I. Jauberteau

659 total citations
50 papers, 534 citations indexed

About

I. Jauberteau is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, I. Jauberteau has authored 50 papers receiving a total of 534 indexed citations (citations by other indexed papers that have themselves been cited), including 36 papers in Electrical and Electronic Engineering, 24 papers in Mechanics of Materials and 19 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in I. Jauberteau's work include Plasma Diagnostics and Applications (29 papers), Metal and Thin Film Mechanics (20 papers) and Plasma Applications and Diagnostics (12 papers). I. Jauberteau is often cited by papers focused on Plasma Diagnostics and Applications (29 papers), Metal and Thin Film Mechanics (20 papers) and Plasma Applications and Diagnostics (12 papers). I. Jauberteau collaborates with scholars based in France and Spain. I. Jauberteau's co-authors include J. L. Jauberteau, J. Aubreton, Annie Bessaudou, Richard Mayet, Julie Cornette, Pierre Carlès, Thérèse Merle‐Méjean, A. Catherinot, L. Thomas and M. Cahoreau and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Chemical Physics Letters.

In The Last Decade

I. Jauberteau

49 papers receiving 523 citations

Peers

Countries citing papers authored by I. Jauberteau

Since Specialization

Citations

This map shows the geographic impact of I. Jauberteau's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by I. Jauberteau with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites I. Jauberteau more than expected).

Fields of papers citing papers by I. Jauberteau

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by I. Jauberteau. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by I. Jauberteau. The network helps show where I. Jauberteau may publish in the future.

Co-authorship network of co-authors of I. Jauberteau

This figure shows the co-authorship network connecting the top 25 collaborators of I. Jauberteau. A scholar is included among the top collaborators of I. Jauberteau based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with I. Jauberteau. I. Jauberteau is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Determination of the electron energy distribution function in weakly ionized plasma by means of a Langmuir probe and numerical methods 2024 ·AIP Advances ·J. L. Jauberteau, I. Jauberteau	1
2	Designing Resonance Microwave Cavities to Optimize Plasma Generation 2019 ·IEEE Transactions on Instrumentation and Measurement ·(unknown), (unknown), J. L. Jauberteau, I. Jauberteau, O. D. Cortázar	8
3	Expanding Plasma Process for Nitriding Mo–Ti Bilayer Thin Films 2019 ·Coatings ·I. Jauberteau, Richard Mayet, Julie Cornette, Pierre Carlès, Denis Mangin, Annie Bessaudou, J. L. Jauberteau, (unknown)	0
4	Competing growth of titanium nitrides and silicides in Ti thin films processed in expanding microwave plasma: Morphology and microstructural properties 2018 ·AIP Advances ·I. Jauberteau, Pierre Carlès, Richard Mayet, Julie Cornette, Annie Bessaudou, J. L. Jauberteau	1
5	Synthesis of cyanides in N₂–CH₄ discharge afterglow 2018 ·Journal of Physics D Applied Physics ·J. L. Jauberteau, I. Jauberteau	4
6	Electron energy distribution function in a pulsed 2.45GHz hydrogen magnetoplasma: Study of the decay 2017 ·AIP Advances ·J. L. Jauberteau, I. Jauberteau, O. D. Cortázar, (unknown)	2
7	Silicides and Nitrides Formation in Ti Films Coated on Si and Exposed to (Ar-N2-H2) Expanding Plasma 2017 ·Coatings ·I. Jauberteau, Richard Mayet, Julie Cornette, Denis Mangin, Annie Bessaudou, Pierre Carlès, J. L. Jauberteau, (unknown)	17
8	Time evolution of the electron energy distribution function in pulsed microwave magnetoplasma in H2 2016 ·Physics of Plasmas ·J. L. Jauberteau, I. Jauberteau, O. D. Cortázar, (unknown)	10
9	Dielectric properties in microwave remote plasma sustained in argon: Expanding plasma conditions 2012 ·Physics of Plasmas ·J. L. Jauberteau, I. Jauberteau	6
10	Comments on the Bohm Criterion and on the Determination of the Ion Velocity at the Sheath Edge in Non‐Maxwellian Plasma 2011 ·Contributions to Plasma Physics ·J. L. Jauberteau, I. Jauberteau	5
11	Mass spectrometer analysis of plasma containing easily dissociated species: Absolute concentrations of the main free radicals Si(CH3)1,2,3, and H2Si(CH3) produced in a microwave discharge sustained in an Ar–Si(CH3)4 gas mixture 2007 ·International Journal of Mass Spectrometry ·J. L. Jauberteau, I. Jauberteau, J. Aubreton	7
12	Surface reactivity of molybdenum thin films exposed to (Ar–N₂–H₂) expanding microwave plasma at low temperature: influence of the addition of H₂gas in the plasma 2005 ·Journal of Physics D Applied Physics ·I. Jauberteau, J. L. Jauberteau, M. Cahoreau, J. Aubreton	5
13	Electrostatic probe measurements in an expanding microwave discharge sustained in an Ar–N₂–H₂gas mixture: Investigation on plasma parameters 2004 ·Journal of Physics D Applied Physics ·J. L. Jauberteau, I. Jauberteau, J. Aubreton	9
14	Reactivity of methane in a nitrogen discharge afterglow 2002 ·New Journal of Physics ·J. L. Jauberteau, I. Jauberteau, (unknown), J. Aubreton	24
15	NH₃and NH_x<3radicals synthesis downstream a microwave discharge sustained in an Ar-N₂-H₂gas mixture. Study of surface reactive processes and determination of rate constants 2002 ·Journal of Physics D Applied Physics ·J. L. Jauberteau, I. Jauberteau, J. Aubreton	38
16	Plasma nitriding of thin molybdenum layers at low temperature 1999 ·Surface and Coatings Technology ·I. Jauberteau, J. L. Jauberteau, M.N. Séméria, (unknown), (unknown), J. Aubreton	12
17	RMPECVD of silica films in large scale microwave plasma reactor : Films properties 1999 ·Journal de Physique IV (Proceedings) ·F. Naudin, Pascal Tristant, M. C. Hugon, I. Jauberteau, B. Agius, J. Desmaison	1
18	High Reactivity of CH2 Radical in an AR–CH4 Post-Discharge 1998 ·Plasma Chemistry and Plasma Processing ·J. L. Jauberteau, L. Thomas, J. Aubreton, I. Jauberteau, A. Catherinot	19
19	Characterization of an argon-hydrogen microwave discharge used as an atomic hydrogen source. Effect of hydrogen dilution on the atomic hydrogen production 1997 ·Plasma Chemistry and Plasma Processing ·L. Thomas, J. L. Jauberteau, I. Jauberteau, J. Aubreton, A. Catherinot	18
20	Bi₄Ti₃O₁₂ Ferroelectric Thin Films: Morphology and Electrical Characteristics 1997 ·Journal de Physique III ·(unknown), I. Jauberteau, Philippe Thomas, J.P. Mercurio	1

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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