Ken Collins

748 total citations
30 papers, 630 citations indexed

About

Ken Collins is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials and Radiology, Nuclear Medicine and Imaging. According to data from OpenAlex, Ken Collins has authored 30 papers receiving a total of 630 indexed citations (citations by other indexed papers that have themselves been cited), including 27 papers in Electrical and Electronic Engineering, 14 papers in Mechanics of Materials and 8 papers in Radiology, Nuclear Medicine and Imaging. Recurrent topics in Ken Collins's work include Plasma Diagnostics and Applications (26 papers), Metal and Thin Film Mechanics (13 papers) and Electrohydrodynamics and Fluid Dynamics (8 papers). Ken Collins is often cited by papers focused on Plasma Diagnostics and Applications (26 papers), Metal and Thin Film Mechanics (13 papers) and Electrohydrodynamics and Fluid Dynamics (8 papers). Ken Collins collaborates with scholars based in United States, United Kingdom and South Korea. Ken Collins's co-authors include Shahid Rauf, Kallol Bera, Ankur Agarwal, K. Ramaswamy, S. Banna, Zhigang Chen, L. Dorf, K. Tokashiki, Zhi‐Gang Chen and John Forster and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of Vacuum Science & Technology A Vacuum Surfaces and Films.

In The Last Decade

Ken Collins

29 papers receiving 565 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Ken Collins United States 14 618 293 167 156 75 30 630
A. M. Marakhtanov United States 9 424 0.7× 151 0.5× 174 1.0× 113 0.7× 70 0.9× 15 447
Min-Hyong Lee South Korea 12 674 1.1× 379 1.3× 101 0.6× 192 1.2× 93 1.2× 21 710
A. Brockhaus Germany 12 371 0.6× 157 0.5× 174 1.0× 83 0.5× 81 1.1× 24 423
Alex Paterson United States 14 542 0.9× 209 0.7× 97 0.6× 129 0.8× 100 1.3× 24 571
Sebastian Wilczek Germany 12 611 1.0× 227 0.8× 168 1.0× 246 1.6× 41 0.5× 27 633
H. Y. Chang South Korea 14 376 0.6× 193 0.7× 82 0.5× 120 0.8× 61 0.8× 33 421
B. P. Aragon United States 9 536 0.9× 279 1.0× 92 0.6× 72 0.5× 86 1.1× 14 581
De‐Qi Wen United States 21 873 1.4× 351 1.2× 245 1.5× 307 2.0× 79 1.1× 50 900
Birk Berger Germany 13 429 0.7× 179 0.6× 99 0.6× 159 1.0× 44 0.6× 23 448
Oleg A. Popov Russia 10 420 0.7× 119 0.4× 63 0.4× 105 0.7× 84 1.1× 27 447

Countries citing papers authored by Ken Collins

Since Specialization
Citations

This map shows the geographic impact of Ken Collins's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Ken Collins with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Ken Collins more than expected).

Fields of papers citing papers by Ken Collins

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Ken Collins. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Ken Collins. The network helps show where Ken Collins may publish in the future.

Co-authorship network of co-authors of Ken Collins

This figure shows the co-authorship network connecting the top 25 collaborators of Ken Collins. A scholar is included among the top collaborators of Ken Collins based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Ken Collins. Ken Collins is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Agarwal, Ankur, et al.. (2014). Fully Self-Consistent 3-D Modeling of Inductively Coupled Plasmas. IEEE Transactions on Plasma Science. 42(10). 2832–2833. 3 indexed citations
2.
Rauf, Shahid, et al.. (2013). Energy distribution of electron flux at electrodes in a low pressure capacitively coupled plasma. Journal of Applied Physics. 113(2). 2 indexed citations
3.
Agarwal, Ankur, Shahid Rauf, & Ken Collins. (2012). Gas heating mechanisms in capacitively coupled plasmas. Plasma Sources Science and Technology. 21(5). 55012–55012. 36 indexed citations
4.
Agarwal, Ankur, et al.. (2012). Decreasing high ion energy during transition in pulsed inductively coupled plasmas. Applied Physics Letters. 100(4). 17 indexed citations
5.
Rauf, Shahid, et al.. (2012). Model for a transformer-coupled toroidal plasma source. Journal of Applied Physics. 111(2). 4 indexed citations
6.
Bera, Kallol, Shahid Rauf, & Ken Collins. (2011). PIC-MCC∕Fluid Hybrid Model for Low Pressure Capacitively Coupled O[sub 2] Plasma. AIP conference proceedings. 1027–1032. 6 indexed citations
7.
Agarwal, Ankur, et al.. (2011). Recouping etch rates in pulsed inductively coupled plasmas. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 29(1). 23 indexed citations
8.
Bera, Kallol, Shahid Rauf, & Ken Collins. (2011). Plasma Dynamics in Low-Pressure Capacitively Coupled Oxygen Plasma Using PIC–MCC/Fluid Hybrid Model. IEEE Transactions on Plasma Science. 39(11). 2576–2577. 8 indexed citations
9.
Chen, Zhigang, et al.. (2011). Effect of Segmenting Powered Electrode on Plasma Uniformity in Large-Area Capacitively Coupled Plasma Discharge. IEEE Transactions on Plasma Science. 39(11). 2526–2527. 13 indexed citations
10.
Rauf, Shahid, et al.. (2010). Self-consistent electrodynamics of large-area high-frequency capacitive plasma discharge. Journal of Applied Physics. 108(7). 46 indexed citations
11.
Bera, Kallol, et al.. (2010). Influence of inhomogeneous magnetic field on the characteristics of very high frequency capacitively coupled plasmas. Journal of Applied Physics. 107(5). 30 indexed citations
12.
Bera, Kallol, et al.. (2010). Plasma-Profile Control Using External Circuit in a Capacitively Coupled Plasma Reactor. IEEE Transactions on Plasma Science. 38(11). 3241–3248. 10 indexed citations
13.
Rauf, Shahid, et al.. (2009). Effect of azimuthally asymmetric reactor components on a parallel plate capacitively coupled plasma. Journal of Applied Physics. 106(10). 9 indexed citations
14.
Rauf, Shahid, et al.. (2009). Three-dimensional model of magnetized capacitively coupled plasmas. Journal of Applied Physics. 105(10). 32 indexed citations
15.
Rauf, Shahid, Kallol Bera, & Ken Collins. (2009). Power dynamics in a low pressure capacitively coupled plasma discharge. Plasma Sources Science and Technology. 19(1). 15014–15014. 39 indexed citations
16.
Chen, Zhi‐Gang, Shahid Rauf, K. Ramaswamy, & Ken Collins. (2009). Electromagnetic Modeling of Plasma Etch Chamber for Semiconductor Microchip Fabrication. PIERS Online. 5(3). 221–225. 5 indexed citations
17.
Agarwal, Ankur, et al.. (2008). Characteristics of Pulsed Capacitively Coupled Plasma Sources for Plasma Etching. Bulletin of the American Physical Society. 2 indexed citations
18.
Frank, Robert, et al.. (2008). The sin of Jesus.
19.
Rauf, Shahid, Kallol Bera, & Ken Collins. (2008). Self-consistent simulation of very high frequency capacitively coupled plasmas. Plasma Sources Science and Technology. 17(3). 35003–35003. 85 indexed citations
20.
Collins, Ken, et al.. (1961). High-sensitivity recording optical density meter. Journal of Scientific Instruments. 38(5). 186–190. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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