H. C. Pfeiffer

881 total citations
46 papers, 527 citations indexed

About

H. C. Pfeiffer is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, H. C. Pfeiffer has authored 46 papers receiving a total of 527 indexed citations (citations by other indexed papers that have themselves been cited), including 43 papers in Electrical and Electronic Engineering, 29 papers in Surfaces, Coatings and Films and 19 papers in Biomedical Engineering. Recurrent topics in H. C. Pfeiffer's work include Advancements in Photolithography Techniques (40 papers), Electron and X-Ray Spectroscopy Techniques (25 papers) and Integrated Circuits and Semiconductor Failure Analysis (14 papers). H. C. Pfeiffer is often cited by papers focused on Advancements in Photolithography Techniques (40 papers), Electron and X-Ray Spectroscopy Techniques (25 papers) and Integrated Circuits and Semiconductor Failure Analysis (14 papers). H. C. Pfeiffer collaborates with scholars based in United States, Germany and Japan. H. C. Pfeiffer's co-authors include W. Stickel, T. R. Groves, Michael Gordon, J. Geiger, R. A. Simpson, John G. Hartley, Rodney Kendall, Chris Robinson, Thomas H. Newman and J. L. Mauer and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and IEEE Transactions on Electron Devices.

In The Last Decade

H. C. Pfeiffer

44 papers receiving 464 citations

Peers

Countries citing papers authored by H. C. Pfeiffer

Since Specialization

Citations

This map shows the geographic impact of H. C. Pfeiffer's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by H. C. Pfeiffer with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites H. C. Pfeiffer more than expected).

Fields of papers citing papers by H. C. Pfeiffer

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by H. C. Pfeiffer. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by H. C. Pfeiffer. The network helps show where H. C. Pfeiffer may publish in the future.

Co-authorship network of co-authors of H. C. Pfeiffer

This figure shows the co-authorship network connecting the top 25 collaborators of H. C. Pfeiffer. A scholar is included among the top collaborators of H. C. Pfeiffer based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with H. C. Pfeiffer. H. C. Pfeiffer is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Direct write electron beam lithography: a historical overview 2010 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·H. C. Pfeiffer	8
2	New prospects for electron beams as tools for semiconductor lithography 2009 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·H. C. Pfeiffer	15
3	PREVAIL: latest electron optics results 2002 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·H. C. Pfeiffer, (unknown), Michael S. Gordon, Rodney Kendall, (unknown), (unknown), W. Stickel, Takeshi Yamaguchi, Kazuya Okamoto, (unknown), Hiroyasu Shimizu, Shinichi Kojima, (unknown)	2
4	<title>PREVAIL-EPL alpha tool electron optics subsystem</title> 2001 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·H. C. Pfeiffer, (unknown), (unknown), (unknown), Michael S. Gordon, Rodney Kendall, (unknown), (unknown), (unknown), (unknown), (unknown), W. Stickel, (unknown)	1
5	PREVAIL: Dynamic correction of aberrations 2000 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Michael Gordon, (unknown), (unknown), H. C. Pfeiffer, Chris Robinson, W. Stickel	2
6	PREVAIL Alpha system: Status and design considerations 2000 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·(unknown), H. C. Pfeiffer, (unknown), W. Stickel	9
7	<title>Large-field electron optics: limitations and enhancements</title> 1995 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·H. C. Pfeiffer, W. Stickel	5
8	Performance of IBM's EL-4 e-beam lithography system 1995 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), R. Butsch, (unknown), Michael Gordon, T. R. Groves, John G. Hartley, H. C. Pfeiffer	8
9	EL-4, a new generation electron-beam lithography system 1993 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·H. C. Pfeiffer, (unknown), (unknown), Michael S. Gordon, T. R. Groves, John G. Hartley, (unknown), (unknown), W. Stickel, (unknown)	16
10	Performance of the EL-3+ maskmaker 1991 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·John G. Hartley, (unknown), H. C. Pfeiffer	1
11	Progress in E-beam mask making for optical and x-ray lithography 1991 ·Microelectronic Engineering ·H. C. Pfeiffer, T. R. Groves	6
12	Optimization of variable axis immersion lens for resolution and normal landing 1990 ·Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ·(unknown), (unknown), H. C. Pfeiffer, W. Stickel, Michael Gordon	7
13	Critical Koehler illumination for shaped beam lithography 1986 ·Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ·(unknown), H. C. Pfeiffer	9
14	Advanced deflection concept for large area, high resolution e-beam lithography 1981 ·Journal of Vacuum Science and Technology ·H. C. Pfeiffer, (unknown)	24
15	Variable axis lens for electron beams 1981 ·Applied Physics Letters ·H. C. Pfeiffer, (unknown), (unknown)	8
16	Variable spot shaping for electron-beam lithography 1978 ·Journal of Vacuum Science and Technology ·H. C. Pfeiffer	65
17	New imaging and deflection concept for probe-forming microfabrication systems 1975 ·Journal of Vacuum Science and Technology ·H. C. Pfeiffer	23
18	Abstract: Emission Characteristics of a LaB6 Electron Gun 1973 ·Journal of Vacuum Science and Technology ·W. Stickel, H. C. Pfeiffer	1
19	Experimentelle prüfung der streuwarscheinlichkeit für elektronen beim Kapitza-dirac-effekt 1968 ·Physics Letters A ·H. C. Pfeiffer	22
20	Energieverluste schneller Elektronen in Alkalihalogenidschichten und ihre Winkelabhängigkeit 1966 ·physica status solidi (b) ·J. Geiger, (unknown), H. C. Pfeiffer	7

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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