Chaohui He
Impact in
- Inorganic Chemistry top 5%
- Radioactive element chemistry and processing
- Hardware and Architecture top 5%
Papers in
-
- VLSI and Analog Circuit Testing 19
-
- Radiation Effects in Electronics 70
- Semiconductor materials and devices 36
- Integrated Circuits and Semiconductor Failure Analysis 32
- Advancements in Semiconductor Devices and Circuit Design 20
- Electrostatic Discharge in Electronics 19
- Journals
- Microelectronics Reliability (20 papers)IEEE Transactions on Nuclear Science (11 papers)Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms (10 papers)Journal of Radioanalytical and Nuclear Chemistry (9 papers)Journal of Nuclear Materials (7 papers)
- Partner nations
- ChinaItalyUnited States
In The Last Decade
Chaohui He
137 papers receiving 1.6k citations
Peers
Comparison fields: 5 of 75
- Inorganic Chemistry 405
- Hardware and Architecture 131
- Industrial and Manufacturing Engineering 153
- Radiological and Ultrasound Technology 82
- Materials Chemistry 656
Countries citing papers authored by Chaohui He
This map shows the geographic impact of Chaohui He's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Chaohui He with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Chaohui He more than expected).
Fields of papers citing papers by Chaohui He
This network shows the impact of papers produced by Chaohui He. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Chaohui He. The network helps show where Chaohui He may publish in the future.
Co-authorship network
The 25 scholars most cited alongside Chaohui He, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2025 | 14 | |
| 2 | 2024 | 1 | |
| 3 | 2024 | 0 | |
| 4 | 2024 | 11 | |
| 5 | 2024 | 1 | |
| 6 | 2023 | 3 | |
| 7 | 2023 | 1 | |
| 8 | 2023 | 25 | |
| 9 | 2023 | 0 | |
| 10 | 2023 | 2 | |
| 11 | 2023 | 0 | |
| 12 | 2022 | 4 | |
| 13 | 2022 | 1 | |
| 14 | 2021 | 4 | |
| 15 | 2020 | 13 | |
| 16 | 2019 | 22 | |
| 17 | 2018 | 1 | |
| 18 | 2016 | 41 | |
| 19 | 2012 | 24 | |
| 20 | 2011 | 23 |
About Chaohui He
Chaohui He is a scholar working on Hardware and Architecture, Electrical and Electronic Engineering, Radiation, Radiological and Ultrasound Technology and Ceramics and Composites, having authored 151 papers that have together received 1.7k indexed citations. Recurring topics across this work include Radiation Effects in Electronics (70 papers), Semiconductor materials and devices (36 papers), Integrated Circuits and Semiconductor Failure Analysis (32 papers), Advancements in Semiconductor Devices and Circuit Design (20 papers), Electrostatic Discharge in Electronics (19 papers), VLSI and Analog Circuit Testing (19 papers), Ion-surface interactions and analysis (14 papers) and Radioactive element chemistry and processing (13 papers). The work is most often cited by research in Inorganic Chemistry (405 citations), Hardware and Architecture (131 citations), Industrial and Manufacturing Engineering (153 citations), Radiological and Ultrasound Technology (82 citations) and Materials Chemistry (656 citations). Chaohui He has collaborated with scholars based in China, Italy and United States. Frequent co-authors include Yaolin Zhao, Pengfei Zong, Hai Wang, Hui Pan, Wei‐Qun Shi, Peng Zhang, Hang Zang, Yonghong Li, Tao Bo and Huan He. Their work appears in journals such as Microelectronics Reliability, IEEE Transactions on Nuclear Science, Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms, Journal of Radioanalytical and Nuclear Chemistry and Journal of Nuclear Materials.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.