J.‐F. Lelièvre
- Electrical and Electronic Engineering top 5%
- Materials Chemistry
- Atomic and Molecular Physics, and Optics top 10%
- Biomedical Engineering
- Surfaces, Coatings and Films top 10%
- Co-authors
- M. LemitiA. KaminskiErwann FourmondCarlos del CañizoD. BallutaudJasmin HofstetterAlain FaveO. Nichiporuk
- Topics
- Silicon and Solar Cell Technologies (19 papers)Thin-Film Transistor Technologies (17 papers)Silicon Nanostructures and Photoluminescence (8 papers)
- Partner nations
- FranceSpainUnited States
In The Last Decade
J.‐F. Lelièvre
28 papers receiving 794 citations
Peers
Comparison fields: 5 of 51
- Electrical and Electronic Engineering 725
- Materials Chemistry 309
- Atomic and Molecular Physics, and Optics 200
- Biomedical Engineering 188
- Surfaces, Coatings and Films 77
Countries citing papers authored by J.‐F. Lelièvre
This map shows the geographic impact of J.‐F. Lelièvre's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J.‐F. Lelièvre with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J.‐F. Lelièvre more than expected).
Fields of papers citing papers by J.‐F. Lelièvre
This network shows the impact of papers produced by J.‐F. Lelièvre. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J.‐F. Lelièvre. The network helps show where J.‐F. Lelièvre may publish in the future.
Co-authorship network of co-authors of J.‐F. Lelièvre
This figure shows the co-authorship network connecting the top 25 collaborators of J.‐F. Lelièvre. A scholar is included among the top collaborators of J.‐F. Lelièvre based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with J.‐F. Lelièvre. J.‐F. Lelièvre is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 5 | |
| 2 | 12 | |
| 3 | 4 | |
| 4 | 10 | |
| 5 | 9 | |
| 6 | 2 | |
| 7 | 43 | |
| 8 | 1 | |
| 9 | 144 | |
| 10 | 1 | |
| 11 | 8 | |
| 12 | 1 | |
| 13 | 5 | |
| 14 | 52 | |
| 15 | 24 | |
| 16 | 25 | |
| 17 | 249 | |
| 18 | 1 | |
| 19 | 3 | |
| 20 | 1 |
About J.‐F. Lelièvre
J.‐F. Lelièvre is a scholar working on Electrical and Electronic Engineering, Orthopedics and Sports Medicine and Materials Chemistry, having authored 30 papers that have together received 825 indexed citations. Recurring topics across this work include Silicon and Solar Cell Technologies (19 papers), Thin-Film Transistor Technologies (17 papers) and Silicon Nanostructures and Photoluminescence (8 papers). The work is most often cited by research in Electrical and Electronic Engineering (725 citations), Surfaces, Coatings and Films (77 citations) and Materials Chemistry (309 citations). J.‐F. Lelièvre has collaborated with scholars based in France, Spain and United States. Frequent co-authors include M. Lemiti, A. Kaminski, Erwann Fourmond, Carlos del Cañizo, D. Ballutaud, Jasmin Hofstetter, Alain Fave, O. Nichiporuk, P. Papet and J. Kraiem. Their work appears in journals such as Applied Physics Letters, Applied Surface Science and Solar Energy Materials and Solar Cells.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.