E. Holub‐Krappe
- Surfaces, Coatings and Films top 5%
- Electron and X-Ray Spectroscopy Techniques 5
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- Advanced Chemical Physics Studies 6
- Atomic and Molecular Physics 3
- Surface and Thin Film Phenomena 2
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- Semiconductor materials and devices 2
- Advancements in Photolithography Techniques 1
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- Mass Spectrometry Techniques and Applications 2
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- Ion-surface interactions and analysis 1
E. Holub‐Krappe
11 papers receiving 332 citations
Peers
Comparison fields: 5 of 34
- Surfaces, Coatings and Films 92
- Atomic and Molecular Physics, and Optics 245
- Radiation 35
- Atmospheric Science 51
- Catalysis 19
Countries citing papers authored by E. Holub‐Krappe
This map shows the geographic impact of E. Holub‐Krappe's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by E. Holub‐Krappe with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites E. Holub‐Krappe more than expected).
Fields of papers citing papers by E. Holub‐Krappe
This network shows the impact of papers produced by E. Holub‐Krappe. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by E. Holub‐Krappe. The network helps show where E. Holub‐Krappe may publish in the future.
Co-authorship network
The 25 scholars most cited alongside E. Holub‐Krappe, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2012 | 4 | |
| 2 | 1996 | 3 | |
| 3 | 1995 | 9 | |
| 4 | 1993 | 0 | |
| 5 | 1989 | 67 | |
| 6 | 1988 | 21 | |
| 7 | 1988 | 25 | |
| 8 | 1987 | 3 | |
| 9 | 1987 | 86 | |
| 10 | 1987 | 19 | |
| 11 | 1987 | 38 | |
| 12 | 1986 | 74 |
About E. Holub‐Krappe
E. Holub‐Krappe is a scholar working on Surfaces, Coatings and Films, Atomic and Molecular Physics, and Optics and Geochemistry and Petrology, having authored 12 papers that have together received 349 indexed citations. Recurring topics across this work include Advanced Chemical Physics Studies (6 papers), Electron and X-Ray Spectroscopy Techniques (5 papers), Atomic and Molecular Physics (3 papers), Surface and Thin Film Phenomena (2 papers), Semiconductor materials and devices (2 papers), Mass Spectrometry Techniques and Applications (2 papers), Advancements in Photolithography Techniques (1 paper) and Ion-surface interactions and analysis (1 paper). The work is most often cited by research in Surfaces, Coatings and Films (92 citations), Atomic and Molecular Physics, and Optics (245 citations) and Radiation (35 citations). E. Holub‐Krappe has collaborated with scholars based in Germany, Netherlands and France. Frequent co-authors include K. Horn, J.W.M. Frenken, J. F. van der Veen, A. Ding, Gerd Ganteför, Kevin C. Prince, D.P. Woodruff, W. Braun, S. Tougaard and H. Saalfeld. Their work appears in journals such as Physical Review Letters, The Journal of Chemical Physics and Physical review. B, Condensed matter.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.