Ken Collins
Impact in
- Mechanics of Materials top 5%
- Metal and Thin Film Mechanics
-
- Plasma Diagnostics and Applications
- Electrohydrodynamics and Fluid Dynamics
- Semiconductor materials and devices
Papers in
-
- Plasma Diagnostics and Applications 26
- Electrohydrodynamics and Fluid Dynamics 8
- Semiconductor materials and devices 8
- Electrostatic Discharge in Electronics 2
-
- Metal and Thin Film Mechanics 13
- Co-authors
- Shahid Rauf (28 shared papers)Kallol Bera (9 shared papers)Ankur Agarwal (10 shared papers)K. Ramaswamy (3 shared papers)S. Banna (4 shared papers)Zhigang Chen (1 shared paper)L. Dorf (3 shared papers)K. Tokashiki (1 shared paper)
- Journals
- Journal of Applied Physics (11 papers)IEEE Transactions on Plasma Science (6 papers)Plasma Sources Science and Technology (3 papers)Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (3 papers)Applied Physics Letters (2 papers)
- Partner nations
- United StatesUnited KingdomSouth Korea
In The Last Decade
Ken Collins
29 papers receiving 565 citations
Peers
Comparison fields: 5 of 24
- Mechanics of Materials 293
- Electrical and Electronic Engineering 618
- Radiology, Nuclear Medicine and Imaging 167
- Atomic and Molecular Physics, and Optics 156
- Aerospace Engineering 64
Countries citing papers authored by Ken Collins
This map shows the geographic impact of Ken Collins's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Ken Collins with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Ken Collins more than expected).
Fields of papers citing papers by Ken Collins
This network shows the impact of papers produced by Ken Collins. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Ken Collins. The network helps show where Ken Collins may publish in the future.
Co-authors
The 13 scholars most cited alongside Ken Collins, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 30 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2008 | 85 | |
| 2 | 2009 | 52 | |
| 3 | 2009 | 50 | |
| 4 | 2009 | 48 | |
| 5 | 2010 | 46 | |
| 6 | 2009 | 39 | |
| 7 | 2012 | 36 | |
| 8 | 2009 | 32 | |
| 9 | 2010 | 32 | |
| 10 | 2012 | 31 | |
| 11 | 2010 | 30 | |
| 12 | 2011 | 23 | |
| 13 | 2012 | 17 | |
| 14 | 2011 | 16 | |
| 15 | 2011 | 13 | |
| 16 | 2012 | 11 | |
| 17 | 2010 | 10 | |
| 18 | 2009 | 9 | |
| 19 | 2021 | 9 | |
| 20 | 2011 | 8 |
About Ken Collins
Ken Collins is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials, Radiology, Nuclear Medicine and Imaging, Atomic and Molecular Physics, and Optics and Aerospace Engineering, having authored 30 papers that have together received 630 indexed citations. Recurring topics across this work include Plasma Diagnostics and Applications (26 papers), Metal and Thin Film Mechanics (13 papers), Electrohydrodynamics and Fluid Dynamics (8 papers), Semiconductor materials and devices (8 papers), Plasma Applications and Diagnostics (8 papers), Dust and Plasma Wave Phenomena (6 papers), Copper Interconnects and Reliability (3 papers) and Electrostatic Discharge in Electronics (2 papers). The work is most often cited by research in Mechanics of Materials (293 citations), Electrical and Electronic Engineering (618 citations), Radiology, Nuclear Medicine and Imaging (167 citations), Atomic and Molecular Physics, and Optics (156 citations) and Aerospace Engineering (64 citations). Ken Collins has collaborated with scholars based in United States, United Kingdom and South Korea. Frequent co-authors include Shahid Rauf, Kallol Bera, Ankur Agarwal, K. Ramaswamy, S. Banna, Zhigang Chen, L. Dorf, K. Tokashiki, Jozef Kúdela and John Forster. Their work appears in journals such as Journal of Applied Physics, IEEE Transactions on Plasma Science, Plasma Sources Science and Technology, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films and Applied Physics Letters.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.