12.
Yavaş, O., M. Takai, C. Lehrer, et al.. (2000). Field emitter array fabricated using focused ion and electron beam induced reaction. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 18(2). 976–979. 22 indexed citations
13.
Danzebrink, Hans‐Ulrich, et al.. (1999). Nano‐slit probes for near‐field optical microscopy fabricated by focused ion beams. Journal of Microscopy. 194(2-3). 335–339. 9 indexed citations
14.
Sulzbach, T., et al.. (1999). Ion beam-treated silicon probes operated in transmission and cross-polarized reflection mode near-infrared scanning near-field optical microscopy (NIR-SNOM). Surface and Interface Analysis. 27(5-6). 486–490. 7 indexed citations
15.
Takai, M., et al.. (1999). Investigation of Cu films by focused ion beam induced deposition using nuclear microprobe. Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms. 158(1-4). 493–498. 2 indexed citations
16.
Biró, László Péter, Géza I. Márk, J. Gyulai, et al.. (1999). AFM and STM investigation of carbon nanotubes produced by high energy ion irradiation of graphite. Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms. 147(1-4). 142–147. 12 indexed citations
17.
Takai, M., T. Kishimoto, A. A. Seidl, et al.. (1998). Microanalysis of masklessly fabricated microstructures using nuclear microprobe. Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms. 136-138. 373–378. 4 indexed citations
18.
Frey, L., et al.. (1996). A comparison of focused ion beam and electron beam induced deposition processes. Microelectronics Reliability. 36(11-12). 1779–1782. 39 indexed citations
19.
Frey, L., et al.. (1996). Tetramethoxysilane as a precursor for focused ion beam and electron beam assisted insulator (SiOx) deposition. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 14(6). 3920–3923. 35 indexed citations
20.
Frey, L., et al.. (1996). Investigations on the topology of structures milled and etched by focused ion beams. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 14(6). 3996–3999. 44 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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