Y. S. Mor

747 total citations
17 papers, 429 citations indexed

About

Y. S. Mor is a scholar working on Electronic, Optical and Magnetic Materials, Electrical and Electronic Engineering and Materials Chemistry. According to data from OpenAlex, Y. S. Mor has authored 17 papers receiving a total of 429 indexed citations (citations by other indexed papers that have themselves been cited), including 16 papers in Electronic, Optical and Magnetic Materials, 14 papers in Electrical and Electronic Engineering and 8 papers in Materials Chemistry. Recurrent topics in Y. S. Mor's work include Copper Interconnects and Reliability (16 papers), Semiconductor materials and devices (14 papers) and Silicone and Siloxane Chemistry (6 papers). Y. S. Mor is often cited by papers focused on Copper Interconnects and Reliability (16 papers), Semiconductor materials and devices (14 papers) and Silicone and Siloxane Chemistry (6 papers). Y. S. Mor collaborates with scholars based in Taiwan, China and United States. Y. S. Mor's co-authors include Po‐Tsun Liu, Simon M. Sze, Ting‐Chang Chang, T. M. Tsai, Fu‐Ming Pan, C. W. Chen, Ya‐Liang Yang, Tien‐Chun Chang, Wen-Fa Wu and Shubin Yan and has published in prestigious journals such as Journal of The Electrochemical Society, Thin Solid Films and Japanese Journal of Applied Physics.

In The Last Decade

Y. S. Mor

17 papers receiving 418 citations

Peers

Y. S. Mor

EEE

EOMM

T. M. Tsai Taiwan

Syun‐Ming Jang Taiwan

H. Shobha United States

L. Ouellet Canada

Alexey S. Vishnevskiy Russia

Kai‐Erik Elers Finland

C. B. Samantaray South Korea

T. Friessnegg United States

P. Casey Ireland

Markus Heyne Belgium

T. M. Tsai Taiwan

Y. S. Mor

278 ×0.8

EEE

209 ×0.6

EOMM

100 ×0.7

128 ×1.0

56 ×1.0

Citations per year, relative to Y. S. Mor Y. S. Mor (= 1×) peers T. M. Tsai

Countries citing papers authored by Y. S. Mor

Since Specialization

Citations

This map shows the geographic impact of Y. S. Mor's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Y. S. Mor with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Y. S. Mor more than expected).

Fields of papers citing papers by Y. S. Mor

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Y. S. Mor. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Y. S. Mor. The network helps show where Y. S. Mor may publish in the future.

Co-authorship network of co-authors of Y. S. Mor

This figure shows the co-authorship network connecting the top 25 collaborators of Y. S. Mor. A scholar is included among the top collaborators of Y. S. Mor based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Y. S. Mor. Y. S. Mor is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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17 of 17 papers shown

Chang, Tien‐Chun, Po‐Tsun Liu, Y. S. Mor, et al.. (2003). Moisture-Induced Material Instability of Porous Organosilicate Glass. Electrochemical and Solid-State Letters. 6(4). F13–F13. 12 indexed citations

Chang, Ting‐Chang, et al.. (2003). Direct Patterning of Low-k Hydrogen Silsesquioxane Using X-Ray Exposure Technology. Electrochemical and Solid-State Letters. 6(5). G69–G69. 4 indexed citations

Chang, Ting‐Chang, Y. S. Mor, Po‐Tsun Liu, et al.. (2002). Recovering Dielectric Loss of Low Dielectric Constant Organic Siloxane during the Photoresist Removal Process. Journal of The Electrochemical Society. 149(8). F81–F81. 33 indexed citations

Chang, Tien‐Chun, T. M. Tsai, Po‐Tsun Liu, et al.. (2002). The novel pattern method of low-k hybrid-organic-siloxane-polymer film using X-ray exposure. Thin Solid Films. 420-421. 403–407. 12 indexed citations

Liu, Po‐Tsun, Tien‐Chun Chang, Y. S. Mor, et al.. (2002). Effective Strategy for Porous Organosilicate to Suppress Oxygen Ashing Damage. Electrochemical and Solid-State Letters. 5(3). G11–G11. 16 indexed citations

Chang, Ting‐Chang, Y. S. Mor, Po‐Tsun Liu, et al.. (2002). Preventing dielectric damage of low-k organic siloxane by passivation treatment. Microelectronic Engineering. 60(3-4). 469–475. 9 indexed citations

Mor, Y. S., Ting‐Chang Chang, Po‐Tsun Liu, et al.. (2002). Effective repair to ultra-low-k dielectric material (k∼2.0) by hexamethyldisilazane treatment. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 20(4). 1334–1338. 64 indexed citations

Chang, Ting‐Chang, Y. S. Mor, Po‐Tsun Liu, et al.. (2002). Trimethylchlorosilane Treatment of Ultralow Dielectric Constant Material after Photoresist Removal Processing. Journal of The Electrochemical Society. 149(10). F145–F145. 14 indexed citations

Chang, Ting‐Chang, Po‐Tsun Liu, Y. S. Mor, et al.. (2002). Eliminating dielectric degradation of low-k organosilicate glass by trimethylchlorosilane treatment. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 20(4). 1561–1566. 32 indexed citations

10.

Chang, Tien‐Chun, et al.. (2001). The effect of ammonia plasma treatment on low-k methyl-hybrido-silsesquioxane against photoresist stripping damage. Thin Solid Films. 398-399. 632–636. 17 indexed citations

11.

Chang, Ting‐Chang, Y. S. Mor, Po‐Tsun Liu, et al.. (2001). Improvement of low dielectric constant methylsilsesquioxane by boron implantation treatment. Thin Solid Films. 398-399. 637–640. 6 indexed citations

12.

Chang, Tien‐Chun, Y. S. Mor, Po‐Tsun Liu, et al.. (2001). Enhancing the resistance of low-k hydrogen silsesquioxane (HSQ) to wet stripper damage. Thin Solid Films. 398-399. 523–526. 20 indexed citations

13.

Liu, Po‐Tsun, et al.. (2001). Improvement in Integration Issues for Organic Low-k Hybrid-Organic-Siloxane-Polymer. Journal of The Electrochemical Society. 148(2). F30–F30. 36 indexed citations

14.

Chang, Ting‐Chang, Po‐Tsun Liu, Y. S. Mor, et al.. (1999). The Novel Improvement of Low Dielectric Constant Methylsilsesquioxane by N 2 O Plasma Treatment. Journal of The Electrochemical Society. 146(10). 3802–3806. 50 indexed citations

15.

Liu, Po‐Tsun, Ting‐Chang Chang, Y. S. Mor, & Simon M. Sze. (1999). Enhancing the Oxygen Plasma Resistance of Low-k Methylsilsesquioxane by H₂ Plasma Treatment. Japanese Journal of Applied Physics. 38(6R). 3482–3482. 57 indexed citations

16.

Chang, Ting‐Chang, et al.. (1999). Effects of H2 plasma treatment on low dielectric constant methylsilsesquioxane. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 17(5). 2325–2330. 45 indexed citations

17.

Chang, Tien‐Chun, et al.. (1999). The novel precleaning treatment for selective tungsten chemical vapor deposition. Thin Solid Films. 355-356. 451–455. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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