Jeffrey C. Gelpey

429 total citations
33 papers, 317 citations indexed

About

Jeffrey C. Gelpey is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Computational Mechanics. According to data from OpenAlex, Jeffrey C. Gelpey has authored 33 papers receiving a total of 317 indexed citations (citations by other indexed papers that have themselves been cited), including 29 papers in Electrical and Electronic Engineering, 5 papers in Atomic and Molecular Physics, and Optics and 5 papers in Computational Mechanics. Recurrent topics in Jeffrey C. Gelpey's work include Silicon and Solar Cell Technologies (16 papers), Semiconductor materials and devices (14 papers) and Integrated Circuits and Semiconductor Failure Analysis (11 papers). Jeffrey C. Gelpey is often cited by papers focused on Silicon and Solar Cell Technologies (16 papers), Semiconductor materials and devices (14 papers) and Integrated Circuits and Semiconductor Failure Analysis (11 papers). Jeffrey C. Gelpey collaborates with scholars based in United States, Germany and Taiwan. Jeffrey C. Gelpey's co-authors include R. T. Hodgson, Anwesha Choudhury, Clifton G. Fonstad, V. R. Deline, Sebastian Mäder, T. E. Seidel, D. Hodul, W. Lerch, J. Wagner and S. McCoy and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Japanese Journal of Applied Physics.

In The Last Decade

Jeffrey C. Gelpey

31 papers receiving 280 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Jeffrey C. Gelpey United States 10 288 134 62 50 21 33 317
G. Fuse Japan 12 346 1.2× 43 0.3× 56 0.9× 60 1.2× 35 1.7× 41 370
Katsuaki Saito Japan 12 373 1.3× 116 0.9× 55 0.9× 20 0.4× 40 1.9× 24 425
K. Haberger Germany 8 247 0.9× 77 0.6× 94 1.5× 134 2.7× 30 1.4× 21 329
T. Barge France 9 310 1.1× 127 0.9× 105 1.7× 46 0.9× 80 3.8× 22 388
A. Pruijmboom Netherlands 11 330 1.1× 120 0.9× 18 0.3× 26 0.5× 39 1.9× 30 354
Hisashi Ariyoshi Japan 7 480 1.7× 83 0.6× 118 1.9× 73 1.5× 63 3.0× 12 506
Naoki Mitsugi Japan 9 303 1.1× 228 1.7× 29 0.5× 11 0.2× 33 1.6× 27 361
H.R. Grinolds United States 9 313 1.1× 86 0.6× 44 0.7× 10 0.2× 24 1.1× 11 334
Masaru Kanamori Japan 10 464 1.6× 153 1.1× 226 3.6× 41 0.8× 57 2.7× 25 496
D.H. Navon United States 17 551 1.9× 149 1.1× 70 1.1× 13 0.3× 37 1.8× 43 598

Countries citing papers authored by Jeffrey C. Gelpey

Since Specialization
Citations

This map shows the geographic impact of Jeffrey C. Gelpey's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Jeffrey C. Gelpey with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Jeffrey C. Gelpey more than expected).

Fields of papers citing papers by Jeffrey C. Gelpey

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Jeffrey C. Gelpey. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Jeffrey C. Gelpey. The network helps show where Jeffrey C. Gelpey may publish in the future.

Co-authorship network of co-authors of Jeffrey C. Gelpey

This figure shows the co-authorship network connecting the top 25 collaborators of Jeffrey C. Gelpey. A scholar is included among the top collaborators of Jeffrey C. Gelpey based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Jeffrey C. Gelpey. Jeffrey C. Gelpey is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Skorupa, W., et al.. (2011). Temperature Measurement in Rapid Thermal Processing with Focus on the Application to Flash Lamp Annealing. Critical reviews in solid state and materials sciences. 36(2). 102–128. 11 indexed citations
2.
Gelpey, Jeffrey C., et al.. (2008). Ultra-shallow junction formation using flash annealing and advanced doping techniques. 82–86. 9 indexed citations
3.
Lerch, W., S. Paul, S. McCoy, et al.. (2007). Advanced Activation and Deactivation of Arsenic-Implanted Ultra-Shallow Junctions using Flash and Spike + Flash Annealing. Publikationsdatenbank der Fraunhofer-Gesellschaft (Fraunhofer-Gesellschaft). 191–196. 6 indexed citations
4.
Canonico, Marianne, G. K. Celler, Jeffrey C. Gelpey, et al.. (2007). Effects of high-temperature anneals and Co60 gamma-ray irradiation on strained silicon on insulator. Journal of Applied Physics. 102(7). 5 indexed citations
5.
Pichler, P., A. Burenkov, Wilfried Lerch, et al.. (2006). Process-Induced Diffusion Phenomena in Advanced CMOS Technologies. Defect and diffusion forum/Diffusion and defect data, solid state data. Part A, Defect and diffusion forum. 258-260. 510–521. 2 indexed citations
6.
Sommer, H., et al.. (1994). Gas Flow Engineering in Rapid Thermal Processing. MRS Proceedings. 342. 8 indexed citations
7.
Crowley, John L., et al.. (1990). Effect Of Silicon Emissivity On Temperature Measurement And Control In Rapid Thermal Processing. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1189. 64–64. 9 indexed citations
8.
Hodul, D., et al.. (1989). Rapid thermal annealing/chemical vapor deposition and integrated processing. 27 indexed citations
9.
Hamilton, B., T. O. Sedgwick, & Jeffrey C. Gelpey. (1988). Characterisation of Ion Implanted and Thin Epitaxial Layer Structures Using Photoluminescence. MRS Proceedings. 100. 2 indexed citations
10.
Gelpey, Jeffrey C., et al.. (1987). Slip Free Rapid Thermal Processing. MRS Proceedings. 92. 7 indexed citations
11.
Gelpey, Jeffrey C., et al.. (1987). Uniformity characterization of an RTP system. Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms. 21(1-4). 612–617. 2 indexed citations
12.
Blake, J., et al.. (1987). Rapid Thermal Processing of Multiple Low Dose Oxygen Implantations for SIMOX. MRS Proceedings. 107. 2 indexed citations
13.
Araújo, Carlos A. Paz de, et al.. (1987). Comparison of the Growth Kinetics of Oxides Grown in Tungsten-Halogen and Water Cooled Arc Lamp Systems. MRS Proceedings. 92. 2 indexed citations
14.
Gelpey, Jeffrey C., et al.. (1985). Advantages of rapid optical annealing. Canadian Journal of Physics. 63(6). 881–885. 7 indexed citations
15.
Gelpey, Jeffrey C., et al.. (1985). Process Control for a Rapid Optical Annealing System. MRS Proceedings. 52. 11 indexed citations
16.
Hodgson, R. T., V. R. Deline, Sebastian Mäder, & Jeffrey C. Gelpey. (1984). Rapid thermal annealing of boron-implanted silicon using an ultrahigh power arc lamp. Applied Physics Letters. 44(6). 589–591. 46 indexed citations
17.
Choudhury, Anwesha, et al.. (1983). Rapid thermal annealing of Se and Be implanted InP using an ultrahigh power argon arc lamp. Applied Physics Letters. 43(4). 381–383. 25 indexed citations
18.
Hodgson, R. T., et al.. (1983). Rapid Thermal Annealing of Silicon Using an Ultrahigh Power Arc Lamp. MRS Proceedings. 13. 10 indexed citations
19.
Gelpey, Jeffrey C., et al.. (1980). LiTaO3/CCD hybrid focal planes. Ferroelectrics. 27(1). 9–9. 5 indexed citations
20.
Gelpey, Jeffrey C., et al.. (1978). Pyro/CCD direct signal injection theory and experiment. 522–525. 3 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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