L.A. Donohue
- Mechanics of Materials top 1%
- Materials Chemistry top 5%
- Mechanical Engineering top 5%
- Electrical and Electronic Engineering
- Aerospace Engineering top 10%
- Topics
- Metal and Thin Film Mechanics (20 papers)Diamond and Carbon-based Materials Research (15 papers)Semiconductor materials and devices (7 papers)
- Journals
- Surface and Coatings TechnologyJournal of Vacuum Science & Technology A Vacuum Surfaces and FilmsVacuum
- Partner nations
- United KingdomUnited StatesGermany
In The Last Decade
L.A. Donohue
22 papers receiving 955 citations
Peers
Comparison fields: 5 of 27
- Mechanics of Materials 920
- Materials Chemistry 784
- Mechanical Engineering 344
- Electrical and Electronic Engineering 210
- Aerospace Engineering 100
Countries citing papers authored by L.A. Donohue
This map shows the geographic impact of L.A. Donohue's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by L.A. Donohue with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites L.A. Donohue more than expected).
Fields of papers citing papers by L.A. Donohue
This network shows the impact of papers produced by L.A. Donohue. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by L.A. Donohue. The network helps show where L.A. Donohue may publish in the future.
Co-authorship network of co-authors of L.A. Donohue
This figure shows the co-authorship network connecting the top 25 collaborators of L.A. Donohue. A scholar is included among the top collaborators of L.A. Donohue based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with L.A. Donohue. L.A. Donohue is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | Investigation of PVD-DLC Thin Films Manufactured Using HIPIMS Etch / Unbalanced Magnetron Sputter (UBM) Deposition and Secondary Mechano-Chemical Modification | 2 |
| 2 | 10 | |
| 3 | 20 | |
| 4 | 29 | |
| 5 | 103 | |
| 6 | 48 | |
| 7 | 51 | |
| 8 | 42 | |
| 9 | 61 | |
| 10 | 47 | |
| 11 | 41 | |
| 12 | 9 | |
| 13 | 174 | |
| 14 | 57 | |
| 15 | 104 | |
| 16 | 3 | |
| 17 | 25 | |
| 18 | 57 | |
| 19 | 33 | |
| 20 | 1 |
About L.A. Donohue
L.A. Donohue is a scholar working on Mechanics of Materials, Condensed Matter Physics and Materials Chemistry, having authored 22 papers that have together received 1000 indexed citations. Recurring topics across this work include Metal and Thin Film Mechanics (20 papers), Diamond and Carbon-based Materials Research (15 papers) and Semiconductor materials and devices (7 papers). The work is most often cited by research in Mechanics of Materials (920 citations), Materials Chemistry (784 citations) and Mechanical Engineering (344 citations). L.A. Donohue has collaborated with scholars based in United Kingdom, United States and Germany. Frequent co-authors include W.‐D. Münz, I.J. Smith, I. Petrov, D.B. Lewis, P.Eh. Hovsepian, J. E. Greene, J. Cawley, I. Wadsworth, John S. Brooks and J. Yarwood. Their work appears in journals such as Surface and Coatings Technology, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films and Vacuum.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.