Alice L. Lin
- Electrical and Electronic Engineering
- Atomic and Molecular Physics, and Optics top 10%
- Materials Chemistry
- Surfaces, Coatings and Films top 10%
- Condensed Matter Physics
- Co-authors
- Richard H. BubeKung‐Tsung WangChi‐Sun WangL.F. DonagheyRoger H. NewmanJ. E. MeeI. GoleckiH. L. Glass
- Topics
- Semiconductor materials and devices (8 papers)Semiconductor materials and interfaces (4 papers)Advancements in Semiconductor Devices and Circuit Design (3 papers)
- Cited by
- Surfaces, Coatings and FilmsNuclear Energy and EngineeringAtomic and Molecular Physics, and Optics
- Partner nations
- United StatesTaiwan
In The Last Decade
Alice L. Lin
14 papers receiving 284 citations
Peers
Comparison fields: 5 of 32
- Electrical and Electronic Engineering 228
- Atomic and Molecular Physics, and Optics 195
- Materials Chemistry 68
- Surfaces, Coatings and Films 49
- Condensed Matter Physics 32
Countries citing papers authored by Alice L. Lin
This map shows the geographic impact of Alice L. Lin's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Alice L. Lin with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Alice L. Lin more than expected).
Fields of papers citing papers by Alice L. Lin
This network shows the impact of papers produced by Alice L. Lin. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Alice L. Lin. The network helps show where Alice L. Lin may publish in the future.
Co-authorship network of co-authors of Alice L. Lin
This figure shows the co-authorship network connecting the top 25 collaborators of Alice L. Lin. A scholar is included among the top collaborators of Alice L. Lin based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Alice L. Lin. Alice L. Lin is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 4 | |
| 2 | 3 | |
| 3 | 1 | |
| 4 | 1 | |
| 5 | 2 | |
| 6 | 4 | |
| 7 | 18 | |
| 8 | 14 | |
| 9 | 5 | |
| 10 | 83 | |
| 11 | 144 | |
| 12 | 11 | |
| 13 | 23 | |
| 14 | 1 | |
| 15 | 10 |
About Alice L. Lin
Alice L. Lin is a scholar working on Surfaces, Coatings and Films, Ceramics and Composites and Electrical and Electronic Engineering, having authored 15 papers that have together received 324 indexed citations. Recurring topics across this work include Semiconductor materials and devices (8 papers), Semiconductor materials and interfaces (4 papers) and Advancements in Semiconductor Devices and Circuit Design (3 papers). The work is most often cited by research in Surfaces, Coatings and Films (49 citations), Nuclear Energy and Engineering (3 citations) and Atomic and Molecular Physics, and Optics (195 citations). Alice L. Lin has collaborated with scholars based in United States and Taiwan. Frequent co-authors include Richard H. Bube, Kung‐Tsung Wang, Chi‐Sun Wang, L.F. Donaghey, Roger H. Newman, J. E. Mee, I. Golecki, H. L. Glass, H. M. Manasevit and Kun‐Lin Yang. Their work appears in journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.