Torsten Feigl

1.6k total citations
81 papers, 1.1k citations indexed

About

Torsten Feigl is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Radiation. According to data from OpenAlex, Torsten Feigl has authored 81 papers receiving a total of 1.1k indexed citations (citations by other indexed papers that have themselves been cited), including 49 papers in Electrical and Electronic Engineering, 32 papers in Surfaces, Coatings and Films and 22 papers in Radiation. Recurrent topics in Torsten Feigl's work include Advancements in Photolithography Techniques (31 papers), Electron and X-Ray Spectroscopy Techniques (21 papers) and Advanced X-ray Imaging Techniques (18 papers). Torsten Feigl is often cited by papers focused on Advancements in Photolithography Techniques (31 papers), Electron and X-Ray Spectroscopy Techniques (21 papers) and Advanced X-ray Imaging Techniques (18 papers). Torsten Feigl collaborates with scholars based in Germany, United States and Ukraine. Torsten Feigl's co-authors include Norbert Kaiser, Sergiy Yulin, K. Tiedtke, A. A. Sorokin, M. Richter, S. A. Yulin, S. V. Bobashev, Thomas Kuhlmann, H. Wabnitz and Nicolas Benoît and has published in prestigious journals such as Physical Review Letters, Journal of Applied Physics and Optics Express.

In The Last Decade

Torsten Feigl

77 papers receiving 1.0k citations

Peers

Countries citing papers authored by Torsten Feigl

Since Specialization

Citations

This map shows the geographic impact of Torsten Feigl's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Torsten Feigl with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Torsten Feigl more than expected).

Fields of papers citing papers by Torsten Feigl

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Torsten Feigl. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Torsten Feigl. The network helps show where Torsten Feigl may publish in the future.

Co-authorship network of co-authors of Torsten Feigl

This figure shows the co-authorship network connecting the top 25 collaborators of Torsten Feigl. A scholar is included among the top collaborators of Torsten Feigl based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Torsten Feigl. Torsten Feigl is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Spatial characterization of the focus produced by an EUV Schwarzschild objective 2014 ·Journal of Physics Conference Series ·(unknown), Marek Wieland, (unknown), Lars Henning, Torsten Feigl, Markus Drescher, Thomas Wilhein	2
2	EUV damage threshold measurements of Mo/Si multilayer mirrors 2012 ·Applied Physics A ·Matthias Müller, (unknown), Torsten Feigl, Klaus Mann	10
3	Influence of the substrate finish and thin film roughness on the optical performance of Mo/Si multilayers 2010 ·Applied Optics ·Marcus Trost, Sven Schröder, Torsten Feigl, Angela Duparré, Andreas Tünnermann	35
4	Novel TMA telescope based on ultra precise metal mirrors 2008 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Stefan Risse, A. Gebhardt, Christoph Damm, Thomas Peschel, (unknown), Torsten Feigl, (unknown), Ramona Eberhardt, Norbert Kaiser, Andreas Tünnermann	33
5	Mo/Si multilayers with enhanced TiO 2 - and RuO 2 -capping layers 2008 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Sergiy Yulin, Nicolas Benoît, Torsten Feigl, Norbert Kaiser, Ming Fang, Manish Chandhok	17
6	Performance and lifetime of EUV source collectors measured with a full size EUV collector reflectometer 2008 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·U. Hinze, Boris N. Chichkov, Torsten Feigl, Uwe D. Zeitner, Christoph Damm, D. Bolshukhin, (unknown), Guido Schriever, (unknown)	0
7	Photoelectric Effect at Ultrahigh Intensities 2007 ·Physical Review Letters ·A. A. Sorokin, S. V. Bobashev, Torsten Feigl, K. Tiedtke, H. Wabnitz, M. Richter	182
8	EUV/soft x-ray multilayer optics 2005 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Sergiy Yulin, Torsten Feigl, Nicolas Benoît, Norbert Kaiser	9
9	Spectral reflectance tuning of EUV mirrors for metrology applications 2003 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Sergiy Yulin, Thomas Kuhlmann, Torsten Feigl, Norbert Kaiser	9
10	EUV multilayer mirrors with tailored spectral reflectivity 2002 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Thomas Kuhlmann, S. A. Yulin, Torsten Feigl, Norbert Kaiser	7
11	Chromium–scandium multilayer mirrors for the nitrogen K _ α line in the water window region 2002 ·Applied Optics ·Thomas Kuhlmann, S. A. Yulin, Torsten Feigl, Norbert Kaiser, Tatiana E. Gorelik, Ute Kaiser, W. Richter	41
12	Interlayer transition zones in Mo/Si superlattices 2002 ·Journal of Applied Physics ·S. A. Yulin, Torsten Feigl, Thomas Kuhlmann, Norbert Kaiser, A. I. Fedorenko, В. В. Кондратенко, (unknown), (unknown), (unknown), E. N. Zubarev	81
13	Design and fabrication of broadband EUV multilayer mirrors 2002 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Thomas Kuhlmann, S. A. Yulin, Torsten Feigl, Norbert Kaiser, (unknown), (unknown)	16
14	High-performance 6-inch EUV mask blanks produced under real production conditions by ion-beam sputter deposition 2002 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Hans Becker, (unknown), (unknown), (unknown), (unknown), (unknown), (unknown), Frank Lenzen, (unknown), S. A. Yulin, Torsten Feigl, Thomas Kuhlmann, Norbert Kaiser	4
15	Ion beam sputter deposition of low-defect EUV mask blanks on 6-in. LTEM substrates in a real production environment 2002 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Hans Becker, (unknown), (unknown), (unknown), Frank Lenzen, S. A. Yulin, Torsten Feigl, Thomas Kuhlmann, Norbert Kaiser	5
16	<title>Damage resistant and low-stress Si-based multilayer mirrors</title> 2001 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Torsten Feigl, S. A. Yulin, Thomas Kuhlmann, Norbert Kaiser	11
17	<title>Damage-resistant and low stress EUV multilayer mirrors</title> 2001 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·S. A. Yulin, Thomas Kuhlmann, Torsten Feigl, Norbert Kaiser	7
18	Comparison of the optical properties and UV radiation resistance of HfO2 single layers deposited by reactive evaporation, IAD, and PIAD 2000 ·Publikationsdatenbank der Fraunhofer-Gesellschaft (Fraunhofer-Gesellschaft) ·Roland Thielsch, Torsten Feigl, Norbert Kaiser, (unknown), S. Scaglione, F. Sarto, M. Alvisi, A. Rizzo	4
19	<title>Magnetron sputtered EUV mirrors with high-thermal stability</title> 2000 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Torsten Feigl, S. A. Yulin, Norbert Kaiser, Roland Thielsch	12
20	Comparison of the optical properties and UV radiation resistance of HfO 2 single layers deposited by reactive evaporation, IAD, and PIAD 2000 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Roland Thielsch, Torsten Feigl, Norbert Kaiser, (unknown), S. Scaglione, F. Sarto, M. Alvisi, A. Rizzo	5

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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