Jong‐Chang Woo

650 citations
84 papers · 529 indexed · h-index 12

Impact in

    • Semiconductor materials and devices
    • Plasma Diagnostics and Applications
    • Advancements in Semiconductor Devices and Circuit Design
    • Thin-Film Transistor Technologies
    • Gas Sensing Nanomaterials and Sensors
    • ZnO doping and properties
    • Electronic and Structural Properties of Oxides

Papers in

Jong‐Chang Woo

80 papers receiving 513 citations

Peers

Jong‐Chang Woo
Comparison fields: 5 of 45
  • Electrical and Electronic Engineering 425
  • Materials Chemistry 295
  • Electronic, Optical and Magnetic Materials 76
  • Surfaces, Coatings and Films 22
  • Mechanics of Materials 60
Replace Hamide Kavak with:
Hamide Kavak Türkiye
Raul Rammula Estonia
Youn-Seoung Lee South Korea
Min-Chang Jeong South Korea
Virginia R. Anderson United States
J.M. Roldan United States
I. Shao United States
S. V. Jagadeesh Chandra India
Cecilia Goyenola Sweden
S. Dalui India
Jong‐Chang Woo relative to Hamide Kavak Türkiye Hamide Kavak's profile →
Citations per field
00.5×1.5×
Hamide Kavak · 1×
Citations per year

Countries citing papers authored by Jong‐Chang Woo

Since Specialization
Citations

This map shows the geographic impact of Jong‐Chang Woo's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Jong‐Chang Woo with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Jong‐Chang Woo more than expected).

Fields of papers citing papers by Jong‐Chang Woo

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Jong‐Chang Woo. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Jong‐Chang Woo. The network helps show where Jong‐Chang Woo may publish in the future.

Co-authors

The 25 scholars most cited alongside Jong‐Chang Woo, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Jong‐Chang Woo Line = papers co-authored together Jong‐Chang Woo links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown
#Work
1 20211
2 201419
3 20133
4 201240
5 20128
6 20112
7 20112
8 20113
9 20117
10 20112
11 20113
12 20112
13 20111
14 20097
15 20092
16 20095
17 20092
18 200853
19 20081
20
Measurements of the Benzene Absorption Cross Section in the Range of Ultra Violet (UV)
20061

About Jong‐Chang Woo

Jong‐Chang Woo is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Mechanics of Materials, Materials Chemistry and Surfaces, Coatings and Films, having authored 84 papers that have together received 529 indexed citations. Recurring topics across this work include Semiconductor materials and devices (62 papers), Metal and Thin Film Mechanics (25 papers), ZnO doping and properties (23 papers), Copper Interconnects and Reliability (20 papers), Advancements in Semiconductor Devices and Circuit Design (20 papers), Plasma Diagnostics and Applications (18 papers), Electronic and Structural Properties of Oxides (13 papers) and Thin-Film Transistor Technologies (9 papers). The work is most often cited by research in Electrical and Electronic Engineering (425 citations), Materials Chemistry (295 citations), Electronic, Optical and Magnetic Materials (76 citations), Surfaces, Coatings and Films (22 citations) and Mechanics of Materials (60 citations). Jong‐Chang Woo has collaborated with scholars based in South Korea, United States and Czechia. Frequent co-authors include Chang-Il Kim, Yoon-Soo Chun, Doo‐Seung Um, Kyoung‐Tae Kim, Cheol‐Min Park, Seong-Dong Kim, Dong‐Pyo Kim, Kwangsoo No, Joo Yeon Kim and Nam Seob Baek. Their work appears in journals such as Vacuum, Thin Solid Films, Japanese Journal of Applied Physics, Journal of The Electrochemical Society and Journal of Vacuum Science & Technology A Vacuum Surfaces and Films.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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