N. V. Edwards
Impact in
- Condensed Matter Physics top 5%
- GaN-based semiconductor devices and materials
- Surfaces, Coatings and Films top 5%
- Electron and X-Ray Spectroscopy Techniques
Papers in
-
- Semiconductor materials and devices 16
- Silicon Carbide Semiconductor Technologies 10
- Advancements in Photolithography Techniques 5
-
- GaN-based semiconductor devices and materials 19
- Co-authors
- Theodore E. Madey (3 shared papers)D. E. Aspnes (16 shared papers)M. D. Bremser (16 shared papers)R. F. Davis (16 shared papers)N. S. Faradzhev (1 shared paper)B. V. Yakshinskiy (1 shared paper)S. Bajt (3 shared papers)J. Kulik (4 shared papers)
- Journals
- Applied Physics Letters (6 papers)Thin Solid Films (4 papers)Journal of The Electrochemical Society (2 papers)Journal of Applied Physics (2 papers)Journal of Electronic Materials (2 papers)
- Partner nations
- United StatesSwedenGermany
In The Last Decade
N. V. Edwards
46 papers receiving 838 citations
Peers
Comparison fields: 5 of 42
- Condensed Matter Physics 279
- Surfaces, Coatings and Films 111
- Electrical and Electronic Engineering 582
- Electronic, Optical and Magnetic Materials 176
- Structural Biology 11
Countries citing papers authored by N. V. Edwards
This map shows the geographic impact of N. V. Edwards's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by N. V. Edwards with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites N. V. Edwards more than expected).
Fields of papers citing papers by N. V. Edwards
This network shows the impact of papers produced by N. V. Edwards. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by N. V. Edwards. The network helps show where N. V. Edwards may publish in the future.
Co-authors
The 25 scholars most cited alongside N. V. Edwards, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 46 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2004 | 148 | |
| 2 | 2006 | 101 | |
| 3 | 1996 | 85 | |
| 4 | 2007 | 60 | |
| 5 | 2003 | 53 | |
| 6 | 1996 | 52 | |
| 7 | 1997 | 38 | |
| 8 | 1998 | 34 | |
| 9 | 2003 | 33 | |
| 10 | 2000 | 24 | |
| 11 | 2002 | 21 | |
| 12 | 2001 | 21 | |
| 13 | 2005 | 19 | |
| 14 | 2004 | 13 | |
| 15 | 2003 | 13 | |
| 16 | 2004 | 11 | |
| 17 | 2001 | 11 | |
| 18 | 2001 | 11 | |
| 19 | 1995 | 11 | |
| 20 | 2002 | 10 |
About N. V. Edwards
N. V. Edwards is a scholar working on Electrical and Electronic Engineering, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials and Materials Chemistry, having authored 46 papers that have together received 877 indexed citations. Recurring topics across this work include GaN-based semiconductor devices and materials (19 papers), Semiconductor materials and devices (16 papers), Semiconductor Quantum Structures and Devices (11 papers), Silicon Carbide Semiconductor Technologies (10 papers), Ga2O3 and related materials (9 papers), Metal and Thin Film Mechanics (8 papers), Copper Interconnects and Reliability (7 papers) and Advancements in Photolithography Techniques (5 papers). The work is most often cited by research in Condensed Matter Physics (279 citations), Surfaces, Coatings and Films (111 citations), Electrical and Electronic Engineering (582 citations), Electronic, Optical and Magnetic Materials (176 citations) and Structural Biology (11 citations). N. V. Edwards has collaborated with scholars based in United States, Sweden and Germany. Frequent co-authors include Theodore E. Madey, D. E. Aspnes, M. D. Bremser, R. F. Davis, N. S. Faradzhev, B. V. Yakshinskiy, S. Bajt, J. Kulik, R. Gregory and W. G. Perry. Their work appears in journals such as Applied Physics Letters, Thin Solid Films, Journal of The Electrochemical Society, Journal of Applied Physics and Journal of Electronic Materials.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.