E. Petitprez

851 total citations
30 papers, 437 citations indexed

About

E. Petitprez is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, E. Petitprez has authored 30 papers receiving a total of 437 indexed citations (citations by other indexed papers that have themselves been cited), including 27 papers in Electrical and Electronic Engineering, 18 papers in Electronic, Optical and Magnetic Materials and 16 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in E. Petitprez's work include Copper Interconnects and Reliability (18 papers), Semiconductor materials and devices (13 papers) and Semiconductor Quantum Structures and Devices (11 papers). E. Petitprez is often cited by papers focused on Copper Interconnects and Reliability (18 papers), Semiconductor materials and devices (13 papers) and Semiconductor Quantum Structures and Devices (11 papers). E. Petitprez collaborates with scholars based in France, Brazil and Switzerland. E. Petitprez's co-authors include E. Marega, D. Lubyshev, P. Basmaji, Pedro Pablo González‐Borrero, Newton La Scala, L. Arnaud, Y. Wouters, Laurent Doyen, X. Federspiel and J. Torrès and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of Crystal Growth.

In The Last Decade

E. Petitprez

28 papers receiving 422 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
E. Petitprez France 7 365 318 219 84 36 30 437
Rinus T. P. Lee Singapore 12 414 1.1× 173 0.5× 102 0.5× 47 0.6× 76 2.1× 33 469
Gérard Guillot France 10 274 0.8× 136 0.4× 139 0.6× 79 0.9× 39 1.1× 50 370
C. Awo-Affouda United States 9 320 0.9× 473 1.5× 280 1.3× 92 1.1× 23 0.6× 12 591
Vl. Kolkovsky Germany 12 334 0.9× 169 0.5× 185 0.8× 56 0.7× 27 0.8× 49 425
Minoru Yoneta Japan 13 486 1.3× 180 0.6× 397 1.8× 72 0.9× 19 0.5× 66 575
C. Stanis United States 15 535 1.5× 200 0.6× 86 0.4× 98 1.2× 72 2.0× 37 587
Yasuhiko Nakayama Japan 12 313 0.9× 329 1.0× 150 0.7× 51 0.6× 42 1.2× 39 433
Baoxue Bo China 10 361 1.0× 215 0.7× 156 0.7× 31 0.4× 47 1.3× 80 422
C.H. Ling Singapore 14 585 1.6× 95 0.3× 124 0.6× 32 0.4× 27 0.8× 77 614
Aliekber Aktağ Türkiye 12 255 0.7× 170 0.5× 154 0.7× 34 0.4× 27 0.8× 22 344

Countries citing papers authored by E. Petitprez

Since Specialization
Citations

This map shows the geographic impact of E. Petitprez's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by E. Petitprez with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites E. Petitprez more than expected).

Fields of papers citing papers by E. Petitprez

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by E. Petitprez. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by E. Petitprez. The network helps show where E. Petitprez may publish in the future.

Co-authorship network of co-authors of E. Petitprez

This figure shows the co-authorship network connecting the top 25 collaborators of E. Petitprez. A scholar is included among the top collaborators of E. Petitprez based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with E. Petitprez. E. Petitprez is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Petitprez, E., et al.. (2013). Effectiveness of wafer level test for electromigration wear out reporting in advanced CMOS interconnects reliability assessment. Microelectronic Engineering. 106. 195–199. 1 indexed citations
2.
4.
Arnaud, L., et al.. (2011). Improving lifetime of Cu interconnects with adding compressive stress at cathode end. EM.4.1–EM.4.5. 1 indexed citations
5.
Arnaud, L., et al.. (2011). Electromigration induced void kinetics in Cu interconnects for advanced CMOS nodes. 69. 3E.1.1–3E.1.10. 6 indexed citations
6.
Haxaire, K., et al.. (2010). Microstructure and texture analysis of narrow copper line versus widths and annealing for reliability improvement. Microelectronic Engineering. 88(5). 661–665. 6 indexed citations
8.
Petitprez, E., Laurent Doyen, & D. Ney. (2009). Temperature scaling of electromigration threshold product in Cu/low-K interconnects. 78. 865–868. 2 indexed citations
9.
Arnaud, L., E. Richard, D. Roy, et al.. (2009). Reliability failure modes in interconnects for the 45 nm technology node and beyond. 104. 179–181. 5 indexed citations
10.
Haxaire, K., et al.. (2009). Characterization and impact of reduced copper plating overburden on 45nm interconnect performances. Microelectronic Engineering. 87(3). 421–425. 2 indexed citations
11.
Doyen, Laurent, et al.. (2008). Extensive analysis of resistance evolution due to electromigration induced degradation. Journal of Applied Physics. 104(12). 49 indexed citations
12.
Gosset, L.G., M. Hopstaken, T. Chevolleau, et al.. (2007). Integration of gas cluster process for copper interconnects reliability improvement and process impact evaluation on BEOL dielectric materials. Microelectronic Engineering. 84(9-10). 2184–2187. 1 indexed citations
13.
Gosset, L.G., E. Petitprez, M. Hopstaken, et al.. (2007). Integration and characterization of gas cluster processing for copper interconnects electromigration improvement. Microelectronic Engineering. 84(11). 2675–2680. 2 indexed citations
14.
Chapelon, L.L., E. Petitprez, P. Brun, A. Farcy, & J. Torrès. (2007). Evaluation of a PECVD advanced barrier (k=3.7) for 32nm CMOS technology and below. Microelectronic Engineering. 84(11). 2624–2628. 16 indexed citations
15.
Petitprez, E. & E. Marega. (2002). On the Origin of the Optical Emission Peak Shifts in QD Superlattices. physica status solidi (b). 232(1). 164–168. 5 indexed citations
16.
Petitprez, E., et al.. (2000). Strain relaxation-induced modifications of the optical properties of self-assembled InAs quantum dot superlattices. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 18(3). 1493–1495. 5 indexed citations
17.
Petitprez, E., et al.. (1999). Electronic coupling and thermal relaxation in self-assembled InAs quantum dot superlattices. Brazilian Journal of Physics. 29(4). 738–741. 1 indexed citations
18.
González‐Borrero, Pedro Pablo, D. Lubyshev, E. Petitprez, et al.. (1997). Optical properties of natural InxGa1-xAs quantum dots grown on high-index GaAs substrates. Brazilian Journal of Physics. 27(2). 65–75. 3 indexed citations
19.
González‐Borrero, Pedro Pablo, E. Marega, D. Lubyshev, E. Petitprez, & P. Basmaji. (1997). Optical properties of self-assembled InAs quantum dots on high-index GaAs substrates. Superlattices and Microstructures. 22(1). 85–89. 6 indexed citations
20.
Lubyshev, D., Pedro Pablo González‐Borrero, E. Marega, E. Petitprez, & P. Basmaji. (1996). High index orientation effects of strained self-assembled InGaAs quantum dots. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 14(3). 2212–2215. 55 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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