J. L. Jauberteau

831 total citations
59 papers, 689 citations indexed

About

J. L. Jauberteau is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, J. L. Jauberteau has authored 59 papers receiving a total of 689 indexed citations (citations by other indexed papers that have themselves been cited), including 43 papers in Electrical and Electronic Engineering, 25 papers in Mechanics of Materials and 22 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in J. L. Jauberteau's work include Plasma Diagnostics and Applications (32 papers), Metal and Thin Film Mechanics (21 papers) and Plasma Applications and Diagnostics (14 papers). J. L. Jauberteau is often cited by papers focused on Plasma Diagnostics and Applications (32 papers), Metal and Thin Film Mechanics (21 papers) and Plasma Applications and Diagnostics (14 papers). J. L. Jauberteau collaborates with scholars based in France, Spain and Netherlands. J. L. Jauberteau's co-authors include I. Jauberteau, J. Aubreton, Annie Bessaudou, Richard Mayet, Julie Cornette, Thérèse Merle‐Méjean, Pierre Carlès, A. Catherinot, F. J. de Hoog and M. Haverlag and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Chemical Physics Letters.

In The Last Decade

J. L. Jauberteau

58 papers receiving 668 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
J. L. Jauberteau France 15 422 304 290 154 144 59 689
I. Jauberteau France 13 312 0.7× 248 0.8× 250 0.9× 117 0.8× 93 0.6× 50 534
G. Musa Romania 17 344 0.8× 290 1.0× 319 1.1× 160 1.0× 209 1.5× 54 782
Yolanda Aranda Gonzalvo United Kingdom 14 755 1.8× 626 2.1× 490 1.7× 412 2.7× 84 0.6× 23 1.1k
D. Leonhardt United States 20 653 1.5× 342 1.1× 244 0.8× 125 0.8× 177 1.2× 48 957
O. Leroy France 13 533 1.3× 170 0.6× 283 1.0× 168 1.1× 177 1.2× 24 701
Y. Arnal France 19 665 1.6× 348 1.1× 252 0.9× 69 0.4× 148 1.0× 40 844
A. N. Goyette United States 11 360 0.9× 379 1.2× 553 1.9× 70 0.5× 214 1.5× 20 815
B. Grolleau France 16 690 1.6× 192 0.6× 407 1.4× 71 0.5× 103 0.7× 28 834
N. Sakudo Japan 13 537 1.3× 265 0.9× 201 0.7× 61 0.4× 161 1.1× 83 784
Ante Hećimović Germany 23 917 2.2× 868 2.9× 712 2.5× 237 1.5× 187 1.3× 52 1.4k

Countries citing papers authored by J. L. Jauberteau

Since Specialization
Citations

This map shows the geographic impact of J. L. Jauberteau's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J. L. Jauberteau with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J. L. Jauberteau more than expected).

Fields of papers citing papers by J. L. Jauberteau

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by J. L. Jauberteau. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J. L. Jauberteau. The network helps show where J. L. Jauberteau may publish in the future.

Co-authorship network of co-authors of J. L. Jauberteau

This figure shows the co-authorship network connecting the top 25 collaborators of J. L. Jauberteau. A scholar is included among the top collaborators of J. L. Jauberteau based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with J. L. Jauberteau. J. L. Jauberteau is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
2.
Jauberteau, J. L., et al.. (2019). Designing Resonance Microwave Cavities to Optimize Plasma Generation. IEEE Transactions on Instrumentation and Measurement. 69(7). 5128–5137. 8 indexed citations
3.
Jauberteau, I., Pierre Carlès, Richard Mayet, et al.. (2018). Competing growth of titanium nitrides and silicides in Ti thin films processed in expanding microwave plasma: Morphology and microstructural properties. AIP Advances. 8(9). 1 indexed citations
4.
Jauberteau, J. L. & I. Jauberteau. (2018). Synthesis of cyanides in N2–CH4 discharge afterglow. Journal of Physics D Applied Physics. 51(31). 315201–315201. 4 indexed citations
5.
Jauberteau, J. L., et al.. (2017). Electron energy distribution function in a pulsed 2.45GHz hydrogen magnetoplasma: Study of the decay. AIP Advances. 7(12). 2 indexed citations
6.
Jauberteau, I., Richard Mayet, Julie Cornette, et al.. (2017). Silicides and Nitrides Formation in Ti Films Coated on Si and Exposed to (Ar-N2-H2) Expanding Plasma. Coatings. 7(2). 23–23. 17 indexed citations
7.
Jauberteau, J. L., et al.. (2016). Time evolution of the electron energy distribution function in pulsed microwave magnetoplasma in H2. Physics of Plasmas. 23(3). 10 indexed citations
8.
Jauberteau, J. L. & I. Jauberteau. (2012). Dielectric properties in microwave remote plasma sustained in argon: Expanding plasma conditions. Physics of Plasmas. 19(11). 6 indexed citations
9.
Jauberteau, J. L. & I. Jauberteau. (2011). Comments on the Bohm Criterion and on the Determination of the Ion Velocity at the Sheath Edge in Non‐Maxwellian Plasma. Contributions to Plasma Physics. 51(10). 944–954. 5 indexed citations
10.
Jauberteau, François & J. L. Jauberteau. (2009). Numerical differentiation with noisy signal. Applied Mathematics and Computation. 215(6). 2283–2297. 19 indexed citations
11.
Jauberteau, I., J. L. Jauberteau, M. Cahoreau, & J. Aubreton. (2005). Surface reactivity of molybdenum thin films exposed to (Ar–N2–H2) expanding microwave plasma at low temperature: influence of the addition of H2gas in the plasma. Journal of Physics D Applied Physics. 38(19). 3654–3663. 5 indexed citations
12.
Jauberteau, J. L., et al.. (2002). Reactivity of methane in a nitrogen discharge afterglow. New Journal of Physics. 4. 39–39. 24 indexed citations
13.
Tristant, Pascal, et al.. (2001). Microwave plasma enhanced CVD of aluminum oxide films: OES diagnostics and influence of the RF bias. Thin Solid Films. 390(1-2). 51–58. 26 indexed citations
14.
Jauberteau, I., et al.. (1999). Plasma nitriding of thin molybdenum layers at low temperature. Surface and Coatings Technology. 116-119. 222–228. 12 indexed citations
15.
Jauberteau, J. L., L. Thomas, J. Aubreton, I. Jauberteau, & A. Catherinot. (1998). High Reactivity of CH2 Radical in an AR–CH4 Post-Discharge. Plasma Chemistry and Plasma Processing. 18(1). 137–151. 19 indexed citations
16.
Teyssandier, F., et al.. (1998). Problèmes spécifiques liés à la vaporisation des précurseurs organométalliques solides utilisés pour les dépôts dans le système V-C-N. Annales de Chimie Science des Matériaux. 23(5-6). 655–666. 2 indexed citations
17.
Thomas, L., J. L. Jauberteau, I. Jauberteau, J. Aubreton, & A. Catherinot. (1997). Characterization of an argon-hydrogen microwave discharge used as an atomic hydrogen source. Effect of hydrogen dilution on the atomic hydrogen production. Plasma Chemistry and Plasma Processing. 17(2). 193–206. 18 indexed citations
18.
Jauberteau, J. L., et al.. (1991). Negative ions in a radio-frequency plasma in CF4. Journal of Physics D Applied Physics. 24(3). 261–267. 31 indexed citations
19.
Jauberteau, J. L., et al.. (1990). Spectroscopic study of a D.C. discharge in an argon-silane-nitrogen gas mixture under silicon nitride thin film deposition conditions. Plasma Chemistry and Plasma Processing. 10(4). 589–607. 4 indexed citations
20.
Jauberteau, J. L., et al.. (1989). Photodetachment effect in a radio frequency plasma in CF4. Applied Physics Letters. 55(25). 2597–2599. 28 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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