D. V. Lopaev
Impact in
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- Plasma Applications and Diagnostics
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- Plasma Diagnostics and Applications
- Semiconductor materials and devices
- Laser Design and Applications
Papers in
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- Plasma Diagnostics and Applications 57
- Semiconductor materials and devices 31
- Laser Design and Applications 20
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- Metal and Thin Film Mechanics 36
- Co-authors
- Т. В. Рахимова (78 shared papers)A. T. Rakhimov (60 shared papers)Sergey Zyryanov (45 shared papers)Yu. A. Mankelevich (41 shared papers)A. S. Kovalev (27 shared papers)О. В. Прошина (27 shared papers)A.N. Vasilieva (21 shared papers)A I Zotovich (23 shared papers)
- Journals
- Journal of Physics D Applied Physics (27 papers)Plasma Sources Science and Technology (20 papers)IEEE Transactions on Plasma Science (6 papers)Journal of Applied Physics (6 papers)Plasma Processes and Polymers (3 papers)
- Partner nations
- RussiaBelgiumTajikistan
In The Last Decade
D. V. Lopaev
112 papers receiving 2.0k citations
Peers
Comparison fields: 5 of 62
- Radiology, Nuclear Medicine and Imaging 656
- Electrical and Electronic Engineering 1.7k
- Mechanics of Materials 647
- Electronic, Optical and Magnetic Materials 383
- Spectroscopy 232
Countries citing papers authored by D. V. Lopaev
This map shows the geographic impact of D. V. Lopaev's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by D. V. Lopaev with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites D. V. Lopaev more than expected).
Fields of papers citing papers by D. V. Lopaev
This network shows the impact of papers produced by D. V. Lopaev. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by D. V. Lopaev. The network helps show where D. V. Lopaev may publish in the future.
Co-authors
The 25 scholars most cited alongside D. V. Lopaev, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 114 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2015 | 185 | |
| 2 | 2005 | 91 | |
| 3 | 2005 | 83 | |
| 4 | 2004 | 75 | |
| 5 | 2017 | 70 | |
| 6 | 2018 | 52 | |
| 7 | 2019 | 51 | |
| 8 | 2010 | 51 | |
| 9 | 1999 | 51 | |
| 10 | 2013 | 49 | |
| 11 | 2019 | 48 | |
| 12 | 2007 | 45 | |
| 13 | 2011 | 43 | |
| 14 | 2017 | 41 | |
| 15 | 2010 | 39 | |
| 16 | 2006 | 39 | |
| 17 | 2012 | 35 | |
| 18 | 2010 | 35 | |
| 19 | 2016 | 33 | |
| 20 | 2013 | 30 |
About D. V. Lopaev
D. V. Lopaev is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials, Radiology, Nuclear Medicine and Imaging, Electronic, Optical and Magnetic Materials and Materials Chemistry, having authored 114 papers that have together received 2.0k indexed citations. Recurring topics across this work include Plasma Diagnostics and Applications (57 papers), Metal and Thin Film Mechanics (36 papers), Plasma Applications and Diagnostics (32 papers), Semiconductor materials and devices (31 papers), Copper Interconnects and Reliability (25 papers), Laser Design and Applications (20 papers), Diamond and Carbon-based Materials Research (13 papers) and Spectroscopy and Laser Applications (8 papers). The work is most often cited by research in Radiology, Nuclear Medicine and Imaging (656 citations), Electrical and Electronic Engineering (1.7k citations), Mechanics of Materials (647 citations), Electronic, Optical and Magnetic Materials (383 citations) and Spectroscopy (232 citations). D. V. Lopaev has collaborated with scholars based in Russia, Belgium and Tajikistan. Frequent co-authors include Т. В. Рахимова, A. T. Rakhimov, Sergey Zyryanov, Yu. A. Mankelevich, A. S. Kovalev, О. В. Прошина, A.N. Vasilieva, A I Zotovich, Mikhaı̈l R. Baklanov and O.V. Braginsky. Their work appears in journals such as Journal of Physics D Applied Physics, Plasma Sources Science and Technology, IEEE Transactions on Plasma Science, Journal of Applied Physics and Plasma Processes and Polymers.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.