S. J. You

1.6k total citations
137 papers, 1.3k citations indexed

About

S. J. You is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, S. J. You has authored 137 papers receiving a total of 1.3k indexed citations (citations by other indexed papers that have themselves been cited), including 127 papers in Electrical and Electronic Engineering, 59 papers in Mechanics of Materials and 27 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in S. J. You's work include Plasma Diagnostics and Applications (117 papers), Metal and Thin Film Mechanics (52 papers) and Plasma Applications and Diagnostics (24 papers). S. J. You is often cited by papers focused on Plasma Diagnostics and Applications (117 papers), Metal and Thin Film Mechanics (52 papers) and Plasma Applications and Diagnostics (24 papers). S. J. You collaborates with scholars based in South Korea, United States and China. S. J. You's co-authors include H. Y. Chang, H. Y. Chang, Sijun Kim, Jung‐Hyung Kim, H. Y. Chang, Chul‐Hee Cho, J. H. Kim, D. J. Seong, Wang‐Yuhl Oh and Felipe Iza and has published in prestigious journals such as Physical Review Letters, Applied Physics Letters and Journal of Applied Physics.

In The Last Decade

S. J. You

129 papers receiving 1.3k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
S. J. You South Korea 20 1.2k 563 288 264 219 137 1.3k
C. Boisse-Laporte France 20 849 0.7× 307 0.5× 340 1.2× 377 1.4× 261 1.2× 45 1.0k
I. Ghanashev Japan 15 783 0.7× 218 0.4× 400 1.4× 179 0.7× 127 0.6× 27 870
De‐Qi Wen United States 21 873 0.7× 351 0.6× 307 1.1× 245 0.9× 79 0.4× 50 900
Sang Ki Nam United States 15 653 0.5× 211 0.4× 219 0.8× 169 0.6× 117 0.5× 53 734
Margarita Baeva Germany 20 722 0.6× 384 0.7× 578 2.0× 404 1.5× 280 1.3× 71 1.1k
A. R. Ellingboe Ireland 24 2.0k 1.6× 784 1.4× 494 1.7× 427 1.6× 230 1.1× 61 2.1k
Mark A. Sobolewski United States 19 967 0.8× 458 0.8× 194 0.7× 111 0.4× 216 1.0× 49 1.0k
Ki‐Woong Whang South Korea 18 1.0k 0.9× 174 0.3× 141 0.5× 255 1.0× 362 1.7× 117 1.1k
Kouichi Ono Japan 26 2.0k 1.7× 496 0.9× 258 0.9× 231 0.9× 456 2.1× 146 2.2k
N. Sakudo Japan 13 537 0.5× 265 0.5× 161 0.6× 61 0.2× 201 0.9× 83 784

Countries citing papers authored by S. J. You

Since Specialization
Citations

This map shows the geographic impact of S. J. You's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by S. J. You with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites S. J. You more than expected).

Fields of papers citing papers by S. J. You

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by S. J. You. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by S. J. You. The network helps show where S. J. You may publish in the future.

Co-authorship network of co-authors of S. J. You

This figure shows the co-authorship network connecting the top 25 collaborators of S. J. You. A scholar is included among the top collaborators of S. J. You based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with S. J. You. S. J. You is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Yeom, G.Y., et al.. (2024). Plasma atomic layer etching of SiO2 with a low global warming potential fluorocarbon precursor (C6F6). Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 42(3). 1 indexed citations
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Cho, Chul‐Hee, et al.. (2023). Determination of Plasma Potential Using an Emissive Probe with Floating Potential Method. Materials. 16(7). 2762–2762. 4 indexed citations
6.
Kim, Sijun, et al.. (2023). Analysis on crossing frequency in transmission microwave frequency spectrum of the cutoff probe. Physics of Plasmas. 30(2). 1 indexed citations
7.
Kim, Sijun, et al.. (2023). On the Quenching of Electron Temperature in Inductively Coupled Plasma. Materials. 16(8). 3219–3219. 1 indexed citations
8.
Kim, Sijun, et al.. (2022). Influence of Additive N2 on O2 Plasma Ashing Process in Inductively Coupled Plasma. Nanomaterials. 12(21). 3798–3798. 10 indexed citations
9.
Kim, Sijun, et al.. (2022). Low-Temperature Plasma Diagnostics to Investigate the Process Window Shift in Plasma Etching of SiO2. Sensors. 22(16). 6029–6029. 2 indexed citations
10.
Lee, Jinho, et al.. (2022). Characterization of an Etch Profile at a Wafer Edge in Capacitively Coupled Plasma. Nanomaterials. 12(22). 3963–3963. 7 indexed citations
11.
Kim, Sijun, et al.. (2022). Development of the Measurement of Lateral Electron Density (MOLE) Probe Applicable to Low-Pressure Plasma Diagnostics. Sensors. 22(15). 5487–5487. 4 indexed citations
12.
Kim, Sijun, et al.. (2022). Purgeless atomic layer etching of SiO2. Journal of Physics D Applied Physics. 55(36). 365203–365203. 8 indexed citations
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Kim, Sijun, et al.. (2022). Crossing Frequency Method Applicable to Intermediate Pressure Plasma Diagnostics Using the Cutoff Probe. Sensors. 22(3). 1291–1291. 12 indexed citations
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Cho, Chul‐Hee, et al.. (2021). Characterization of SiO2 Etching Profiles in Pulse-Modulated Capacitively Coupled Plasmas. Materials. 14(17). 5036–5036. 33 indexed citations
17.
Yook, Jong‐Gwan, et al.. (2021). Coplanar Dielectric-Barrier-Discharge(DBD) Plasma Generator for X-Band Radar Cross Section(RCS) Reduction. The Journal of Korean Institute of Electromagnetic Engineering and Science. 32(12). 1091–1098. 2 indexed citations
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Kim, Sijun, et al.. (2019). A transmission line model of the cutoff probe. Plasma Sources Science and Technology. 28(5). 55014–55014. 17 indexed citations
19.
Kim, Dae-Chul, Yonghyun Kim, Mi‐Young Song, et al.. (2019). Measurement of total electron scattering cross-section of N 2 O at intermediate energy region using a new magnetized electron beam apparatus. Journal of Physics B Atomic Molecular and Optical Physics. 52(19). 195201–195201. 3 indexed citations
20.
You, S. J., et al.. (2018). Planar cutoff probe for measuring the electron density of low-pressure plasmas. Plasma Sources Science and Technology. 28(1). 15004–15004. 13 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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