Karl D. Hirschman
- Materials Chemistry top 5%
- Electrical and Electronic Engineering top 5%
- Biomedical Engineering top 2%
- Atomic and Molecular Physics, and Optics top 10%
- Nuclear Energy and Engineering top 0.5%
- Co-authors
- Philippe M. FauchetL. TsybeskovS. P. DuttaguptaMargit ZachariasChuan PengL.L. GadekenJ. BläsingW. Sun
- Topics
- Silicon Nanostructures and Photoluminescence (36 papers)Thin-Film Transistor Technologies (30 papers)Semiconductor materials and devices (30 papers)
- Partner nations
- United StatesCanadaGermany
In The Last Decade
Karl D. Hirschman
77 papers receiving 1.9k citations
Hit Papers
Peers
Comparison fields: 5 of 52
- Materials Chemistry 1.6k
- Electrical and Electronic Engineering 1.4k
- Biomedical Engineering 1.1k
- Atomic and Molecular Physics, and Optics 334
- Nuclear Energy and Engineering 119
Countries citing papers authored by Karl D. Hirschman
This map shows the geographic impact of Karl D. Hirschman's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Karl D. Hirschman with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Karl D. Hirschman more than expected).
Fields of papers citing papers by Karl D. Hirschman
This network shows the impact of papers produced by Karl D. Hirschman. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Karl D. Hirschman. The network helps show where Karl D. Hirschman may publish in the future.
Co-authorship network of co-authors of Karl D. Hirschman
This figure shows the co-authorship network connecting the top 25 collaborators of Karl D. Hirschman. A scholar is included among the top collaborators of Karl D. Hirschman based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Karl D. Hirschman. Karl D. Hirschman is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 0 | |
| 2 | 0 | |
| 3 | 1 | |
| 4 | 2 | |
| 5 | 2 | |
| 6 | 3 | |
| 7 | 2 | |
| 8 | 1 | |
| 9 | 9 | |
| 10 | 1 | |
| 11 | 4 | |
| 12 | 13 | |
| 13 | 4 | |
| 14 | 3 | |
| 15 | 125 | |
| 16 | 3 | |
| 17 | 7 | |
| 18 | 159 | |
| 19 | 119 | |
| 20 | 2 |
About Karl D. Hirschman
Karl D. Hirschman is a scholar working on Nuclear Energy and Engineering, Media Technology and Electrical and Electronic Engineering, having authored 85 papers that have together received 1.9k indexed citations. Recurring topics across this work include Silicon Nanostructures and Photoluminescence (36 papers), Thin-Film Transistor Technologies (30 papers) and Semiconductor materials and devices (30 papers). The work is most often cited by research in Nuclear Energy and Engineering (119 citations), Materials Chemistry (1.6k citations) and Electrical and Electronic Engineering (1.4k citations). Karl D. Hirschman has collaborated with scholars based in United States, Canada and Germany. Frequent co-authors include Philippe M. Fauchet, L. Tsybeskov, S. P. Duttagupta, Margit Zacharias, Chuan Peng, L.L. Gadeken, J. Bläsing, W. Sun, Peter Veit and D. J. Lockwood. Their work appears in journals such as Nature, Advanced Materials and Applied Physics Letters.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.