Christopher J. Raymond

511 total citations
34 papers, 396 citations indexed

About

Christopher J. Raymond is a scholar working on Surfaces, Coatings and Films, Computational Mechanics and Electrical and Electronic Engineering. According to data from OpenAlex, Christopher J. Raymond has authored 34 papers receiving a total of 396 indexed citations (citations by other indexed papers that have themselves been cited), including 25 papers in Surfaces, Coatings and Films, 18 papers in Computational Mechanics and 17 papers in Electrical and Electronic Engineering. Recurrent topics in Christopher J. Raymond's work include Optical Coatings and Gratings (25 papers), Surface Roughness and Optical Measurements (18 papers) and Advanced Surface Polishing Techniques (8 papers). Christopher J. Raymond is often cited by papers focused on Optical Coatings and Gratings (25 papers), Surface Roughness and Optical Measurements (18 papers) and Advanced Surface Polishing Techniques (8 papers). Christopher J. Raymond collaborates with scholars based in United States, Pakistan and South Korea. Christopher J. Raymond's co-authors include John R. McNeil, Simon Ward, Christopher R. Dockery, Babar K. Minhas, John A. Allgair, Annemarie Hennessy, Judith A. Whitworth, John F. Thompson, Baek Youn and John S. Horvath and has published in prestigious journals such as Combustion Science and Technology, Clinical and Experimental Pharmacology and Physiology and Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena.

In The Last Decade

Christopher J. Raymond

30 papers receiving 361 citations

Peers

Christopher J. Raymond
Pei-yang Yan United States
Florian Fournier United States
Thomas V. Pistor United States
Pei-yang Yan United States
Christopher J. Raymond
Citations per year, relative to Christopher J. Raymond Christopher J. Raymond (= 1×) peers Pei-yang Yan

Countries citing papers authored by Christopher J. Raymond

Since Specialization
Citations

This map shows the geographic impact of Christopher J. Raymond's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Christopher J. Raymond with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Christopher J. Raymond more than expected).

Fields of papers citing papers by Christopher J. Raymond

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Christopher J. Raymond. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Christopher J. Raymond. The network helps show where Christopher J. Raymond may publish in the future.

Co-authorship network of co-authors of Christopher J. Raymond

This figure shows the co-authorship network connecting the top 25 collaborators of Christopher J. Raymond. A scholar is included among the top collaborators of Christopher J. Raymond based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Christopher J. Raymond. Christopher J. Raymond is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Raymond, Christopher J., et al.. (2006). Dome scatterometry for the measurement of advanced geometry semiconductor devices. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6152. 61521I–61521I. 1 indexed citations
2.
Raymond, Christopher J., et al.. (2006). Back end of line metrology control applications using scatterometry. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6152. 61521X–61521X. 2 indexed citations
3.
Dost, R., et al.. (2005). Metrology of deep trench etched memory structures using 3D scatterometry. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5752. 559–559. 7 indexed citations
4.
Raymond, Christopher J.. (2005). Overview Of Scatterometry Applications In High Volume Silicon Manufacturing. AIP conference proceedings. 788. 394–402. 59 indexed citations
5.
Raymond, Christopher J., et al.. (2004). Comparison of solutions to the scatterometry inverse problem. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5375. 564–564. 34 indexed citations
6.
Kim, Seong‐Jin, et al.. (2004). Successful application of angular scatterometry to process control in sub-100-nm DRAM device. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5375. 541–541. 3 indexed citations
7.
Raymond, Christopher J., et al.. (2003). Applications of angular scatterometry for the measurement of multiply periodic features. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5038. 577–577. 6 indexed citations
8.
Wang, Chang‐An, et al.. (2003). Scatterometer-based scanner fingerprinting technique(ScatterLith) and its applications in image field and ACLV analysis. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5040. 541–541.
9.
Raymond, Christopher J., et al.. (2002). Novel implementations of scatterometry for lithography process control. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4689. 506–506. 4 indexed citations
10.
Raymond, Christopher J., et al.. (2001). Scatterometry for shallow trench isolation (STI) process metrology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4344. 716–716. 8 indexed citations
11.
Kostoulas, Y. & Christopher J. Raymond. (2001). Scatterometry for Lithography Process Control and Characterization in IC Manufacturing. MRS Proceedings. 692. 1 indexed citations
12.
Raymond, Christopher J., et al.. (2000). <title>Scatterometry for the measurement of metal features</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3998. 135–146. 2 indexed citations
13.
McNeil, John R., et al.. (1998). <title>Application of optical scatterometry to microelectronics and flat panel display processing</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3426. 202–212. 1 indexed citations
14.
Raymond, Christopher J., et al.. (1997). Multiparameter grating metrology using optical scatterometry. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 15(2). 361–368. 90 indexed citations
15.
Raymond, Christopher J., et al.. (1996). <title>Multiparameter CD measurements using scatterometry</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2725. 698–709. 10 indexed citations
16.
Raymond, Christopher J., et al.. (1995). <title>Subwavelength photoresist grating metrology using scatterometry</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2532. 251–261. 2 indexed citations
17.
Raymond, Christopher J., et al.. (1995). Metrology of subwavelength photoresist gratings using optical scatterometry. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 13(4). 1484–1495. 63 indexed citations
18.
Raymond, Christopher J., et al.. (1995). Scatterometry for 0.24- to 0.70-μm developed photoresist metrology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2439. 427–427. 6 indexed citations
19.
Hennessy, Annemarie, Judith A. Whitworth, Christopher J. Raymond, et al.. (1994). HAEMODYNAMIC ACTIONS OF A NITRIC OXIDE (EDRF) SYNTHESIS INHIBITOR IN CONSCIOUS BABOONS (Papio hamadryas). Clinical and Experimental Pharmacology and Physiology. 21(9). 695–700. 5 indexed citations
20.
Raymond, Christopher J., et al.. (1994). <title>Developed photoresist metrology using scatterometry</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2196. 47–59. 7 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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