M.E. Elta

1.1k total citations
41 papers, 582 citations indexed

About

M.E. Elta is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Biomedical Engineering. According to data from OpenAlex, M.E. Elta has authored 41 papers receiving a total of 582 indexed citations (citations by other indexed papers that have themselves been cited), including 36 papers in Electrical and Electronic Engineering, 13 papers in Atomic and Molecular Physics, and Optics and 9 papers in Biomedical Engineering. Recurrent topics in M.E. Elta's work include Plasma Diagnostics and Applications (17 papers), Semiconductor materials and devices (14 papers) and Semiconductor Quantum Structures and Devices (10 papers). M.E. Elta is often cited by papers focused on Plasma Diagnostics and Applications (17 papers), Semiconductor materials and devices (14 papers) and Semiconductor Quantum Structures and Devices (10 papers). M.E. Elta collaborates with scholars based in United States. M.E. Elta's co-authors include Michael Barnes, G.I. Haddad, Fred L. Terry, J.S. Freudenberg, Pramod P. Khargonekar, James Moyne, Jessy W. Grizzle, M.D. Giles, M.L. Brake and Tyrone L. Vincent and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

M.E. Elta

40 papers receiving 547 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
M.E. Elta United States	15	457	183	78	60	53	41	582
Hiroyuki Kikuchi Japan	14	222 0.5×	159 0.9×	31 0.4×	100 1.7×	8 0.2×	56	637
Sergio Pissanetzky United States	11	140 0.3×	112 0.6×	102 1.3×	55 0.9×	17 0.3×	50	408
M.L. Brake United States	11	281 0.6×	130 0.7×	50 0.6×	118 2.0×	22 0.4×	51	394
Horacio Lamela Spain	14	636 1.4×	267 1.5×	36 0.5×	66 1.1×	14 0.3×	145	859
Craig Olson United States	14	251 0.5×	239 1.3×	15 0.2×	29 0.5×	181 3.4×	50	535
Matthew Domonkos United States	17	568 1.2×	154 0.8×	99 1.3×	143 2.4×	42 0.8×	62	725
A. Ya. Énder Russia	12	263 0.6×	290 1.6×	63 0.8×	48 0.8×	107 2.0×	69	473
C.W. Trowbridge United Kingdom	15	560 1.2×	228 1.2×	10 0.1×	147 2.5×	69 1.3×	48	830
J. Z. Gleizer Israel	17	639 1.4×	379 2.1×	319 4.1×	74 1.2×	373 7.0×	48	797
John P. D’Angelo United States	19	386 0.8×	189 1.0×	8 0.1×	100 1.7×	56 1.1×	95	1.2k

Countries citing papers authored by M.E. Elta

Since Specialization

Citations

This map shows the geographic impact of M.E. Elta's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by M.E. Elta with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites M.E. Elta more than expected).

Fields of papers citing papers by M.E. Elta

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by M.E. Elta. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by M.E. Elta. The network helps show where M.E. Elta may publish in the future.

Co-authorship network of co-authors of M.E. Elta

This figure shows the co-authorship network connecting the top 25 collaborators of M.E. Elta. A scholar is included among the top collaborators of M.E. Elta based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with M.E. Elta. M.E. Elta is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

Sort: Min cites: Since: Top N: Style:

20 of 20 papers shown

Chu, A., et al.. (2005). A Two-Stage Monolithic IF Amplifier Utilizing a High Dielectric Constant Capacitor. 82. 61–63. 2 indexed citations

Vincent, Tyrone L., et al.. (2005). Nonlinear system identification and control of a reactive ion etcher. 1. 902–906. 9 indexed citations

Pender, J., et al.. (2005). Correlating Plasma Emissivity And Etch Depth*. 215–215.

Khargonekar, Pramod P., et al.. (2002). Real-time control of reactive ion etching: identification and disturbance rejection. 3379–3385. 3 indexed citations

Freudenberg, J.S., et al.. (1995). Real-time feedback for sidewall profile control in reactive ion etching. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 13(3). 1792–1796. 10 indexed citations

Fogler, H. Scott, et al.. (1995). High‐temperature kinetic study for the reactive ion etching of InP in BCl₃/Ar/O₂. AIChE Journal. 41(3). 658–665. 1 indexed citations

Moyne, James, et al.. (1994). Run-to-run control framework for VLSI manufacturing. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2091. 379–379. 13 indexed citations

Elta, M.E., J.S. Freudenberg, M.D. Giles, et al.. (1993). Applications of Control to Semiconductor Manufacturing: Reactive Ion Etching. 2990–2997. 15 indexed citations

Elta, M.E., et al.. (1992). Utilizing a portable cycle purge nitrogen venturi for removal of process gases in semiconductor processing gas systems. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 10(5). 3376–3377. 2 indexed citations

10.

Elta, M.E., et al.. (1991). A solution for pressure variations in vacuum process tools due to pressure regulator fluctuations. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 9(2). 358–359. 2 indexed citations

11.

Cheng, Jie, et al.. (1991). <title>Expert system and process optimization techniques for real-time monitoring and control of plasma processes</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1392. 373–384. 1 indexed citations

12.

Fogler, H. Scott, et al.. (1991). Enhanced Etching of Group III–V Semiconductors by Oscillating with Sputter Etching and Reactive Ion Etching. Journal of The Electrochemical Society. 138(4). 1143–1146. 1 indexed citations

13.

Terry, Fred L., et al.. (1990). In situ Wafer Monitoring For Plasma Etching. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1185. 234–234. 1 indexed citations

14.

Elta, M.E., et al.. (1990). Reactive-ion-etch profile evolution determined by a Monte Carlo microtopography model. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 8(3). 523–528. 2 indexed citations

15.

Dogan, N.S., J.R. East, M.E. Elta, & G.I. Haddad. (1987). Millimeter Wave Heterojunction MITATT Diodes. 26. 973–976. 3 indexed citations

16.

Dogan, N.S., J.R. East, M.E. Elta, & G.I. Haddad. (1987). Millimeter-Wave Heterojunction MITATT Diodes. IEEE Transactions on Microwave Theory and Techniques. 35(12). 1308–1315. 9 indexed citations

17.

Barnes, Michael, et al.. (1987). Large-signal time-domain modeling of low-pressure rf glow discharges. Journal of Applied Physics. 61(1). 81–89. 122 indexed citations

18.

Chu, A., et al.. (1983). A two-stage monolithic IF amplifier utilizing a Ta₂O₅capacitor. IEEE Transactions on Electron Devices. 30(1). 21–26. 2 indexed citations

19.

Blakey, P.A., J.R. East, M.E. Elta, & G.I. Haddad. (1983). Implications of velocity overshoot in heterojunction transit-time diodes. Electronics Letters. 19(14). 510–512. 4 indexed citations

20.

Elta, M.E.. (1978). The Effect Of Mixed Tunneling And Avalanche Breakdown On Microwave Transit-time Diodes.. Deep Blue (University of Michigan). 9 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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