Th. Welzel

470 total citations
21 papers, 412 citations indexed

About

Th. Welzel is a scholar working on Mechanics of Materials, Electrical and Electronic Engineering and Materials Chemistry. According to data from OpenAlex, Th. Welzel has authored 21 papers receiving a total of 412 indexed citations (citations by other indexed papers that have themselves been cited), including 20 papers in Mechanics of Materials, 16 papers in Electrical and Electronic Engineering and 15 papers in Materials Chemistry. Recurrent topics in Th. Welzel's work include Metal and Thin Film Mechanics (20 papers), Diamond and Carbon-based Materials Research (13 papers) and Plasma Diagnostics and Applications (9 papers). Th. Welzel is often cited by papers focused on Metal and Thin Film Mechanics (20 papers), Diamond and Carbon-based Materials Research (13 papers) and Plasma Diagnostics and Applications (9 papers). Th. Welzel collaborates with scholars based in Germany, United Kingdom and Sweden. Th. Welzel's co-authors include Frank Richter, James W. Bradley, H. Küpfer, S. Naumov, K. Ellmer, J. Hahn, M. Friedrich, Dietrich R. T. Zahn, Μ. Schaller and Wolf‐Michael Gnehr and has published in prestigious journals such as Journal of Applied Physics, Journal of Physics D Applied Physics and Surface and Coatings Technology.

In The Last Decade

Th. Welzel

21 papers receiving 393 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Th. Welzel Germany 13 304 293 271 47 23 21 412
Н. С. Сочугов Russia 11 212 0.7× 306 1.0× 255 0.9× 70 1.5× 39 1.7× 47 456
Andrea Dagmar Pajdarová Czechia 8 282 0.9× 247 0.8× 256 0.9× 69 1.5× 15 0.7× 15 365
Jerias Batista Brazil 11 234 0.8× 112 0.4× 332 1.2× 37 0.8× 79 3.4× 18 473
Kim Clay United Kingdom 6 150 0.5× 246 0.8× 191 0.7× 33 0.7× 44 1.9× 8 369
Kouichi Ono Kouichi Ono Japan 11 85 0.3× 320 1.1× 387 1.4× 27 0.6× 22 1.0× 17 455
Keisuke Namba Japan 9 61 0.2× 129 0.4× 309 1.1× 42 0.9× 34 1.5× 14 359
Satish D. Athavale United States 7 91 0.3× 291 1.0× 400 1.5× 38 0.8× 30 1.3× 10 487
H. Curtins Switzerland 12 45 0.1× 340 1.2× 500 1.8× 30 0.6× 52 2.3× 24 529
M. Terauchi Japan 12 57 0.2× 252 0.9× 236 0.9× 61 1.3× 45 2.0× 31 372
A. Vetushka United Kingdom 8 367 1.2× 278 0.9× 254 0.9× 69 1.5× 24 1.0× 13 409

Countries citing papers authored by Th. Welzel

Since Specialization
Citations

This map shows the geographic impact of Th. Welzel's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Th. Welzel with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Th. Welzel more than expected).

Fields of papers citing papers by Th. Welzel

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Th. Welzel. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Th. Welzel. The network helps show where Th. Welzel may publish in the future.

Co-authorship network of co-authors of Th. Welzel

This figure shows the co-authorship network connecting the top 25 collaborators of Th. Welzel. A scholar is included among the top collaborators of Th. Welzel based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Th. Welzel. Th. Welzel is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Welzel, Th., S. Naumov, & K. Ellmer. (2011). Ion distribution measurements to probe target and plasma processes in electronegative magnetron discharges. I. Negative ions. Journal of Applied Physics. 109(7). 29 indexed citations
2.
Welzel, Th., S. Naumov, & K. Ellmer. (2011). Ion distribution measurements to probe target and plasma processes in electronegative magnetron discharges. II. Positive ions. Journal of Applied Physics. 109(7). 21 indexed citations
3.
Welzel, Th., et al.. (2011). Determination of energy modulations of negative oxygen ions during pulsed magnetron sputtering of magnesium oxide. Plasma Sources Science and Technology. 20(3). 35020–35020. 8 indexed citations
4.
Bradley, James W. & Th. Welzel. (2009). Physics and phenomena in pulsed magnetrons: an overview. Journal of Physics D Applied Physics. 42(9). 93001–93001. 68 indexed citations
5.
Welzel, Th., et al.. (2008). Spatial and temporal development of the plasma potential in differently configured pulsed magnetron discharges. New Journal of Physics. 10(12). 123008–123008. 17 indexed citations
6.
Welzel, Th., et al.. (2006). Reactive gas effects in pulsed magnetron sputtering: Time-resolved investigation. Surface and Coatings Technology. 201(7). 3959–3963. 9 indexed citations
7.
Küpfer, H., et al.. (2006). AC powered reactive magnetron deposition of indium tin oxide (ITO) films from a metallic target. Surface and Coatings Technology. 201(7). 3964–3969. 21 indexed citations
8.
Welzel, Th., et al.. (2005). Studies of the temporal behaviour of a pulsed magnetron deposition discharge. Surface and Coatings Technology. 200(1-4). 630–633. 11 indexed citations
9.
Welzel, Th., et al.. (2005). Time-resolved investigation of an asymmetric bipolar pulsed magnetron discharge: Influence of pressure. Surface and Coatings Technology. 200(5-6). 1676–1682. 10 indexed citations
10.
Richter, Frank, et al.. (2004). Time-resolved characterisation of pulsed magnetron discharges using Langmuir probes. Surface and Coatings Technology. 188-189. 384–391. 14 indexed citations
11.
Welzel, Th., et al.. (2004). A time-resolved Langmuir double-probe method for the investigation of pulsed magnetron discharges. Journal of Applied Physics. 96(12). 6994–7001. 17 indexed citations
12.
Welzel, Th. & Frank Richter. (2003). Facing-target magnetron operation for the deposition of CNx thin films. Surface and Coatings Technology. 174-175. 658–664. 1 indexed citations
13.
Richter, Frank, et al.. (2003). Influence of aluminum additions on phase formation in boron nitride films deposited by magnetron sputtering. Journal of Applied Physics. 93(4). 2009–2014. 10 indexed citations
14.
Welzel, Th., et al.. (2002). Determination of radical densities by optical emission spectroscopy during the ECR plasma deposition of Si-C-N : H films using TMS as a precursor. Plasma Sources Science and Technology. 11(3). 351–359. 18 indexed citations
15.
Welzel, Th., et al.. (2002). Characterisation of a BN magnetron sputtering process with an additional aluminium sputter electrode. Surface and Coatings Technology. 166(1). 51–59. 2 indexed citations
16.
Bárdoš, Ladislav, et al.. (2001). Comparison of the radio frequency hollow cathode to the microwave antenna discharge for plasma processing. Journal of Applied Physics. 90(4). 1703–1709. 11 indexed citations
17.
Welzel, Th., et al.. (1998). Spectroscopic studies of a magnetron sputtering discharge for boron nitride deposition. Surface and Coatings Technology. 99(3). 266–273. 13 indexed citations
18.
Hahn, J., et al.. (1997). Formation of c-BN thin films under reduced ion impact. Surface and Coatings Technology. 92(1-2). 129–134. 55 indexed citations
19.
Welzel, Th., et al.. (1997). Process diagnostics during the deposition of cubic boron nitride. Surface and Coatings Technology. 90(3). 275–284. 26 indexed citations
20.
Friedrich, M., et al.. (1997). Optical properties of nitrogen-rich carbon films deposited by d.c. magnetron sputtering. Diamond and Related Materials. 6(1). 33–40. 39 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Breakdown of academic impact, for papers by Н. С. Сочугов Breakdown of academic impact, for papers by Andrea Dagmar Pajdarová Breakdown of academic impact, for papers by Jerias Batista Breakdown of academic impact, for papers by Kim Clay Breakdown of academic impact, for papers by Kouichi Ono Kouichi Ono Breakdown of academic impact, for papers by Keisuke Namba Breakdown of academic impact, for papers by Satish D. Athavale Breakdown of academic impact, for papers by H. Curtins Breakdown of academic impact, for papers by M. Terauchi Breakdown of academic impact, for papers by A. Vetushka
Rankless by CCL
2026