Chin‐Wook Chung

3.0k total citations
207 papers, 2.6k citations indexed

About

Chin‐Wook Chung is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, Chin‐Wook Chung has authored 207 papers receiving a total of 2.6k indexed citations (citations by other indexed papers that have themselves been cited), including 198 papers in Electrical and Electronic Engineering, 118 papers in Mechanics of Materials and 47 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in Chin‐Wook Chung's work include Plasma Diagnostics and Applications (185 papers), Metal and Thin Film Mechanics (107 papers) and Dust and Plasma Wave Phenomena (43 papers). Chin‐Wook Chung is often cited by papers focused on Plasma Diagnostics and Applications (185 papers), Metal and Thin Film Mechanics (107 papers) and Dust and Plasma Wave Phenomena (43 papers). Chin‐Wook Chung collaborates with scholars based in South Korea, United States and Australia. Chin‐Wook Chung's co-authors include Hyo‐Chang Lee, Min-Hyong Lee, Sung-Ho Jang, Dong-Hwan Kim, Young Kwang Lee, Jung‐Kyu Lee, Hong‐Young Chang, Young‐Cheol Kim, Ju-Ho Kim and Sang‐Hun Seo and has published in prestigious journals such as Physical Review Letters, Nano Letters and Applied Physics Letters.

In The Last Decade

Chin‐Wook Chung

194 papers receiving 2.4k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Chin‐Wook Chung South Korea 27 2.4k 1.4k 683 421 389 207 2.6k
A. R. Ellingboe Ireland 24 2.0k 0.8× 784 0.6× 494 0.7× 401 1.0× 427 1.1× 61 2.1k
Peter L. G. Ventzek United States 24 1.5k 0.6× 824 0.6× 356 0.5× 147 0.3× 287 0.7× 102 1.9k
S. J. You South Korea 20 1.2k 0.5× 563 0.4× 288 0.4× 167 0.4× 264 0.7× 137 1.3k
Hideo Sugai Japan 18 984 0.4× 480 0.4× 358 0.5× 226 0.5× 156 0.4× 97 1.3k
Cormac Corr Australia 20 834 0.3× 274 0.2× 264 0.4× 249 0.6× 235 0.6× 71 1.2k
Yoshinori Takao Japan 22 1.4k 0.6× 260 0.2× 186 0.3× 235 0.6× 186 0.5× 138 1.5k
T.A. Grotjohn United States 27 1.1k 0.5× 743 0.5× 344 0.5× 154 0.4× 259 0.7× 101 1.9k
Kouichi Ono Japan 26 2.0k 0.8× 496 0.4× 258 0.4× 170 0.4× 231 0.6× 146 2.2k
Sudeep Bhattacharjee India 17 1.0k 0.4× 149 0.1× 614 0.9× 206 0.5× 120 0.3× 104 1.4k
C. Boisse-Laporte France 20 849 0.4× 307 0.2× 340 0.5× 166 0.4× 377 1.0× 45 1.0k

Countries citing papers authored by Chin‐Wook Chung

Since Specialization
Citations

This map shows the geographic impact of Chin‐Wook Chung's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Chin‐Wook Chung with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Chin‐Wook Chung more than expected).

Fields of papers citing papers by Chin‐Wook Chung

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Chin‐Wook Chung. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Chin‐Wook Chung. The network helps show where Chin‐Wook Chung may publish in the future.

Co-authorship network of co-authors of Chin‐Wook Chung

This figure shows the co-authorship network connecting the top 25 collaborators of Chin‐Wook Chung. A scholar is included among the top collaborators of Chin‐Wook Chung based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Chin‐Wook Chung. Chin‐Wook Chung is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
2.
Kim, Ju-Ho, et al.. (2025). Control of axial direction electron temperature distribution by gradient DC magnetic field in inductively coupled plasma. Plasma Sources Science and Technology. 34(3). 35010–35010. 1 indexed citations
3.
Choi, Eunmi, et al.. (2024). Effect of controlling residual moisture in atmospheric plasma spray-Y2O3 coatings on random defect generation by halogen-based plasma. Journal of the European Ceramic Society. 45(2). 116919–116919. 1 indexed citations
4.
Chung, Chin‐Wook, et al.. (2024). Low-damage etching of poly-Si and SiO2 via a low-energy electron beam in inductively coupled CF4 plasma. Plasma Sources Science and Technology. 33(10). 105013–105013.
5.
Kim, MinJoong, et al.. (2023). Investigation of contamination particles generation and surface chemical reactions on Al2O3, Y2O3, and YF3 coatings in F-based plasma. Applied Surface Science. 629. 157367–157367. 20 indexed citations
6.
Kim, Kyung-Hyun, et al.. (2023). High-speed plasma diagnostics based on the floating harmonic method in inductively coupled plasma and pulsed plasma. Plasma Sources Science and Technology. 32(7). 75012–75012. 1 indexed citations
7.
Chung, Chin‐Wook, et al.. (2022). Highly efficient plasma generation in inductively coupled plasmas using a parallel capacitor. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 41(1).
8.
Kim, Tae‐Woo, et al.. (2022). Experimental investigation on the hysteresis in low-pressure inductively coupled neon discharge. Physics of Plasmas. 29(9). 2 indexed citations
9.
Chung, Chin‐Wook, et al.. (2022). Harmonic suppression and uniformity improvement of plasma density in capacitively coupled plasma. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 40(6). 6 indexed citations
10.
Kim, Ju-Ho, et al.. (2022). Enhanced plasma generation in capacitively coupled plasma using a parallel inductor. Plasma Sources Science and Technology. 31(6). 65006–65006. 4 indexed citations
11.
Chung, Chin‐Wook, et al.. (2022). Measurement of the electron energy distribution functions in low density RF plasmas through a tunable external RF filter. Plasma Sources Science and Technology. 31(4). 45015–45015. 3 indexed citations
12.
Kim, Tae‐Woo, et al.. (2022). Electron energy probability function measurement in a 2 MHz and 13.56 MHz dual-frequency capacitively coupled argon plasma. Plasma Sources Science and Technology. 31(7). 75008–75008. 5 indexed citations
13.
Kim, Ju-Ho & Chin‐Wook Chung. (2021). Development of high-efficiency capacitive discharge using magnetic resonance wireless power transfer systems. Plasma Sources Science and Technology. 30(5). 55017–55017.
14.
Kim, Tae‐Woo, et al.. (2021). Improvement of the floating probe method for ion density and electron temperature measurement without compensation due to voltage reduction across the sheath. Plasma Sources Science and Technology. 30(6). 65006–65006. 1 indexed citations
15.
Chung, Chin‐Wook, et al.. (2021). Effects of RF bias frequency and power on the plasma parameters and ash rate in a remote plasma source. Plasma Sources Science and Technology. 30(2). 25009–25009. 7 indexed citations
16.
Kim, Tae‐Woo, et al.. (2021). Local electron and ion density control using passive resonant coils in inductively coupled plasma. Plasma Sources Science and Technology. 30(2). 25002–25002. 4 indexed citations
17.
Lee, M. H., et al.. (2021). Low-energy electron beam generation in inductively coupled plasma via a DC biased grid. Plasma Sources Science and Technology. 31(2). 25002–25002. 8 indexed citations
18.
Kim, Ju-Ho & Chin‐Wook Chung. (2021). Plasma and electrical characteristics depending on an antenna position in an inductively coupled plasma with a passive resonant antenna. Plasma Sources Science and Technology. 31(1). 15002–15002. 3 indexed citations
19.
Kim, Ju-Ho, et al.. (2019). High efficient plasma generation in an inductively coupled plasma using a passive resonant antenna. Plasma Sources Science and Technology. 28(10). 105018–105018. 7 indexed citations
20.
Chung, Chin‐Wook, et al.. (2010). Development of an embedded two-dimensional probe for diagnostic of the spatial uniformity in plasmas. Bulletin of the American Physical Society. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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Breakdown of academic impact, for papers by A. R. Ellingboe Breakdown of academic impact, for papers by Peter L. G. Ventzek Breakdown of academic impact, for papers by S. J. You Breakdown of academic impact, for papers by Hideo Sugai Breakdown of academic impact, for papers by Cormac Corr Breakdown of academic impact, for papers by Yoshinori Takao Breakdown of academic impact, for papers by T.A. Grotjohn Breakdown of academic impact, for papers by Kouichi Ono Breakdown of academic impact, for papers by Sudeep Bhattacharjee Breakdown of academic impact, for papers by C. Boisse-Laporte
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