Sijun Kim

667 total citations
65 papers, 491 citations indexed

About

Sijun Kim is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials and Civil and Structural Engineering. According to data from OpenAlex, Sijun Kim has authored 65 papers receiving a total of 491 indexed citations (citations by other indexed papers that have themselves been cited), including 39 papers in Electrical and Electronic Engineering, 21 papers in Mechanics of Materials and 13 papers in Civil and Structural Engineering. Recurrent topics in Sijun Kim's work include Plasma Diagnostics and Applications (35 papers), Metal and Thin Film Mechanics (19 papers) and Semiconductor materials and devices (9 papers). Sijun Kim is often cited by papers focused on Plasma Diagnostics and Applications (35 papers), Metal and Thin Film Mechanics (19 papers) and Semiconductor materials and devices (9 papers). Sijun Kim collaborates with scholars based in South Korea, United States and Vietnam. Sijun Kim's co-authors include S. J. You, Keun‐Hyeok Yang, Chul‐Hee Cho, Jong‐Gab Jun, Jin‐Kyung Kim, CheolGi Kim, Se‐Jin Choi, Kok Yeow You, Leslee J. Shaw and Nupoor Narula and has published in prestigious journals such as Journal of the American College of Cardiology, Scientific Reports and Sensors.

In The Last Decade

Sijun Kim

58 papers receiving 482 citations

Peers

Countries citing papers authored by Sijun Kim

Since Specialization

Citations

This map shows the geographic impact of Sijun Kim's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Sijun Kim with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Sijun Kim more than expected).

Fields of papers citing papers by Sijun Kim

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Sijun Kim. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Sijun Kim. The network helps show where Sijun Kim may publish in the future.

Co-authorship network of co-authors of Sijun Kim

This figure shows the co-authorship network connecting the top 25 collaborators of Sijun Kim. A scholar is included among the top collaborators of Sijun Kim based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Sijun Kim. Sijun Kim is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Initiation mechanism of arcing generated in RF capacitively coupled plasma 2024 ·Physica Scripta ·Chul‐Hee Cho, Sijun Kim, (unknown), (unknown), (unknown), (unknown), (unknown), (unknown), Sanghoo Park, S. J. You	0
2	Contribution of Ion Energy and Flux on High-Aspect Ratio SiO2 Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/C4F8 Plasma: Individual Ion Energy and Flux Controlled 2023 ·Materials ·(unknown), Sijun Kim, (unknown), Chul‐Hee Cho, (unknown), (unknown), (unknown), (unknown), (unknown), S. J. You	3
3	Enhancement of Ar Ion Flux on the Substrate by Heterogeneous Charge Transfer Collision of Ar Atom with He Ion in an Inductively Coupled Ar/He Plasma 2023 ·Materials ·(unknown), Sijun Kim, (unknown), (unknown), (unknown), Chul‐Hee Cho, (unknown), (unknown), (unknown), S. J. You	0
4	Characterization of SiO2 Plasma Etching with Perfluorocarbon (C4F8 and C6F6) and Hydrofluorocarbon (CHF3 and C4H2F6) Precursors for the Greenhouse Gas Emissions Reduction 2023 ·Materials ·(unknown), (unknown), (unknown), Chul‐Hee Cho, (unknown), (unknown), (unknown), Sijun Kim, (unknown), S. J. You, Geun Young Yeom	8
5	Determination of Plasma Potential Using an Emissive Probe with Floating Potential Method 2023 ·Materials ·Chul‐Hee Cho, Sijun Kim, (unknown), (unknown), (unknown), (unknown), (unknown), S. J. You	4
6	Analysis on crossing frequency in transmission microwave frequency spectrum of the cutoff probe 2023 ·Physics of Plasmas ·Sijun Kim, (unknown), Chul‐Hee Cho, (unknown), (unknown), (unknown), S. J. You	1
7	On the Quenching of Electron Temperature in Inductively Coupled Plasma 2023 ·Materials ·(unknown), Sijun Kim, (unknown), Chul‐Hee Cho, (unknown), (unknown), (unknown), (unknown), S. J. You	1
8	Influence of Additive N2 on O2 Plasma Ashing Process in Inductively Coupled Plasma 2022 ·Nanomaterials ·(unknown), (unknown), Sijun Kim, Chul‐Hee Cho, (unknown), (unknown), (unknown), S. J. You	10
9	Low-Temperature Plasma Diagnostics to Investigate the Process Window Shift in Plasma Etching of SiO2 2022 ·Sensors ·(unknown), Sijun Kim, (unknown), Chul‐Hee Cho, (unknown), S. J. You	2
10	Characterization of an Etch Profile at a Wafer Edge in Capacitively Coupled Plasma 2022 ·Nanomaterials ·(unknown), Jinho Lee, Sijun Kim, (unknown), Chul‐Hee Cho, (unknown), (unknown), (unknown), S. J. You	7
11	Development of the Measurement of Lateral Electron Density (MOLE) Probe Applicable to Low-Pressure Plasma Diagnostics 2022 ·Sensors ·Sijun Kim, (unknown), (unknown), (unknown), (unknown), Chul‐Hee Cho, (unknown), S. J. You	4
12	Purgeless atomic layer etching of SiO₂ 2022 ·Journal of Physics D Applied Physics ·(unknown), Sijun Kim, (unknown), (unknown), (unknown), S. J. You	8
13	Development of a High-Linearity Voltage and Current Probe with a Floating Toroidal Coil: Principle, Demonstration, Design Optimization, and Evaluation 2022 ·Sensors ·Sijun Kim, (unknown), (unknown), Chul‐Hee Cho, (unknown), (unknown), (unknown), S. J. You	3
14	Crossing Frequency Method Applicable to Intermediate Pressure Plasma Diagnostics Using the Cutoff Probe 2022 ·Sensors ·Sijun Kim, (unknown), (unknown), Chul‐Hee Cho, S. J. You	12
15	Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma 2022 ·Sensors ·Chul‐Hee Cho, Sijun Kim, (unknown), (unknown), (unknown), (unknown), (unknown), (unknown), (unknown), Jinho Lee, S. J. You	4
16	Database Development of SiO2 Etching with Fluorocarbon Plasmas Diluted with Various Noble Gases of Ar, Kr, and Xe 2022 ·Nanomaterials ·(unknown), (unknown), (unknown), Sijun Kim, (unknown), (unknown), Hyo‐Chang Lee, S. J. You	7
17	Characterization of SiO2 Etching Profiles in Pulse-Modulated Capacitively Coupled Plasmas 2021 ·Materials ·Chul‐Hee Cho, Kok Yeow You, Sijun Kim, (unknown), (unknown), S. J. You	33
18	Various evolution trends of sample thickness in fluorocarbon film deposition on SiO2 2021 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·(unknown), (unknown), (unknown), (unknown), Chul‐Hee Cho, Sijun Kim, S. J. You	10
19	A transmission line model of the cutoff probe 2019 ·Plasma Sources Science and Technology ·Sijun Kim, (unknown), (unknown), (unknown), S. J. You	17
20	Planar cutoff probe for measuring the electron density of low-pressure plasmas 2018 ·Plasma Sources Science and Technology ·(unknown), S. J. You, Sijun Kim, (unknown), Jeong Yong Lee, Woo Seok Kang, Min Hur	13

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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