C. W. Hatfield

533 citations
13 papers · 443 indexed · h-index 8

Impact in

Papers in

C. W. Hatfield

13 papers receiving 417 citations

Peers

C. W. Hatfield
Comparison fields: 5 of 24
  • Materials Chemistry 404
  • Mechanics of Materials 208
  • Electrical and Electronic Engineering 255
  • Atomic and Molecular Physics, and Optics 95
  • Geophysics 29
Replace Hui Jin Looi with:
Hui Jin Looi United Kingdom
Hideo Kiyota Japan
M. Kubovič Germany
Alexandre Fiori France
M. Schwitters United Kingdom
Naoshi Sakuma Japan
P. Southworth United Kingdom
Jae Yeob Shim South Korea
T.H. Borst Germany
Tetsuro Maki Japan
C. W. Hatfield relative to Hui Jin Looi United Kingdom Hui Jin Looi's profile →
Citations per field
00.5×
Hui Jin Looi · 1×
Citations per year

Countries citing papers authored by C. W. Hatfield

Since Specialization
Citations

This map shows the geographic impact of C. W. Hatfield's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by C. W. Hatfield with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites C. W. Hatfield more than expected).

Fields of papers citing papers by C. W. Hatfield

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by C. W. Hatfield. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by C. W. Hatfield. The network helps show where C. W. Hatfield may publish in the future.

Co-authors

The 16 scholars most cited alongside C. W. Hatfield, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with C. W. Hatfield Line = papers co-authored together C. W. Hatfield links everyone, so they are left out of the graph.

All Works

13 of 13 papers shown
#Work
1
SOI: Is it the Solution to Commercial Product SEU Sensitivity?
20034
2 19996
3 19991
4 199811
5 19961
6 19932
7 199182
8 199146
9 199027
10 199055
11 1990168
12 199029
13 198911

About C. W. Hatfield

C. W. Hatfield is a scholar working on Mechanics of Materials, Materials Chemistry, Condensed Matter Physics, Atomic and Molecular Physics, and Optics and Electrical and Electronic Engineering, having authored 13 papers that have together received 443 indexed citations. Recurring topics across this work include Diamond and Carbon-based Materials Research (8 papers), Semiconductor materials and devices (5 papers), Metal and Thin Film Mechanics (5 papers), Force Microscopy Techniques and Applications (3 papers), Advanced Surface Polishing Techniques (2 papers), Silicon Carbide Semiconductor Technologies (2 papers), GaN-based semiconductor devices and materials (2 papers) and Gyrotron and Vacuum Electronics Research (1 paper). The work is most often cited by research in Materials Chemistry (404 citations), Mechanics of Materials (208 citations), Electrical and Electronic Engineering (255 citations), Atomic and Molecular Physics, and Optics (95 citations) and Geophysics (29 citations). C. W. Hatfield has collaborated with scholars based in United States. Frequent co-authors include Stephen Grot, G. Gildenblat, Andrzej Badzian, T. Badzian, R. Messier, C. R. Wroński, Griff L. Bilbro, John W. Palmour, Scott T. Allen and S. Lee. Their work appears in journals such as IEEE Electron Device Letters, Journal of materials research/Pratt's guide to venture capital sources, Solid-State Electronics, Applied Physics Letters and Materials Research Bulletin.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Rankless by CCL
2026