Alex Paterson

664 total citations
24 papers, 571 citations indexed

About

Alex Paterson is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, Alex Paterson has authored 24 papers receiving a total of 571 indexed citations (citations by other indexed papers that have themselves been cited), including 23 papers in Electrical and Electronic Engineering, 10 papers in Mechanics of Materials and 4 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in Alex Paterson's work include Plasma Diagnostics and Applications (20 papers), Semiconductor materials and devices (11 papers) and Metal and Thin Film Mechanics (8 papers). Alex Paterson is often cited by papers focused on Plasma Diagnostics and Applications (20 papers), Semiconductor materials and devices (11 papers) and Metal and Thin Film Mechanics (8 papers). Alex Paterson collaborates with scholars based in United States, United Kingdom and Austria. Alex Paterson's co-authors include Mark J. Kushner, John Holland, Saravanapriyan Sriraman, Paul Miller, Chad M. Huard, Edward V. Barnat, E. V. Barnat, G. A. Hebner, A. M. Marakhtanov and Keren J. Kanarik and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Physical Chemistry Chemical Physics.

In The Last Decade

Alex Paterson

23 papers receiving 523 citations

Peers

Alex Paterson

EEE

AMPO

RNMI

B. P. Aragon United States

Kazuki Denpoh Japan

K. T. A. L. Burm Netherlands

Ken Collins United States

A. Brockhaus Germany

E G Thorsteinsson Iceland

S. J. Whitehair United States

Oleg A. Popov Russia

S. G. Ingram United Kingdom

Min-Hyong Lee South Korea

B. P. Aragon United States

Alex Paterson

536 ×1.0

EEE

279 ×1.3

72 ×0.6

AMPO

86 ×0.9

92 ×0.9

RNMI

Citations per year, relative to Alex Paterson Alex Paterson (= 1×) peers B. P. Aragon

Countries citing papers authored by Alex Paterson

Since Specialization

Citations

This map shows the geographic impact of Alex Paterson's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Alex Paterson with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Alex Paterson more than expected).

Fields of papers citing papers by Alex Paterson

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Alex Paterson. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Alex Paterson. The network helps show where Alex Paterson may publish in the future.

Co-authorship network of co-authors of Alex Paterson

This figure shows the co-authorship network connecting the top 25 collaborators of Alex Paterson. A scholar is included among the top collaborators of Alex Paterson based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Alex Paterson. Alex Paterson is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Gekelman, Walter, et al.. (2024). Ion motion above a biased wafer in a plasma etching reactor. Physics of Plasmas. 31(6). 1 indexed citations

Pribyl, Patrick, et al.. (2020). Three-dimensional measurements of fundamental plasma parameters in pulsed ICP operation. Physics of Plasmas. 27(6). 13 indexed citations

Pribyl, Patrick, et al.. (2019). Three-dimensional measurements of plasma parameters in an inductively coupled plasma processing chamber. Physics of Plasmas. 26(10). 23 indexed citations

Zhang, Shenli, et al.. (2019). Computational modelling of atomic layer etching of chlorinated germanium surfaces by argon. Physical Chemistry Chemical Physics. 21(11). 5898–5902. 3 indexed citations

Huard, Chad M., Saravanapriyan Sriraman, Alex Paterson, & Mark J. Kushner. (2018). Transient behavior in quasi-atomic layer etching of silicon dioxide and silicon nitride in fluorocarbon plasmas. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 36(6). 55 indexed citations

Huard, Chad M., et al.. (2017). Role of neutral transport in aspect ratio dependent plasma etching of three-dimensional features. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 35(5). 50 indexed citations

Huard, Chad M., et al.. (2017). Atomic layer etching of 3D structures in silicon: Self-limiting and nonideal reactions. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 35(3). 48 indexed citations

Huard, Chad M., et al.. (2016). Investigation of feature orientation and consequences of ion tilting during plasma etching with a three-dimensional feature profile simulator. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 35(2). 37 indexed citations

Kushner, Mark J., et al.. (2015). Control of ion energy and angular distributions in dual-frequency capacitively coupled plasmas through power ratios and phase: Consequences on etch profiles. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 33(3). 49 indexed citations

10.

Hebner, G. A. & Alex Paterson. (2010). Ion temperature and velocity in a 300 mm diameter capacitively coupled plasma reactor driven at 13, 60 and 162 MHz. Plasma Sources Science and Technology. 19(1). 15020–15020. 14 indexed citations

11.

Barnat, E. V., Paul Miller, & Alex Paterson. (2008). RF discharge under the influence of a transverse magnetic field. Plasma Sources Science and Technology. 17(4). 45005–45005. 23 indexed citations

12.

Barnat, E. V., et al.. (2007). Measured radial dependence of the peak sheath voltages present in very high frequency capacitive discharges. Applied Physics Letters. 90(20). 16 indexed citations

13.

Hebner, G. A., E. V. Barnat, Paul Miller, Alex Paterson, & John Holland. (2006). Frequency dependent ion kinetics in a 300 mm dual-frequency capacitively coupled plasma reactor. Bulletin of the American Physical Society. 1 indexed citations

14.

Miller, Paul, et al.. (2006). Spatial and frequency dependence of plasma currents in a 300 mm capacitively coupled plasma reactor. Plasma Sources Science and Technology. 15(4). 889–899. 59 indexed citations

15.

Paterson, Alex, et al.. (2006). Characterization of the NiFe sputter etch process in a rf plasma. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 24(3). 444–449. 7 indexed citations

16.

Shannon, Steven, et al.. (2005). The impact of frequency mixing on sheath properties: Ion energy distribution and Vdc∕Vrf interaction. Journal of Applied Physics. 97(10). 36 indexed citations

17.

Paterson, Alex, et al.. (2003). The sensitivity of electron shading damage to electron temperature, electron density and the plasma-to-wafer electron energy threshold. 33–36. 1 indexed citations

18.

Smith, David J., et al.. (2000). Model for cw laser collisionally induced fluorescence in low-temperature discharges. Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics. 62(2). 2678–2683. 12 indexed citations

19.

Paterson, Alex, et al.. (2000). Rigorous theoretical analysis of the continuous wave optogalvanic effect in the neon positive column. Journal of Physics D Applied Physics. 33(7). 864–873. 8 indexed citations

20.

Paterson, Alex, et al.. (2000). The application of CW laser collisionally induced fluorescence modelling to determine neon excited-state electron collisional rate coefficients. Journal of Physics B Atomic Molecular and Optical Physics. 33(20). 4513–4524. 6 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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