D. Delille

421 total citations
26 papers, 225 citations indexed

About

D. Delille is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Structural Biology. According to data from OpenAlex, D. Delille has authored 26 papers receiving a total of 225 indexed citations (citations by other indexed papers that have themselves been cited), including 23 papers in Electrical and Electronic Engineering, 9 papers in Surfaces, Coatings and Films and 5 papers in Structural Biology. Recurrent topics in D. Delille's work include Semiconductor materials and devices (15 papers), Integrated Circuits and Semiconductor Failure Analysis (14 papers) and Advancements in Semiconductor Devices and Circuit Design (11 papers). D. Delille is often cited by papers focused on Semiconductor materials and devices (15 papers), Integrated Circuits and Semiconductor Failure Analysis (14 papers) and Advancements in Semiconductor Devices and Circuit Design (11 papers). D. Delille collaborates with scholars based in France, Switzerland and Netherlands. D. Delille's co-authors include R. Pantel, Éric Van Cappellen, T. Skotnicki, L.F.Tz. Kwakman, M. Hopstaken, C. Wyon, C. Fenouillet-Béranger, P. Candelier, R. Ranica and A. Villaret and has published in prestigious journals such as Journal of Applied Physics, Applied Surface Science and Thin Solid Films.

In The Last Decade

D. Delille

25 papers receiving 218 citations

Peers

D. Delille

EEE

SCF

AMPO

Anyan Du China

M. Ohkura Japan

James S. Greeneich United States

Mototaka Kamoshida Japan

B. Mizuno Japan

H. Löschner Austria

Shelly Ren United States

R. Beneyton France

C. J. Varker United States

Atsushi Murakoshi Japan

Anyan Du China

D. Delille

179 ×1.0

EEE

70 ×1.8

11 ×0.4

SCF

59 ×2.0

AMPO

41 ×1.5

Citations per year, relative to D. Delille D. Delille (= 1×) peers Anyan Du

Countries citing papers authored by D. Delille

Since Specialization

Citations

This map shows the geographic impact of D. Delille's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by D. Delille with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites D. Delille more than expected).

Fields of papers citing papers by D. Delille

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by D. Delille. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by D. Delille. The network helps show where D. Delille may publish in the future.

Co-authorship network of co-authors of D. Delille

This figure shows the co-authorship network connecting the top 25 collaborators of D. Delille. A scholar is included among the top collaborators of D. Delille based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with D. Delille. D. Delille is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Lecestre, Aurélie, Emmanuel Dubois, A. Villaret, et al.. (2009). Confined and guided catalytic growth of crystalline silicon films on a dielectric substrate. IOP Conference Series Materials Science and Engineering. 6. 12022–12022. 2 indexed citations

Lorut, F. & D. Delille. (2008). 3D STEM Tomography Based Failure Analysis of 45 nm CMOS Devices. Proceedings - International Symposium for Testing and Failure Analysis. 30910. 499–504. 1 indexed citations

Clément, L. & D. Delille. (2008). Quantitative Strain Measurement in Sub-45 nm CMOS Transistors by Convergent Beam Electron Diffraction (CBED) at Low Temperature and Nano Beam Diffraction (NBD). Microscopy and Microanalysis. 14(S2). 386–387. 1 indexed citations

Lorut, F. & D. Delille. (2008). Advanced FIB-based sample preparation for 3D characterization of 45nm ICs. Microscopy and Microanalysis. 14(S2). 1002–1003. 3 indexed citations

Wacquez, R., P. Coronel, D. Delille, et al.. (2007). A Breakthrough Electronic Lithography Process Through Si Layer for Self Aligning Gates in Planar Double-Gate Transistors for 32nm Node And Below. 2 indexed citations

Gallon, C., A. Vandooren, F. Bœuf, et al.. (2006). Ultra-Thin Fully Depleted SOI Devices with Thin BOX, Ground Plane and Strained Liner Booster. 99. 17–18. 12 indexed citations

Laugier, F., et al.. (2006). SIMS depth profiling of boron ultra shallow junctions using oblique O2+ beams down to 150eV. Applied Surface Science. 252(19). 7211–7213. 16 indexed citations

Chanemougame, D., S. Monfray, F. Bœuf, et al.. (2005). Performance boost of scaled Si PMOS through novel SiGe stressor for HP CMOS. 180–181. 7 indexed citations

Gosset, L.G., N. Casanova, D. Ney, et al.. (2005). Impact of introducing CuSiN self-aligned barriers in advanced copper interconnects. Microelectronic Engineering. 82(3-4). 587–593. 19 indexed citations

10.

Gallon, C., N. Bresson, S. Cristoloveanu, et al.. (2005). Ultra-thin strained SOI substrate analysis by pseudo-MOS measurements. Microelectronic Engineering. 80. 241–244. 4 indexed citations

11.

Gallon, C., C. Fenouillet-Béranger, Y. M. Meziani, et al.. (2005). New magnetoresistance method for mobility extraction in scaled fully-depleted SOI devices. 24. 153–155. 4 indexed citations

12.

Monfray, S., D. Chanemougame, S. Borel, et al.. (2005). SON (silicon-on-nothing) technological CMOS platform: highly performant devices and SRAM cells. 635–638. 17 indexed citations

13.

Coronel, P., S. Harrison, A. Cros, et al.. (2005). Metal gate-all-around CMOS integration using poly-gate replacement through contact hole (PRETCH). 203–206.

14.

Pouydebasque, A., Markus Müller, F. Bœuf, et al.. (2004). Improved Vt and Ioff characteristics of NMOS transistors featuring ultra-shallow junctions obtained by plasma doping (PLAD). 35–38. 3 indexed citations

15.

Müller, Markus, S. Duguay, B. Guillaumot, et al.. (2004). Towards a better EOT - mobility trade-off in high-k oxide/metal gate CMOS devices. 367–370. 4 indexed citations

16.

Pantel, R., D. Delille, D. Dutartre, et al.. (2003). Inelastic electron scattering observation using energy filtered transmission electron microscopy for silicon–germanium nanostructures imaging. Micron. 34(3-5). 239–247. 6 indexed citations

17.

Delille, D., R. Pantel, G. Vincent, & Éric Van Cappellen. (2002). Convergent beam electron diffraction extinction distance measurements for quantitative analysis of Si1−xGex. Ultramicroscopy. 93(1). 1–9. 2 indexed citations

18.

Delille, D., R. Pantel, & Éric Van Cappellen. (2001). Crystal thickness and extinction distance determination using energy filtered CBED pattern intensity measurement and dynamical diffraction theory fitting. Ultramicroscopy. 87(1-2). 5–18. 38 indexed citations

19.

Pantel, R., E. Søndergård, D. Delille, & L.F.Tz. Kwakman. (2001). Quantitative Thickness Measurements of Thin Oxides Using Low Energy Loss Filtered TEM Imaging. Microscopy and Microanalysis. 7(S2). 560–561. 2 indexed citations

20.

Delille, D., R. Pantel, G. Auvert, & Éric Van Cappellen. (1999). Thickness Measurement of Focused Ion Beam Thinned Silicon Crystals Using Convergent Beam.Electron Diffraction and Electron Energy Loss Spectroscopy.. Microscopy and Microanalysis. 5(S2). 898–899. 5 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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