Woo-Sung Han

400 total citations
82 papers, 269 citations indexed

About

Woo-Sung Han is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Woo-Sung Han has authored 82 papers receiving a total of 269 indexed citations (citations by other indexed papers that have themselves been cited), including 74 papers in Electrical and Electronic Engineering, 25 papers in Surfaces, Coatings and Films and 21 papers in Biomedical Engineering. Recurrent topics in Woo-Sung Han's work include Advancements in Photolithography Techniques (64 papers), Integrated Circuits and Semiconductor Failure Analysis (19 papers) and Optical Coatings and Gratings (15 papers). Woo-Sung Han is often cited by papers focused on Advancements in Photolithography Techniques (64 papers), Integrated Circuits and Semiconductor Failure Analysis (19 papers) and Optical Coatings and Gratings (15 papers). Woo-Sung Han collaborates with scholars based in South Korea, United States and Belgium. Woo-Sung Han's co-authors include Han-Ku Cho, Hyunwoo Kim, Bing Han, Joo-Tae Moon, Won‐Jun Lee, Jangho Shin, Sung‐Woo Lee, Ji-Young Lee, Insung Kim and Hoyoung Kang and has published in prestigious journals such as Applied Physics Letters, Thin Solid Films and Japanese Journal of Applied Physics.

In The Last Decade

Woo-Sung Han

73 papers receiving 252 citations

Peers

Woo-Sung Han

EEE

SCF

John Slabbekoorn Belgium

R. Cartuyvels Belgium

Haolin Zhang China

M.A. Habib Canada

Chai Tai Chong Singapore

Andrew Ong Singapore

Kimmo Kaija Finland

C. T. Wang Taiwan

Matevž Bokalič Slovenia

Wei‐Ting Chen Taiwan

John Slabbekoorn Belgium

Woo-Sung Han

373 ×1.8

EEE

88 ×1.0

8 ×0.2

SCF

36 ×0.9

28 ×0.7

Citations per year, relative to Woo-Sung Han Woo-Sung Han (= 1×) peers John Slabbekoorn

Countries citing papers authored by Woo-Sung Han

Since Specialization

Citations

This map shows the geographic impact of Woo-Sung Han's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Woo-Sung Han with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Woo-Sung Han more than expected).

Fields of papers citing papers by Woo-Sung Han

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Woo-Sung Han. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Woo-Sung Han. The network helps show where Woo-Sung Han may publish in the future.

Co-authorship network of co-authors of Woo-Sung Han

This figure shows the co-authorship network connecting the top 25 collaborators of Woo-Sung Han. A scholar is included among the top collaborators of Woo-Sung Han based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Woo-Sung Han. Woo-Sung Han is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Lee, Ji‐Su, et al.. (2024). Anti-Gravity 3D Pulsating Heat Pipe for Cooling Electric Vehicle Batteries. Energies. 17(10). 2283–2283. 7 indexed citations

Shim, Seongbo, et al.. (2008). Study of the mask topography effect on the OPC modeling of hole patterns. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6924. 69243R–69243R. 1 indexed citations

Kim, Ki-Chul, Kwanghee Lee, Younsoo Kim, et al.. (2007). Evaluation of Novel Sr Precursors for Atomic Layer Deposition of SrO Thin Film. ECS Transactions. 11(7). 131–136. 6 indexed citations

Han, Hak-Seung, et al.. (2006). Improved scatterometry method of critical dimension measurements and its application for control of development process. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6152. 61520G–61520G. 3 indexed citations

Han, Woo-Sung, et al.. (2005). Simulation of resist heating effect with e-beam lithography using distributed processing (DP). Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5853. 416–416. 1 indexed citations

Lee, Ji-Young, Jangho Shin, Hyunwoo Kim, et al.. (2004). Effect of line-edge roughness (LER) and line-width roughness (LWR) on sub-100-nm device performance. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5376. 426–426. 30 indexed citations

Kim, Hyunwoo, et al.. (2004). Strategy for sub-80-nm contact hole patterning considering device fabrication. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5376. 196–196. 6 indexed citations

Shin, Jangho, et al.. (2004). Evaluation of puddle time effect and optimization of development process in 193-nm lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5376. 1115–1115. 1 indexed citations

Cho, Han-Ku, et al.. (2004). Investigation of stray light characteristic by multiple Gaussian modeling and its OPC application. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5377. 459–459.

10.

Kim, Seong‐Jin, et al.. (2004). Successful application of angular scatterometry to process control in sub-100-nm DRAM device. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5375. 541–541. 3 indexed citations

11.

Han, Hak-Seung, et al.. (2004). Quantitative analysis of develop loading effect and its application. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5567. 213–213. 2 indexed citations

12.

Kim, Hyunwoo, et al.. (2003). Most feasible curing process for ArF resists in device integration aspect. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5039. 817–817. 5 indexed citations

13.

Kim, Ho‐Young, et al.. (2003). The Effect of Pad Properties on Planarity in a CMP Process. MRS Proceedings. 767. 4 indexed citations

14.

Han, Woo-Sung, et al.. (2002). A new correction method for dry etch loading effect in photomask fabrication. 42–43. 1 indexed citations

15.

Jeong, Tae Moon, et al.. (2002). Measurement of the flare and in-field linewidth variation due to the flare. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4691. 1465–1465. 3 indexed citations

16.

Choi, Sang-Jun, Woo-Sung Han, Jaejun Lee, et al.. (2002). Fluorocarbon-based single-layer resist for 157-nm lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4690. 504–504. 1 indexed citations

17.

Lee, Eunmi, et al.. (2002). Effectiveness and confirmation of local area flare measurement method in various pattern layouts. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4691. 57–57. 3 indexed citations

18.

Kim, Yong‐Hoon, et al.. (2000). Comparative study on MEEF and dose latitude between attenuated PSM and Cr binary masks. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4066. 17–17. 1 indexed citations

19.

Han, Woo-Sung, et al.. (1995). <title>Side-lobe suppression in halftone PSM with optical proximity correction</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2621. 291–299.

20.

Han, Woo-Sung, et al.. (1994). <title>Characteristics of standing-wave effect of off-axis illumination depending on two different resist systems and the polarization effect of stepper</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2197. 42–53. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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