Saurabh J. Ullal

426 total citations
10 papers, 366 citations indexed

About

Saurabh J. Ullal is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Mechanics of Materials. According to data from OpenAlex, Saurabh J. Ullal has authored 10 papers receiving a total of 366 indexed citations (citations by other indexed papers that have themselves been cited), including 8 papers in Electrical and Electronic Engineering, 5 papers in Materials Chemistry and 3 papers in Mechanics of Materials. Recurrent topics in Saurabh J. Ullal's work include Semiconductor materials and devices (6 papers), Plasma Diagnostics and Applications (6 papers) and Metal and Thin Film Mechanics (3 papers). Saurabh J. Ullal is often cited by papers focused on Semiconductor materials and devices (6 papers), Plasma Diagnostics and Applications (6 papers) and Metal and Thin Film Mechanics (3 papers). Saurabh J. Ullal collaborates with scholars based in United States. Saurabh J. Ullal's co-authors include Eray S. Aydil, Vahid Vahedi, Harmeet Singh, Erik A. Edelberg, L. B. Braly, J. E. Daugherty, C. P. Khattak and G. Dhanaraj and has published in prestigious journals such as Review of Scientific Instruments, Journal of Crystal Growth and Journal of Vacuum Science & Technology A Vacuum Surfaces and Films.

In The Last Decade

Saurabh J. Ullal

9 papers receiving 353 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Saurabh J. Ullal United States 8 301 149 95 50 45 10 366
R. P. Fetherston United States 9 234 0.8× 293 2.0× 168 1.8× 25 0.5× 23 0.5× 11 365
L. M. Ephrath United States 11 356 1.2× 68 0.5× 111 1.2× 37 0.7× 54 1.2× 16 400
Th. Welzel Germany 13 271 0.9× 304 2.0× 293 3.1× 18 0.4× 10 0.2× 21 412
Xueyu Qian United States 11 301 1.0× 119 0.8× 83 0.9× 51 1.0× 55 1.2× 19 334
Andrea Dagmar Pajdarová Czechia 8 256 0.9× 282 1.9× 247 2.6× 11 0.2× 11 0.2× 15 365
Chung‐Hoo Park South Korea 11 253 0.8× 73 0.5× 180 1.9× 35 0.7× 15 0.3× 37 334
Rajendra Singh Rajput Netherlands 9 81 0.3× 76 0.5× 171 1.8× 9 0.2× 16 0.4× 28 278
Christoph Flötgen Austria 8 202 0.7× 33 0.2× 38 0.4× 12 0.2× 37 0.8× 18 226
Tianbao Xie United States 8 136 0.5× 65 0.4× 147 1.5× 13 0.3× 31 0.7× 19 235
S. Rohmfeld Germany 8 249 0.8× 70 0.5× 174 1.8× 34 0.7× 32 0.7× 12 343

Countries citing papers authored by Saurabh J. Ullal

Since Specialization
Citations

This map shows the geographic impact of Saurabh J. Ullal's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Saurabh J. Ullal with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Saurabh J. Ullal more than expected).

Fields of papers citing papers by Saurabh J. Ullal

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Saurabh J. Ullal. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Saurabh J. Ullal. The network helps show where Saurabh J. Ullal may publish in the future.

Co-authorship network of co-authors of Saurabh J. Ullal

This figure shows the co-authorship network connecting the top 25 collaborators of Saurabh J. Ullal. A scholar is included among the top collaborators of Saurabh J. Ullal based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Saurabh J. Ullal. Saurabh J. Ullal is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

10 of 10 papers shown
1.
Khattak, C. P., et al.. (2015). 20-inch diameter CHES® sapphire boules. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9453. 945305–945305. 1 indexed citations
2.
Khattak, C. P., et al.. (2015). World׳s largest sapphire for many applications. Journal of Crystal Growth. 452. 44–48. 47 indexed citations
3.
Ullal, Saurabh J., et al.. (2013). Latest developments of large-diameter c-axis sapphire grown by CHES method. Journal of Crystal Growth. 393. 123–128. 6 indexed citations
4.
Ullal, Saurabh J., et al.. (2003). Relation between the ion flux, gas phase composition, and wall conditions in chlorine plasma etching of silicon. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 21(3). 589–595. 28 indexed citations
5.
Ullal, Saurabh J., Harmeet Singh, J. E. Daugherty, Vahid Vahedi, & Eray S. Aydil. (2002). Maintaining reproducible plasma reactor wall conditions: SF6 plasma cleaning of films deposited on chamber walls during Cl2/O2 plasma etching of Si. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 20(4). 1195–1201. 73 indexed citations
6.
Ullal, Saurabh J., et al.. (2002). An on-wafer probe array for measuring two-dimensional ion flux distributions in plasma reactors. Review of Scientific Instruments. 73(10). 3494–3499. 12 indexed citations
7.
Ullal, Saurabh J., et al.. (2002). Effect of chamber wall conditions on Cl and Cl2 concentrations in an inductively coupled plasma reactor. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 20(1). 43–52. 104 indexed citations
8.
Ullal, Saurabh J., Harmeet Singh, J. E. Daugherty, Vahid Vahedi, & Eray S. Aydil. (2002). Formation and removal of composite halogenated silicon oxide and fluorocarbon films deposited on chamber walls during plasma etching of multiple film stacks. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 20(5). 1939–1946. 14 indexed citations
9.
Ullal, Saurabh J., Harmeet Singh, Vahid Vahedi, & Eray S. Aydil. (2002). Deposition of silicon oxychloride films on chamber walls during Cl2/O2 plasma etching of Si. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 20(2). 499–506. 39 indexed citations
10.
Ullal, Saurabh J., et al.. (2001). New diagnostic method for monitoring plasma reactor walls: Multiple total internal reflection Fourier transform infrared surface probe. Review of Scientific Instruments. 72(8). 3260–3269. 42 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Breakdown of academic impact, for papers by R. P. Fetherston Breakdown of academic impact, for papers by L. M. Ephrath Breakdown of academic impact, for papers by Th. Welzel Breakdown of academic impact, for papers by Xueyu Qian Breakdown of academic impact, for papers by Andrea Dagmar Pajdarová Breakdown of academic impact, for papers by Chung‐Hoo Park Breakdown of academic impact, for papers by Rajendra Singh Rajput Breakdown of academic impact, for papers by Christoph Flötgen Breakdown of academic impact, for papers by Tianbao Xie Breakdown of academic impact, for papers by S. Rohmfeld
Rankless by CCL
2026