Ryu Hasunuma

483 total citations
75 papers, 354 citations indexed

About

Ryu Hasunuma is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Ryu Hasunuma has authored 75 papers receiving a total of 354 indexed citations (citations by other indexed papers that have themselves been cited), including 65 papers in Electrical and Electronic Engineering, 23 papers in Atomic and Molecular Physics, and Optics and 15 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Ryu Hasunuma's work include Semiconductor materials and devices (57 papers), Integrated Circuits and Semiconductor Failure Analysis (17 papers) and Copper Interconnects and Reliability (15 papers). Ryu Hasunuma is often cited by papers focused on Semiconductor materials and devices (57 papers), Integrated Circuits and Semiconductor Failure Analysis (17 papers) and Copper Interconnects and Reliability (15 papers). Ryu Hasunuma collaborates with scholars based in Japan, United States and Belgium. Ryu Hasunuma's co-authors include Kikuo Yamabe, Hiroshi Tokumoto, Tadahiro Komeda, Kazushi Miki, Yasushiro Nishioka, Atsushi Ando, Yusuke Hayashi, Norio Tokuda, Junichi Okamoto and Mitsuru Sometani and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

Ryu Hasunuma

69 papers receiving 338 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Ryu Hasunuma Japan 10 273 121 101 59 55 75 354
Abdennaceur Karoui United States 12 230 0.8× 84 0.7× 184 1.8× 59 1.0× 63 1.1× 45 333
Tomo Ueno Japan 11 288 1.1× 61 0.5× 217 2.1× 61 1.0× 54 1.0× 36 358
Hiroaki Saitoh Japan 11 297 1.1× 104 0.9× 129 1.3× 62 1.1× 85 1.5× 24 382
Grazia Litrico Italy 11 323 1.2× 65 0.5× 104 1.0× 80 1.4× 37 0.7× 41 384
Cory S. Wajda United States 11 385 1.4× 55 0.5× 172 1.7× 81 1.4× 39 0.7× 46 419
S. Escoubas France 11 281 1.0× 84 0.7× 127 1.3× 30 0.5× 136 2.5× 42 371
Rafal Dylewicz United Kingdom 10 229 0.8× 130 1.1× 63 0.6× 36 0.6× 76 1.4× 36 317
Chih Hang Tung Singapore 7 473 1.7× 71 0.6× 138 1.4× 42 0.7× 43 0.8× 14 517
Sheng Teng Hsu United States 11 285 1.0× 86 0.7× 208 2.1× 59 1.0× 78 1.4× 42 377
P. Y. Hung United States 10 519 1.9× 76 0.6× 228 2.3× 39 0.7× 58 1.1× 29 576

Countries citing papers authored by Ryu Hasunuma

Since Specialization
Citations

This map shows the geographic impact of Ryu Hasunuma's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Ryu Hasunuma with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Ryu Hasunuma more than expected).

Fields of papers citing papers by Ryu Hasunuma

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Ryu Hasunuma. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Ryu Hasunuma. The network helps show where Ryu Hasunuma may publish in the future.

Co-authorship network of co-authors of Ryu Hasunuma

This figure shows the co-authorship network connecting the top 25 collaborators of Ryu Hasunuma. A scholar is included among the top collaborators of Ryu Hasunuma based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Ryu Hasunuma. Ryu Hasunuma is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Uedono, Akira, et al.. (2024). Annealing behaviors of open spaces and gas desorption in chemical vapor deposited SiO2 studied with monoenergetic positron beams. Journal of Applied Physics. 136(4). 1 indexed citations
2.
Hasunuma, Ryu, et al.. (2024). Evaluation of electron–phonon coupling strength and average phonon energy in MoS2 thin film. Japanese Journal of Applied Physics. 63(12). 12SP25–12SP25.
3.
Harashima, Yosuke, Hiroaki Koga, Zeyuan Ni, et al.. (2023). Finite temperature effects on the structural stability of Si-doped HfO2 using first-principles calculations. Applied Physics Letters. 122(26). 1 indexed citations
4.
Harashima, Yosuke, Hiroaki Koga, Zeyuan Ni, et al.. (2022). Systematic Search for Stabilizing Dopants in ZrO2 and HfO2 Using First-Principles Calculations. 54. 1–3.
5.
Uedono, Akira, Ryu Hasunuma, Yosuke Harashima, et al.. (2022). Vacancy-type defects in TiN/ZrO2/TiN capacitors probed by monoenergetic positron beams. Thin Solid Films. 762. 139557–139557. 5 indexed citations
6.
Sometani, Mitsuru, et al.. (2021). Free carrier density enhancement of 4H-SiC Si-face MOSFET by Ba diffusion process and NO passivation. Japanese Journal of Applied Physics. 60(SB). SBBD08–SBBD08. 2 indexed citations
7.
Yamashita, Yoshiyuki, et al.. (2019). Relationship between band-offset, gate leakage current, and interface states density at SiO2/4H-SiC (000-1) interface. AIP Advances. 9(4). 4 indexed citations
8.
Hasunuma, Ryu, et al.. (2016). Characterization of Interface State Density of SiO2/SiC (000-1) Based on Oxygen Concentration at the Interface during Thermal Oxidation. ECS Transactions. 75(12). 201–206. 1 indexed citations
9.
Hasunuma, Ryu, et al.. (2014). Oxidation characteristics of silicon exposed to O(1D2) and O(3P2) radicals and stress-relaxation oxidation model for O(1D2) radicals. Japanese Journal of Applied Physics. 53(3). 31501–31501. 1 indexed citations
10.
Hasunuma, Ryu, Yusuke Hayashi, Masahiro Ota, & Kikuo Yamabe. (2013). Microscopic Thickness Uniformity and Time-Dependent Dielectric Breakdown Lifetime Dispersion of Thermally Grown Ultrathin SiO. Japanese Journal of Applied Physics. 52(3). 4 indexed citations
11.
Hasunuma, Ryu & Kikuo Yamabe. (2013). Evaluation of Kink Generation Rate and Step Flow Velocity on Si(111) during Wet Etching. Japanese Journal of Applied Physics. 52(11R). 110127–110127. 2 indexed citations
12.
Hasunuma, Ryu, et al.. (2012). Two-Dimensional Roughness Growth at Surface and Interface of SiO<sub>2</sub> Films during Thermal Oxidation of 4H-SiC(0001). Materials science forum. 717-720. 785–788. 4 indexed citations
13.
14.
Hasunuma, Ryu, et al.. (2011). Generation and Growth of Atomic-Scale Roughness at Surface and Interface of Silicon Dioxide Thermally Grown on Atomically Flat Si Surface. Key engineering materials. 470. 110–116. 3 indexed citations
15.
Hasunuma, Ryu, Tsuyoshi Nomura, Kenji Ohmori, et al.. (2010). (Invited) Degradation in HfSiON Film Induced by Electrical Stress Application. ECS Transactions. 28(2). 263–272. 1 indexed citations
16.
Hayashi, T., et al.. (2009). Vestiges of Multiple Progressive Dielectric Breakdown on HfSiON Surfaces. Japanese Journal of Applied Physics. 48(5S1). 05DD02–05DD02. 4 indexed citations
17.
Hasunuma, Ryu, et al.. (2005). Utilization of Si atomic steps for Cu nanowire fabrication. Science and Technology of Advanced Materials. 6(6). 667–670. 3 indexed citations
18.
Hasunuma, Ryu, Junichi Okamoto, Norio Tokuda, & Kikuo Yamabe. (2004). Nonuniformity in Ultrathin SiO2on Si(111) Characterized by Conductive Atomic Force Microscopy. Japanese Journal of Applied Physics. 43(11B). 7861–7865. 20 indexed citations
19.
Hasunuma, Ryu, et al.. (1997). Formation of Si nanowire by atomic manipulation with a high temperature scanning tunneling microscope. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 15(4). 1437–1441. 20 indexed citations
20.
Endo, Kazuhiko, et al.. (1993). Extremely high vacuum system for dynamical surface analysis. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 11(5). 2655–2658. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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