F. Engelmark
Impact in
- Condensed Matter Physics top 5%
- GaN-based semiconductor devices and materials
- Mechanics of Materials top 5%
- Metal and Thin Film Mechanics
Papers in ⓘ
-
- GaN-based semiconductor devices and materials 9
-
- Metal and Thin Film Mechanics 9
- Ultrasonics and Acoustic Wave Propagation 2
- Co-authors
- Ilia Katardjiev (9 shared papers)G.F. Iriarte (8 shared papers)Jörgen Westlinder (6 shared papers)S. Berg (3 shared papers)Mikael Ottosson (2 shared papers)U. Smith (2 shared papers)Anders Hårsta (1 shared paper)Johan Bjurström (2 shared papers)
- Journals
- Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (3 papers)Journal of materials research/Pratt's guide to venture capital sources (2 papers)IEEE Transactions on Ultrasonics Ferroelectrics and Frequency Control (2 papers)Journal of The Electrochemical Society (1 paper)IEEE Transactions on Electron Devices (1 paper)
In The Last Decade
F. Engelmark
14 papers receiving 417 citations
Peers
Comparison fields: 5 of 21
- Condensed Matter Physics 261
- Mechanics of Materials 234
- Biomedical Engineering 332
- Electrical and Electronic Engineering 156
- Materials Chemistry 112
Countries citing papers authored by F. Engelmark
This map shows the geographic impact of F. Engelmark's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by F. Engelmark with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites F. Engelmark more than expected).
Fields of papers citing papers by F. Engelmark
This network shows the impact of papers produced by F. Engelmark. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by F. Engelmark. The network helps show where F. Engelmark may publish in the future.
Co-authors
The 22 scholars most cited alongside F. Engelmark, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2002 | 84 | |
| 2 | 2000 | 76 | |
| 3 | 2001 | 57 | |
| 4 | 2005 | 56 | |
| 5 | 2003 | 48 | |
| 6 | 2003 | 37 | |
| 7 | 2002 | 19 | |
| 8 | 2003 | 18 | |
| 9 | 2001 | 13 | |
| 10 | 2003 | 9 | |
| 11 | 2002 | 6 | |
| 12 | 2003 | 5 | |
| 13 | 2000 | 5 | |
| 14 | AlN and High-k Thin Films for IC and Electroacoustic Applications | 2002 | 3 |
About F. Engelmark
F. Engelmark is a scholar working on Condensed Matter Physics, Mechanics of Materials, Biomedical Engineering, Electronic, Optical and Magnetic Materials and Electrical and Electronic Engineering, having authored 14 papers that have together received 436 indexed citations. Recurring topics across this work include Acoustic Wave Resonator Technologies (10 papers), Metal and Thin Film Mechanics (9 papers), GaN-based semiconductor devices and materials (9 papers), Semiconductor materials and devices (5 papers), Copper Interconnects and Reliability (2 papers), Ultrasonics and Acoustic Wave Propagation (2 papers), Transition Metal Oxide Nanomaterials (1 paper) and Photonic Crystals and Applications (1 paper). The work is most often cited by research in Condensed Matter Physics (261 citations), Mechanics of Materials (234 citations), Biomedical Engineering (332 citations), Electrical and Electronic Engineering (156 citations) and Materials Chemistry (112 citations). F. Engelmark has collaborated with scholars based in Sweden and Brazil. Frequent co-authors include Ilia Katardjiev, G.F. Iriarte, Jörgen Westlinder, S. Berg, Mikael Ottosson, U. Smith, Anders Hårsta, Johan Bjurström, Jörgen Olsson and Paul Muralt. Their work appears in journals such as Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Journal of materials research/Pratt's guide to venture capital sources, IEEE Transactions on Ultrasonics Ferroelectrics and Frequency Control, Journal of The Electrochemical Society and IEEE Transactions on Electron Devices.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.