H. Y. Chang

582 total citations
33 papers, 421 citations indexed

About

H. Y. Chang is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials and Aerospace Engineering. According to data from OpenAlex, H. Y. Chang has authored 33 papers receiving a total of 421 indexed citations (citations by other indexed papers that have themselves been cited), including 30 papers in Electrical and Electronic Engineering, 14 papers in Mechanics of Materials and 6 papers in Aerospace Engineering. Recurrent topics in H. Y. Chang's work include Plasma Diagnostics and Applications (26 papers), Metal and Thin Film Mechanics (10 papers) and Electrohydrodynamics and Fluid Dynamics (8 papers). H. Y. Chang is often cited by papers focused on Plasma Diagnostics and Applications (26 papers), Metal and Thin Film Mechanics (10 papers) and Electrohydrodynamics and Fluid Dynamics (8 papers). H. Y. Chang collaborates with scholars based in South Korea, Taiwan and United States. H. Y. Chang's co-authors include S. J. You, SungYong Seo, N. S. Yoon, C. S. Chang, J. H. Kim, Sung‐Soo Kim, Chang‐Koon Choi, Chin‐Wook Chung, Han S. Uhm and D. J. Seong and has published in prestigious journals such as Physical Review Letters, Applied Physics Letters and Journal of Applied Physics.

In The Last Decade

H. Y. Chang

33 papers receiving 403 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
H. Y. Chang South Korea 14 376 193 120 82 61 33 421
N. S. Yoon South Korea 12 478 1.3× 152 0.8× 136 1.1× 108 1.3× 64 1.0× 57 521
A. M. Marakhtanov United States 9 424 1.1× 151 0.8× 113 0.9× 174 2.1× 70 1.1× 15 447
K. T. A. L. Burm Netherlands 10 283 0.8× 95 0.5× 145 1.2× 120 1.5× 56 0.9× 24 396
Masahiro Tadokoro Japan 8 228 0.6× 117 0.6× 116 1.0× 49 0.6× 45 0.7× 27 346
Jérôme Bredin France 10 443 1.2× 99 0.5× 111 0.9× 192 2.3× 77 1.3× 13 532
Min-Hyong Lee South Korea 12 674 1.8× 379 2.0× 192 1.6× 101 1.2× 93 1.5× 21 710
Ken Collins United States 14 618 1.6× 293 1.5× 156 1.3× 167 2.0× 75 1.2× 30 630
Alex Paterson United States 14 542 1.4× 209 1.1× 129 1.1× 97 1.2× 100 1.6× 24 571
A. Schwabedissen Germany 11 333 0.9× 175 0.9× 73 0.6× 113 1.4× 128 2.1× 24 413
Sebastian Wilczek Germany 12 611 1.6× 227 1.2× 246 2.0× 168 2.0× 41 0.7× 27 633

Countries citing papers authored by H. Y. Chang

Since Specialization
Citations

This map shows the geographic impact of H. Y. Chang's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by H. Y. Chang with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites H. Y. Chang more than expected).

Fields of papers citing papers by H. Y. Chang

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by H. Y. Chang. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by H. Y. Chang. The network helps show where H. Y. Chang may publish in the future.

Co-authorship network of co-authors of H. Y. Chang

This figure shows the co-authorship network connecting the top 25 collaborators of H. Y. Chang. A scholar is included among the top collaborators of H. Y. Chang based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with H. Y. Chang. H. Y. Chang is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Cheng, Yu‐Chi, Yu‐Hsien Chen, Sheng‐Jye Hwang, et al.. (2024). Accurate numerical simulations of capillary underfill process for flip-chip packages. Engineering With Computers. 41(6). 4043–4060. 2 indexed citations
2.
Hwang, Sheng‐Jye, et al.. (2024). Analysis of flip-chip ball grid array underfill flow process. The International Journal of Advanced Manufacturing Technology. 134(9-10). 4851–4870. 4 indexed citations
3.
Cheng, Yu‐Chi, Sheng‐Jye Hwang, H. Y. Chang, et al.. (2024). Effect of flip-chip ball grid array structure on capillary underfill flow. Results in Engineering. 23. 102527–102527. 6 indexed citations
4.
Chen, Dao-Long, et al.. (2023). A Study of Underfill Dispensing Patterns in Flip-Chip Packaging. 115–116. 2 indexed citations
5.
Kim, Dong Wook, et al.. (2016). Computational comparative study of microwave probes for plasma density measurement. Plasma Sources Science and Technology. 25(3). 35026–35026. 19 indexed citations
6.
Chang, H. Y., et al.. (2014). Advanced plasma sources for the future 450mm etch process. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9054. 90540K–90540K. 2 indexed citations
7.
You, Ki-Pyo, et al.. (2012). Fast measurement of a pulsed plasma using a Fourier cutoff probe. Journal of Instrumentation. 7(4). C04022–C04022. 2 indexed citations
8.
Seo, SungYong, et al.. (2011). The characteristics of the multi-hole RF capacitively coupled plasma discharged with neon, argon and krypton. Thin Solid Films. 519(20). 6955–6959. 18 indexed citations
9.
You, S. J., et al.. (2010). Evolution of electron temperature in low pressure magnetized capacitive plasma. Applied Physics Letters. 96(10). 19 indexed citations
10.
You, S. J., et al.. (2005). Control of Electron Density and Temperature with a Modified Capacitive Discharge. Plasma Chemistry and Plasma Processing. 25(3). 245–254. 3 indexed citations
11.
Lee, Daesu, Young‐Kyun Lee, & H. Y. Chang. (2004). Characteristics of an inductively coupled plasma source using a parallel resonance antenna. Plasma Sources Science and Technology. 13(4). 701–706. 8 indexed citations
12.
You, S. J., Sung‐Soo Kim, & H. Y. Chang. (2004). Low energy electron cooling induced by a magnetic field in high pressure capacitive radio frequency discharges. Applied Physics Letters. 85(21). 4872–4874. 28 indexed citations
13.
Chung, Chin‐Wook, et al.. (2004). Experimental measurement of the electron energy distribution function in the radio frequency electron cyclotron resonance inductive discharge. Physical Review E. 69(1). 16406–16406. 19 indexed citations
14.
You, S. J., et al.. (2004). Study on the mode transitions for rf power dissipation in capacitively coupled plasma. Surface and Coatings Technology. 193(1-3). 81–87. 13 indexed citations
15.
Chang, H. Y., et al.. (2002). Control and analysis of ion species in N2 inductively coupled plasma with inert gas mixing. Applied Physics Letters. 80(21). 3907–3909. 24 indexed citations
16.
Chang, H. Y., et al.. (2000). Si etching rate calculation for low pressure high density plasma source using Cl2 gas. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 18(5). 2224–2229. 3 indexed citations
17.
Seo, SungYong, et al.. (1999). Electron temperature control with grid bias in inductively coupled argon plasma. Physics of Plasmas. 6(3). 1017–1028. 57 indexed citations
18.
Chang, H. Y., et al.. (1994). Relation between the plasma flow velocity and ion collection of Mach probes. Physics Letters A. 185(4). 428–430. 3 indexed citations
19.
Casperson, D. E., H. Y. Chang, V. W. Hughes, et al.. (1974). Behavior of Positive Muons in Liquid Helium. Physical Review Letters. 33(10). 572–574. 7 indexed citations
20.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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