B. E. Deal

6.9k total citations · 2 hit papers
37 papers, 5.2k citations indexed

About

B. E. Deal is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, B. E. Deal has authored 37 papers receiving a total of 5.2k indexed citations (citations by other indexed papers that have themselves been cited), including 32 papers in Electrical and Electronic Engineering, 10 papers in Materials Chemistry and 8 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in B. E. Deal's work include Semiconductor materials and devices (28 papers), Silicon and Solar Cell Technologies (15 papers) and Semiconductor materials and interfaces (8 papers). B. E. Deal is often cited by papers focused on Semiconductor materials and devices (28 papers), Silicon and Solar Cell Technologies (15 papers) and Semiconductor materials and interfaces (8 papers). B. E. Deal collaborates with scholars based in United States, Germany and Israel. B. E. Deal's co-authors include Andrew S. Grove, E. H. Snow, C. T. Sah, Michael C. Sklar, Carver Mead, C. R. Helms, Dennis W. Hess, J.D. Plummer, Chu Po Ho and Dah-Bin Kao and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

B. E. Deal

37 papers receiving 4.8k citations

Hit Papers

General Relationship for the Thermal Oxidation of Silicon 1965 2026 1985 2005 1965 1967 500 1000 1.5k 2.0k 2.5k

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
B. E. Deal United States 20 4.2k 2.0k 1.3k 666 598 37 5.2k
E. A. Irene United States 41 4.6k 1.1× 2.7k 1.3× 1.3k 1.0× 335 0.5× 930 1.6× 215 5.8k
Yoshihiro Hamakawa Japan 48 7.3k 1.8× 6.2k 3.2× 2.3k 1.8× 332 0.5× 1.0k 1.7× 492 9.4k
D. G. Ast United States 29 1.5k 0.4× 1.2k 0.6× 930 0.7× 172 0.3× 332 0.6× 151 2.7k
Kazutaka Mitsuishi Japan 33 1.9k 0.5× 1.6k 0.8× 874 0.7× 211 0.3× 608 1.0× 258 4.1k
Y.G. Shen Hong Kong 36 1.2k 0.3× 3.0k 1.5× 602 0.5× 410 0.6× 563 0.9× 199 4.7k
J. C. Bravman United States 36 2.0k 0.5× 1.7k 0.8× 1.2k 0.9× 113 0.2× 814 1.4× 163 4.7k
J.N. Zemel United States 31 1.9k 0.5× 944 0.5× 952 0.7× 71 0.1× 876 1.5× 124 3.7k
Wood-Hi Cheng Taiwan 32 2.4k 0.6× 933 0.5× 880 0.7× 194 0.3× 494 0.8× 300 3.5k
C. R. Wroński United States 37 7.3k 1.8× 6.0k 3.0× 1.1k 0.8× 339 0.5× 763 1.3× 168 8.4k
T. T. Sheng United States 30 2.4k 0.6× 892 0.5× 1.3k 1.0× 68 0.1× 462 0.8× 127 3.2k

Countries citing papers authored by B. E. Deal

Since Specialization
Citations

This map shows the geographic impact of B. E. Deal's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by B. E. Deal with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites B. E. Deal more than expected).

Fields of papers citing papers by B. E. Deal

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by B. E. Deal. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by B. E. Deal. The network helps show where B. E. Deal may publish in the future.

Co-authorship network of co-authors of B. E. Deal

This figure shows the co-authorship network connecting the top 25 collaborators of B. E. Deal. A scholar is included among the top collaborators of B. E. Deal based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with B. E. Deal. B. E. Deal is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Shacham‐Diamand, Yosi, et al.. (2000). Protection of Silicon Wafers from Alkali Contamination during High-Temperature Processing Using Electric Field. Journal of The Electrochemical Society. 147(10). 3892–3892. 2 indexed citations
2.
Helms, C. R. & B. E. Deal. (1992). Mechanisms of the HF/H 2 O vapor phase etching of SiO 2. 10(4). 806–811. 2 indexed citations
3.
Helms, C. R. & B. E. Deal. (1992). Mechanisms of the HF/H2O vapor phase etching of SiO2. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 10(4). 806–811. 67 indexed citations
4.
Kao, Dah-Bin, et al.. (1991). The Effect of Aqueous Chemical Cleaning on Si (100) Dry Oxidation Kinetics. Journal of The Electrochemical Society. 138(8). 2353–2361. 7 indexed citations
5.
Kao, Dah-Bin, et al.. (1989). Effect of SiO2 surface chemistry on the oxidation of silicon. Applied Physics Letters. 54(8). 715–717. 34 indexed citations
6.
Kao, Dah-Bin, et al.. (1989). A Study of the Breakdown Testing of Thermal Silicon Oxides and the Efects of Preoxidation Surface Treatment. Reliability physics. 9–16. 6 indexed citations
7.
Joshi, Anand, et al.. (1984). Screening energy variations in silicon, silicon dioxide, and silicides. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 2(2). 107–112. 19 indexed citations
8.
Hess, Dennis W. & B. E. Deal. (1977). Kinetics of the Thermal Oxidation of Silicon in  O 2 / HCl Mixtures. Journal of The Electrochemical Society. 124(5). 735–739. 53 indexed citations
9.
Deal, B. E.. (1977). Invited: New Developments in Materials and Processing Aspects of Silicon Device Technology. Japanese Journal of Applied Physics. 16(S1). 29–29. 3 indexed citations
10.
Hess, Dennis W. & B. E. Deal. (1975). Effect of Nitrogen and Oxygen/Nitrogen Mixtures on Oxide Charges in MOS Structures. Journal of The Electrochemical Society. 122(8). 1123–1127. 13 indexed citations
11.
Kamins, T. I. & B. E. Deal. (1975). Characteristics of Si ‐ SiO2 Interfaces Beneath Thin Silicon Films Defined by Electrochemical Etching. Journal of The Electrochemical Society. 122(4). 557–560. 3 indexed citations
12.
Deal, B. E., et al.. (1971). Low-Temperature Reduction of Fast Surface States Associated with Thermally Oxidized Silicon. Journal of The Electrochemical Society. 118(2). 280–280. 83 indexed citations
13.
Deal, B. E., et al.. (1969). Characteristics of Fast Surface States Associated with SiO[sub 2]-Si and Si[sub 3]N[sub 4]-SiO[sub 2]-Si Structures. Journal of The Electrochemical Society. 116(7). 997–997. 124 indexed citations
14.
Deal, B. E. & Michael C. Sklar. (1965). Thermal Oxidation of Heavily Doped Silicon. Journal of The Electrochemical Society. 112(4). 430–430. 82 indexed citations
15.
Deal, B. E., Andrew S. Grove, E. H. Snow, & C. T. Sah. (1965). Observation of Impurity Redistribution During Thermal Oxidation of Silicon Using the MOS Structure. Journal of The Electrochemical Society. 112(3). 308–308. 92 indexed citations
16.
Snow, E. H., Andrew S. Grove, B. E. Deal, & C. T. Sah. (1965). Ion Transport Phenomena in Insulating Films. Journal of Applied Physics. 36(5). 1664–1673. 401 indexed citations
17.
Grove, Andrew S., B. E. Deal, E. H. Snow, & C. T. Sah. (1965). Investigation of thermally oxidised silicon surfaces using metal-oxide-semiconductor structures. Solid-State Electronics. 8(2). 145–163. 336 indexed citations
18.
Deal, B. E. & Andrew S. Grove. (1965). General Relationship for the Thermal Oxidation of Silicon. Journal of Applied Physics. 36(12). 3770–3778. 2594 indexed citations breakdown →
19.
Grove, Andrew S., E. H. Snow, B. E. Deal, & C. T. Sah. (1964). Simple Physical Model for the Space-Charge Capacitance of Metal-Oxide-Semiconductor Structures. Journal of Applied Physics. 35(8). 2458–2460. 56 indexed citations
20.
Grove, Andrew S., B. E. Deal, E. H. Snow, & C. T. Sah. (1964). Investigation of thermally oxidized silicon surfaces using metal-oxide-semiconductor structures. IEEE Transactions on Electron Devices. 11(11). 531–531. 19 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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