K. Tse

515 total citations
13 papers, 421 citations indexed

About

K. Tse is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, K. Tse has authored 13 papers receiving a total of 421 indexed citations (citations by other indexed papers that have themselves been cited), including 13 papers in Electrical and Electronic Engineering, 6 papers in Materials Chemistry and 3 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in K. Tse's work include Semiconductor materials and devices (13 papers), Advancements in Semiconductor Devices and Circuit Design (7 papers) and Electronic and Structural Properties of Oxides (6 papers). K. Tse is often cited by papers focused on Semiconductor materials and devices (13 papers), Advancements in Semiconductor Devices and Circuit Design (7 papers) and Electronic and Structural Properties of Oxides (6 papers). K. Tse collaborates with scholars based in United Kingdom, Belgium and United States. K. Tse's co-authors include John Robertson, K. Xiong, Dameng Liu, Yang Du, P. W. Peacock, Onise Sharia, Alexander A. Demkov and Ka Xiong and has published in prestigious journals such as Physical Review Letters, Applied Physics Letters and Journal of Applied Physics.

In The Last Decade

K. Tse

13 papers receiving 412 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
K. Tse United Kingdom	10	384	200	85	34	13	13	421
K. Santhosh Kumar India	10	329 0.9×	327 1.6×	82 1.0×	25 0.7×	12 0.9×	22	367
E. Igumbor South Africa	11	254 0.7×	199 1.0×	166 2.0×	38 1.1×	13 1.0×	44	361
S. Shamuilia Belgium	11	348 0.9×	225 1.1×	77 0.9×	97 2.9×	10 0.8×	16	389
Myungchul Oh South Korea	9	118 0.3×	175 0.9×	55 0.6×	38 1.1×	22 1.7×	30	234
L.B. La United States	7	399 1.0×	170 0.8×	48 0.6×	42 1.2×	10 0.8×	13	413
А. Н. Георгобиани Russia	9	190 0.5×	290 1.4×	66 0.8×	83 2.4×	12 0.9×	52	333
Wei‐Yan Cong China	11	250 0.7×	295 1.5×	64 0.8×	43 1.3×	16 1.2×	32	355
A. Šileika Lithuania	9	286 0.7×	256 1.3×	171 2.0×	39 1.1×	15 1.2×	22	347
P. Sivasubramani United States	11	424 1.1×	245 1.2×	63 0.7×	64 1.9×	10 0.8×	26	445
V. D. Prochukhan Russia	10	242 0.6×	213 1.1×	112 1.3×	63 1.9×	12 0.9×	24	312

Countries citing papers authored by K. Tse

Since Specialization

Citations

This map shows the geographic impact of K. Tse's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by K. Tse with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites K. Tse more than expected).

Fields of papers citing papers by K. Tse

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by K. Tse. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by K. Tse. The network helps show where K. Tse may publish in the future.

Co-authorship network of co-authors of K. Tse

This figure shows the co-authorship network connecting the top 25 collaborators of K. Tse. A scholar is included among the top collaborators of K. Tse based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with K. Tse. K. Tse is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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13 of 13 papers shown

1.

Tse, K., Dameng Liu, & John Robertson. (2010). Electronic and atomic structure of metal-HfO2interfaces. Physical Review B. 81(3). 21 indexed citations

2.

Sharia, Onise, K. Tse, John Robertson, & Alexander A. Demkov. (2009). Extended Frenkel pairs and band alignment at metal-oxide interfaces. Physical Review B. 79(12). 30 indexed citations

3.

Tse, K. & John Robertson. (2007). Control of Schottky Barrier Heights on High-KGate Dielectrics for Future Complementary Metal-Oxide Semiconductor Devices. Physical Review Letters. 99(8). 45 indexed citations

4.

Xiong, K., Yang Du, K. Tse, & John Robertson. (2007). Defect states in the high-dielectric-constant gate oxide HfSiO4. Journal of Applied Physics. 101(2). 55 indexed citations

5.

Tse, K., Dameng Liu, K. Xiong, & John Robertson. (2007). Oxygen vacancies in high-k oxides. Microelectronic Engineering. 84(9-10). 2028–2031. 81 indexed citations

6.

Robertson, John, Ka Xiong, & K. Tse. (2007). Importance of Oxygen Vacancies in High K Gate Dielectrics. 3 indexed citations

7.

Tse, K. & John Robertson. (2007). Defects and their passivation in high K gate oxides. Microelectronic Engineering. 84(4). 663–668. 24 indexed citations

8.

Tse, K. & John Robertson. (2007). Work function control at metal high-dielectric-constant gate oxide interfaces. Microelectronic Engineering. 85(1). 9–14. 7 indexed citations

9.

Liu, Dameng, K. Tse, & John Robertson. (2007). Electronic structure and defects of high dielectric constant gate oxide La2Hf2O7. Applied Physics Letters. 90(6). 27 indexed citations

10.

Tse, K. & John Robertson. (2006). Interfacial atomic structures, energetics and band offsets of Ge:ZrO2 interfaces. Journal of Applied Physics. 100(9). 13 indexed citations

11.

Tse, K. & John Robertson. (2006). Defect passivation in HfO2 gate oxide by fluorine. Applied Physics Letters. 89(14). 57 indexed citations

12.

Peacock, P. W., K. Xiong, K. Tse, & John Robertson. (2006). Bonding and interface states ofSi:HfO2andSi:ZrO2interfaces. Physical Review B. 73(7). 54 indexed citations

13.

Tse, K. & John Robertson. (2006). Work function control at metal–oxide interfaces in CMOS. Materials Science in Semiconductor Processing. 9(6). 964–968. 4 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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