Arthur Sherman
- Electrical and Electronic Engineering
- Materials Chemistry
- Mechanics of Materials top 10%
- Electronic, Optical and Magnetic Materials
- Biomedical Engineering
- Co-authors
- S. M. RossnagelDavid CameronMarja‐Leena KääriäinenTommi KääriäinenIvo J. RaaijmakersPeter R. Jaffé
- Topics
- Semiconductor materials and devices (7 papers)Copper Interconnects and Reliability (3 papers)Metal and Thin Film Mechanics (3 papers)
- Cited by
- Electronic, Optical and Magnetic MaterialsElectrical and Electronic EngineeringMechanics of Materials
- Partner nations
- United States
In The Last Decade
Arthur Sherman
11 papers receiving 368 citations
Peers
Comparison fields: 5 of 56
- Electrical and Electronic Engineering 278
- Materials Chemistry 178
- Mechanics of Materials 118
- Electronic, Optical and Magnetic Materials 104
- Biomedical Engineering 44
Countries citing papers authored by Arthur Sherman
This map shows the geographic impact of Arthur Sherman's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Arthur Sherman with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Arthur Sherman more than expected).
Fields of papers citing papers by Arthur Sherman
This network shows the impact of papers produced by Arthur Sherman. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Arthur Sherman. The network helps show where Arthur Sherman may publish in the future.
Co-authorship network of co-authors of Arthur Sherman
This figure shows the co-authorship network connecting the top 25 collaborators of Arthur Sherman. A scholar is included among the top collaborators of Arthur Sherman based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Arthur Sherman. Arthur Sherman is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | Ammonium Oxidation and Selenium Reduction via Feammox in Neuse River Riparian Sediments | 1 |
| 2 | Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications | 32 |
| 3 | Atomic layer deposition for nanotechnology | 16 |
| 4 | 3 | |
| 5 | 129 | |
| 6 | 111 | |
| 7 | 7 | |
| 8 | 17 | |
| 9 | Chemical Vapor Deposition for Microelectronics: Principles, Technology and Applications | 43 |
| 10 | 24 | |
| 11 | 0 | |
| 12 | 0 | |
| 13 | 2 |
About Arthur Sherman
Arthur Sherman is a scholar working on General Materials Science, Ceramics and Composites and Electronic, Optical and Magnetic Materials, having authored 13 papers that have together received 385 indexed citations. Recurring topics across this work include Semiconductor materials and devices (7 papers), Copper Interconnects and Reliability (3 papers) and Metal and Thin Film Mechanics (3 papers). The work is most often cited by research in Electronic, Optical and Magnetic Materials (104 citations), Electrical and Electronic Engineering (278 citations) and Mechanics of Materials (118 citations). Arthur Sherman has collaborated with scholars based in United States. Frequent co-authors include S. M. Rossnagel, David Cameron, Marja‐Leena Kääriäinen, Tommi Kääriäinen, Ivo J. Raaijmakers and Peter R. Jaffé. Their work appears in journals such as Journal of The Electrochemical Society, Thin Solid Films and Journal of Electronic Materials.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.