John D. Williams
- Electrical and Electronic Engineering top 10%
- Biomedical Engineering top 10%
- Molecular Biology
- Atomic and Molecular Physics, and Optics
- Materials Chemistry
- Co-authors
- Muhammad S. KhanNoura S. DosokyW. WangMichael F. MitchellA. K. BoseDinesh MaddipatlaBinu B. NarakathuMassood Z. Atashbar
- Topics
- Optical Coatings and Gratings (8 papers)Photonic and Optical Devices (6 papers)Photonic Crystals and Applications (6 papers)
- Partner nations
- United StatesKazakhstanUnited Kingdom
In The Last Decade
John D. Williams
42 papers receiving 675 citations
Peers
Comparison fields: 5 of 77
- Electrical and Electronic Engineering 399
- Biomedical Engineering 391
- Molecular Biology 105
- Atomic and Molecular Physics, and Optics 94
- Materials Chemistry 90
Countries citing papers authored by John D. Williams
This map shows the geographic impact of John D. Williams's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by John D. Williams with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites John D. Williams more than expected).
Fields of papers citing papers by John D. Williams
This network shows the impact of papers produced by John D. Williams. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by John D. Williams. The network helps show where John D. Williams may publish in the future.
Co-authorship network of co-authors of John D. Williams
This figure shows the co-authorship network connecting the top 25 collaborators of John D. Williams. A scholar is included among the top collaborators of John D. Williams based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with John D. Williams. John D. Williams is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 46 | |
| 2 | 46 | |
| 3 | 118 | |
| 4 | 33 | |
| 5 | 8 | |
| 6 | Investigations on transmembrane ion channels suspended over porous silicon membranes | 1 |
| 7 | 15 | |
| 8 | 5 | |
| 9 | 2 | |
| 10 | 2 | |
| 11 | 4 | |
| 12 | 8 | |
| 13 | 5 | |
| 14 | 1 | |
| 15 | 59 | |
| 16 | 38 | |
| 17 | 24 | |
| 18 | 2 | |
| 19 | 3 | |
| 20 | 7 |
About John D. Williams
John D. Williams is a scholar working on Surfaces, Coatings and Films, Bioengineering and Biomedical Engineering, having authored 42 papers that have together received 702 indexed citations. Recurring topics across this work include Optical Coatings and Gratings (8 papers), Photonic and Optical Devices (6 papers) and Photonic Crystals and Applications (6 papers). The work is most often cited by research in Bioengineering (81 citations), Biomedical Engineering (391 citations) and Electrical and Electronic Engineering (399 citations). John D. Williams has collaborated with scholars based in United States, Kazakhstan and United Kingdom. Frequent co-authors include Muhammad S. Khan, Noura S. Dosoky, W. Wang, Michael F. Mitchell, A. K. Bose, Dinesh Maddipatla, Binu B. Narakathu, Massood Z. Atashbar, X. Zhang and Bakhrom K. Berdiev. Their work appears in journals such as Applied Physics Letters, Journal of Applied Physics and Langmuir.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.