Ya‐Liang Yang

517 total citations
15 papers, 459 citations indexed

About

Ya‐Liang Yang is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Mechanics of Materials. According to data from OpenAlex, Ya‐Liang Yang has authored 15 papers receiving a total of 459 indexed citations (citations by other indexed papers that have themselves been cited), including 13 papers in Electrical and Electronic Engineering, 7 papers in Electronic, Optical and Magnetic Materials and 4 papers in Mechanics of Materials. Recurrent topics in Ya‐Liang Yang's work include Semiconductor materials and devices (9 papers), Copper Interconnects and Reliability (7 papers) and Advanced Memory and Neural Computing (5 papers). Ya‐Liang Yang is often cited by papers focused on Semiconductor materials and devices (9 papers), Copper Interconnects and Reliability (7 papers) and Advanced Memory and Neural Computing (5 papers). Ya‐Liang Yang collaborates with scholars based in Taiwan, China and Germany. Ya‐Liang Yang's co-authors include Ting‐Chang Chang, Po‐Tsun Liu, Simon M. Sze, Tai-Fa Young, Y. Frank Cheng, Kuan‐Chang Chang, Tsung‐Ming Tsai, Y. S. Mor, Yong-En Syu and H.Y. Ueng and has published in prestigious journals such as Applied Physics Letters, Journal of The Electrochemical Society and IEEE Transactions on Electron Devices.

In The Last Decade

Ya‐Liang Yang

15 papers receiving 447 citations

Peers

Ya‐Liang Yang
A. Roule France
Sampath Purushothaman United States
Jae Sung Roh South Korea
Ho-Kyu Kang South Korea
J. D. McBrayer United States
P.K. Tan Singapore
A. Roule France
Ya‐Liang Yang
Citations per year, relative to Ya‐Liang Yang Ya‐Liang Yang (= 1×) peers A. Roule

Countries citing papers authored by Ya‐Liang Yang

Since Specialization
Citations

This map shows the geographic impact of Ya‐Liang Yang's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Ya‐Liang Yang with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Ya‐Liang Yang more than expected).

Fields of papers citing papers by Ya‐Liang Yang

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Ya‐Liang Yang. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Ya‐Liang Yang. The network helps show where Ya‐Liang Yang may publish in the future.

Co-authorship network of co-authors of Ya‐Liang Yang

This figure shows the co-authorship network connecting the top 25 collaborators of Ya‐Liang Yang. A scholar is included among the top collaborators of Ya‐Liang Yang based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Ya‐Liang Yang. Ya‐Liang Yang is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

15 of 15 papers shown
1.
Chen, Liangyu, et al.. (2019). Predicting the remaining useful life of plasma equipment through XCSR. Proceedings of the Genetic and Evolutionary Computation Conference Companion. 1263–1270. 4 indexed citations
2.
Zhang, Rui, Kuan‐Chang Chang, Ting‐Chang Chang, et al.. (2013). High performance of graphene oxide-doped silicon oxide-based resistance random access memory. Nanoscale Research Letters. 8(1). 497–497. 18 indexed citations
3.
Yang, Ya‐Liang, Tai-Fa Young, Ting‐Chang Chang, et al.. (2013). Mechanical Stress Influence on Electronic Transport in Low-$k$ SiOC Dielectric Dual Damascene Capacitor. IEEE Electron Device Letters. 34(8). 1056–1058. 1 indexed citations
4.
Yang, Ya‐Liang, et al.. (2013). Mechanical stress influence on electronic transport in low-k SiOC dielectric single damascene capacitor. Applied Physics Letters. 102(19). 6 indexed citations
5.
Su, Yu‐Ting, Kuan‐Chang Chang, Ting‐Chang Chang, et al.. (2013). Characteristics of hafnium oxide resistance random access memory with different setting compliance current. Applied Physics Letters. 103(16). 44 indexed citations
6.
Chang, Kuan‐Chang, Rui Zhang, Ting‐Chang Chang, et al.. (2013). Origin of Hopping Conduction in Graphene-Oxide-Doped Silicon Oxide Resistance Random Access Memory Devices. IEEE Electron Device Letters. 34(5). 677–679. 55 indexed citations
7.
Syu, Yong-En, Rui Zhang, Ting‐Chang Chang, et al.. (2013). Endurance Improvement Technology With Nitrogen Implanted in the Interface of ${\rm WSiO}_{\bf x}$ Resistance Switching Device. IEEE Electron Device Letters. 34(7). 864–866. 42 indexed citations
8.
Tsai, Tsung‐Ming, Kuan‐Chang Chang, Ting‐Chang Chang, et al.. (2012). Bipolar Resistive RAM Characteristics Induced by Nickel Incorporated Into Silicon Oxide Dielectrics for IC Applications. IEEE Electron Device Letters. 33(12). 1696–1698. 45 indexed citations
9.
Jian, Fu-Yen, Ting‐Chang Chang, Ann‐Kuo Chu, et al.. (2010). A 2 Bit Nonvolatile Memory Device with a Transistor Switch Function Accomplished with Edge-FN Tunneling Operation. Electrochemical and Solid-State Letters. 13(5). H166–H166. 2 indexed citations
10.
Young, Tai-Fa, et al.. (2003). Silicide formation of Au thin films on (100) Si during annealing. Materials Chemistry and Physics. 83(2-3). 199–203. 52 indexed citations
11.
Liu, Po‐Tsun, et al.. (2001). Improvement in Integration Issues for Organic Low-k Hybrid-Organic-Siloxane-Polymer. Journal of The Electrochemical Society. 148(2). F30–F30. 36 indexed citations
12.
Liu, Po‐Tsun, Ting‐Chang Chang, Ya‐Liang Yang, et al.. (2000). Improvement on Intrinsic Electrical Properties of Low-k Hydrogen Silsesquioxane/Copper Interconnects Employing Deuterium Plasma Treatment. Journal of The Electrochemical Society. 147(3). 1186–1186. 19 indexed citations
13.
Liu, Po‐Tsun, et al.. (2000). Effects of NH/sub 3/-plasma nitridation on the electrical characterizations of low-k hydrogen silsesquioxane with copper interconnects. IEEE Transactions on Electron Devices. 47(9). 1733–1739. 69 indexed citations
14.
Liu, Po‐Tsun, Ting‐Chang Chang, Ya‐Liang Yang, et al.. (1999). Effectively Blocking Copper Diffusion at Low-k Hydrogen Silsesquioxane/Copper Interface. Japanese Journal of Applied Physics. 38(11R). 6247–6247. 21 indexed citations
15.
Chang, Ting‐Chang, et al.. (1999). Effects of H2 plasma treatment on low dielectric constant methylsilsesquioxane. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 17(5). 2325–2330. 45 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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