D.L. Feucht

1.1k citations
31 papers · 737 indexed · h-index 11

Impact in

    • Semiconductor materials and interfaces
    • Semiconductor Quantum Structures and Devices
    • Semiconductor materials and devices
    • Chalcogenide Semiconductor Thin Films
    • Silicon and Solar Cell Technologies
    • Advancements in Semiconductor Devices and Circuit Design
    • Advanced Semiconductor Detectors and Materials

Papers in

D.L. Feucht

28 papers receiving 681 citations

Peers

D.L. Feucht
Comparison fields: 5 of 42
  • Atomic and Molecular Physics, and Optics 425
  • Electrical and Electronic Engineering 594
  • Materials Chemistry 240
  • Condensed Matter Physics 40
  • Surfaces, Coatings and Films 24
Replace Y. Ohmura with:
Y. Ohmura Japan
L. Passari Italy
Shin‐ichiro Uekusa Japan
Masanori Inada Japan
Marc‐A. Nicolet United States
E. Mateeva United States
A. Cornfeld United States
U. Birkholz Germany
Keiichi Nashimoto Japan
M. Hoshino Japan
D.L. Feucht relative to Y. Ohmura Japan Y. Ohmura's profile →
Citations per field
00.5×
Y. Ohmura · 1×
Citations per year

Countries citing papers authored by D.L. Feucht

Since Specialization
Citations

This map shows the geographic impact of D.L. Feucht's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by D.L. Feucht with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites D.L. Feucht more than expected).

Fields of papers citing papers by D.L. Feucht

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by D.L. Feucht. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by D.L. Feucht. The network helps show where D.L. Feucht may publish in the future.

Co-authorship network

The 9 scholars most cited alongside D.L. Feucht, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with D.L. Feucht Line = papers co-authored together D.L. Feucht links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown
#Work
1 19786
2 197743
3 197723
4 19779
5 197613
6
Peeled film technology for solar cells
19751
7 197315
8 197110
9 197026
10 19701
11 19706
12 196710
13 19669
14 1966153
15 19654
16 19651
17 196486
18 19648
19 19641
20 19640

About D.L. Feucht

D.L. Feucht is a scholar working on Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering, Surfaces, Coatings and Films, Biomedical Engineering and Ceramics and Composites, having authored 31 papers that have together received 737 indexed citations. Recurring topics across this work include Semiconductor Quantum Structures and Devices (13 papers), Semiconductor materials and interfaces (11 papers), Semiconductor materials and devices (8 papers), Silicon and Solar Cell Technologies (5 papers), Electronic Packaging and Soldering Technologies (4 papers), Nanowire Synthesis and Applications (4 papers), Photonic and Optical Devices (3 papers) and Advancements in Semiconductor Devices and Circuit Design (3 papers). The work is most often cited by research in Atomic and Molecular Physics, and Optics (425 citations), Electrical and Electronic Engineering (594 citations), Materials Chemistry (240 citations), Condensed Matter Physics (40 citations) and Surfaces, Coatings and Films (24 citations). D.L. Feucht has collaborated with scholars based in United States and Russia. Frequent co-authors include A. R. Riben, D. A. Holmes, N. Zommer, A. G. Milnes, R. W. Heckel, Sung K. Kang, H. Jacobs, W.G. Oldham and J.P. Donnelly. Their work appears in journals such as IEEE Transactions on Electron Devices, Solid-State Electronics, Applied Physics Letters, Proceedings of the IEEE and Journal of The Electrochemical Society.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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2026