W. Beyer

6.4k total citations
227 papers, 5.1k citations indexed

About

W. Beyer is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Computational Mechanics. According to data from OpenAlex, W. Beyer has authored 227 papers receiving a total of 5.1k indexed citations (citations by other indexed papers that have themselves been cited), including 204 papers in Electrical and Electronic Engineering, 156 papers in Materials Chemistry and 26 papers in Computational Mechanics. Recurrent topics in W. Beyer's work include Thin-Film Transistor Technologies (186 papers), Silicon and Solar Cell Technologies (131 papers) and Silicon Nanostructures and Photoluminescence (115 papers). W. Beyer is often cited by papers focused on Thin-Film Transistor Technologies (186 papers), Silicon and Solar Cell Technologies (131 papers) and Silicon Nanostructures and Photoluminescence (115 papers). W. Beyer collaborates with scholars based in Germany, Israel and Netherlands. W. Beyer's co-authors include H. Wagner, H. Overhof, U. Zastrow, H. Wagner, H. Stiebig, W. M. M. Kessels, J. Hüpkes, J. Ristein, H. Mell and L. Ley and has published in prestigious journals such as Physical Review Letters, Advanced Materials and Physical review. B, Condensed matter.

In The Last Decade

W. Beyer

226 papers receiving 5.0k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
W. Beyer Germany 39 4.2k 3.9k 582 464 332 227 5.1k
W. Fuhs Germany 37 3.7k 0.9× 3.2k 0.8× 781 1.3× 240 0.5× 284 0.9× 232 4.3k
G. E. Jellison United States 15 2.5k 0.6× 2.1k 0.5× 502 0.9× 230 0.5× 169 0.5× 44 3.6k
G. Lucovsky United States 33 3.5k 0.8× 2.8k 0.7× 745 1.3× 228 0.5× 235 0.7× 136 4.2k
R. Swanepoel South Africa 10 3.2k 0.8× 3.6k 0.9× 567 1.0× 191 0.4× 451 1.4× 22 4.4k
Hideki Matsumura Japan 33 3.7k 0.9× 2.7k 0.7× 516 0.9× 209 0.5× 81 0.2× 259 4.3k
G. Turban France 34 2.5k 0.6× 2.2k 0.6× 372 0.6× 1.3k 2.9× 84 0.3× 132 3.7k
H. R. Shanks United States 27 1.6k 0.4× 1.9k 0.5× 363 0.6× 192 0.4× 205 0.6× 87 2.9k
Paul D. Bristowe United Kingdom 38 2.3k 0.5× 3.6k 0.9× 716 1.2× 350 0.8× 121 0.4× 145 4.5k
Peter Mascher Canada 25 2.3k 0.5× 2.4k 0.6× 549 0.9× 656 1.4× 95 0.3× 248 3.4k
M.L. Thèye France 22 1.3k 0.3× 1.3k 0.3× 581 1.0× 221 0.5× 237 0.7× 104 2.1k

Countries citing papers authored by W. Beyer

Since Specialization
Citations

This map shows the geographic impact of W. Beyer's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by W. Beyer with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites W. Beyer more than expected).

Fields of papers citing papers by W. Beyer

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by W. Beyer. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by W. Beyer. The network helps show where W. Beyer may publish in the future.

Co-authorship network of co-authors of W. Beyer

This figure shows the co-authorship network connecting the top 25 collaborators of W. Beyer. A scholar is included among the top collaborators of W. Beyer based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with W. Beyer. W. Beyer is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
2.
Melskens, Jimmy, W. Beyer, U. Breuer, et al.. (2023). Hydrogenation of p+ poly-Si by Al2O3 nanolayers prepared by atomic layer deposition. Journal of Applied Physics. 133(14). 3 indexed citations
3.
Phung, Nga, W. Beyer, John N. van den Anker, et al.. (2022). Effective Hydrogenation of Poly-Si Passivating Contacts by Atomic-Layer-Deposited Nickel Oxide. IEEE Journal of Photovoltaics. 12(6). 1377–1385. 7 indexed citations
4.
Melskens, Jimmy, Lachlan E. Black, W. Beyer, et al.. (2021). POx/Al2O3 Stacks for c-Si Surface Passivation: Material and Interface Properties. ACS Applied Electronic Materials. 3(10). 4337–4347. 10 indexed citations
6.
Loo, Bas W. H. van de, Bart Macco, Jimmy Melskens, W. Beyer, & W. M. M. Kessels. (2019). Silicon surface passivation by transparent conductive zinc oxide. Journal of Applied Physics. 125(10). 41 indexed citations
7.
Beyer, W., G. Andrä, J. Bergmann, et al.. (2018). Temperature and hydrogen diffusion length in hydrogenated amorphous silicon films on glass while scanning with a continuous wave laser at 532 nm wavelength. Journal of Applied Physics. 124(15). 6 indexed citations
8.
Beyer, W.. (2016). Hydrogen incorporation, stability, and release effects in thin film silicon. physica status solidi (a). 213(7). 1661–1674. 14 indexed citations
9.
Einsele, F., W. Beyer, & Uwe Rau. (2010). Annealing studies of substoichiometric amorphous SiOx layers for c‐Si surface passivation. Physica status solidi. C, Conferences and critical reviews/Physica status solidi. C, Current topics in solid state physics. 7(3-4). 1021–1024. 7 indexed citations
10.
Beyer, W., et al.. (2009). Application of Molecular Fluorine to Chamber Cleaning for Thin Film Silicon Solar Cell Fabrication. EU PVSEC. 2735–2738. 1 indexed citations
11.
Beyer, W., et al.. (2003). Alternative gases and processes for amorphous and microcrystalline silicon etching. JuSER (Forschungszentrum Jülich). 2. 1584–1587. 2 indexed citations
12.
Khait, Yu.L., R. Weil, R. Beserman, et al.. (2003). Low temperature nanoscopic kinetics of hydrogen plasma-enhanced crystallization of a-Si:H films. Journal of Applied Physics. 94(1). 443–453. 4 indexed citations
13.
Edelman, F., R. Weil, R. Beserman, et al.. (2000). Structure of Si:H Films Fabricated by Plasma-Enhanced Cvd using Hydrogen Diluted Plasma. MRS Proceedings. 609. 1 indexed citations
14.
Edelman, F., Tal Raz, Y. Komem, et al.. (1997). Self-Diffusion as A Limiting Factor of a-SiGe Crystallization. MRS Proceedings. 469. 2 indexed citations
15.
Edelman, F., R. Brener, C. Cytermann, et al.. (1996). Inhibition of Metal Induced Crystallization in the System Ag/ZnO/a-Si:H. MRS Proceedings. 420. 2 indexed citations
16.
Beyer, W. & U. Zastrow. (1993). Diffusion of lithium and hydrogen in hydrogenated amorphous silicon. Journal of Non-Crystalline Solids. 164-166. 289–292. 9 indexed citations
17.
Herion, J., et al.. (1985). Surface studies on as-deposited a-Si:H films. Journal of Non-Crystalline Solids. 77-78. 979–982. 1 indexed citations
18.
Beyer, W. & H. Wagner. (1983). The role of hydrogen in a-Si:H — results of evolution and annealing studies. Journal of Non-Crystalline Solids. 59-60. 161–168. 157 indexed citations
19.
Beyer, W., R. Fischer, & H. Overhof. (1979). Transport in lithium-doped amorphous siliconf. Philosophical Magazine B. 39(3). 205–217. 55 indexed citations
20.
Beyer, W. & J. Stuke. (1975). In-situ thermoelectric power measurements of UHV deposited amorphous silicon. physica status solidi (a). 30(2). K155–K158. 6 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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