Bas Ketelaars

1.3k total citations · 1 hit paper
5 papers, 946 citations indexed

About

Bas Ketelaars is a scholar working on Electrical and Electronic Engineering, Radiation and Surfaces, Coatings and Films. According to data from OpenAlex, Bas Ketelaars has authored 5 papers receiving a total of 946 indexed citations (citations by other indexed papers that have themselves been cited), including 3 papers in Electrical and Electronic Engineering, 2 papers in Radiation and 1 paper in Surfaces, Coatings and Films. Recurrent topics in Bas Ketelaars's work include Advanced X-ray Imaging Techniques (2 papers), Plasma Diagnostics and Applications (1 paper) and Advancements in Photolithography Techniques (1 paper). Bas Ketelaars is often cited by papers focused on Advanced X-ray Imaging Techniques (2 papers), Plasma Diagnostics and Applications (1 paper) and Advancements in Photolithography Techniques (1 paper). Bas Ketelaars collaborates with scholars based in Netherlands, Finland and United States. Bas Ketelaars's co-authors include R.A.M. Wolters, M.H.R. Lankhorst, F.C.M.J.M. van Delft, Steve Smout, N. N. Iosad, M. Kroon, Thomas Krist, Stefan Rehbein, Kevin Hofhuis and Andréy Sokolov and has published in prestigious journals such as Nature Materials, Applied Physics Letters and Review of Scientific Instruments.

In The Last Decade

Bas Ketelaars

3 papers receiving 924 citations

Hit Papers

align trajectories

What are hit papers?

Hit papers significantly outperform the citation benchmark for their cohort. A paper qualifies if it has ≥500 total citations, achieves ≥1.5× the top-1% citation threshold for papers in the same subfield and year (this is the minimum needed to enter the top 1%, not the average within it), or reaches the top citation threshold in at least one of its specific research topics.

Low-cost and nanoscale non-volatile memory concept for future silicon chips

2005 941 citations M.H.R. Lankhorst, Bas Ketelaars et al. Nature Materials profile →

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
Bas Ketelaars Netherlands	3	824	768	217	202	186	5	946
T. H. Lee United Kingdom	8	849 1.0×	725 0.9×	177 0.8×	226 1.1×	204 1.1×	11	1.0k
P. Merkelbach Germany	5	920 1.1×	783 1.0×	198 0.9×	206 1.0×	174 0.9×	5	1000
Kun Ren China	22	1.2k 1.5×	1.2k 1.5×	377 1.7×	298 1.5×	253 1.4×	68	1.4k
Hideki Horii South Korea	20	1.0k 1.3×	961 1.3×	197 0.9×	244 1.2×	194 1.0×	40	1.2k
W. J. Wang Singapore	6	635 0.8×	572 0.7×	152 0.7×	210 1.0×	170 0.9×	15	799
Gunnar Bruns Germany	6	632 0.8×	586 0.8×	185 0.9×	138 0.7×	89 0.5×	8	731
Yegang Lü China	17	724 0.9×	709 0.9×	197 0.9×	129 0.6×	157 0.8×	72	868
Peter Jost Germany	11	802 1.0×	674 0.9×	168 0.8×	149 0.7×	152 0.8×	13	911
C. Sabbione France	17	605 0.7×	626 0.8×	133 0.6×	106 0.5×	124 0.7×	46	731
Xiaoqin Zhu China	18	919 1.1×	870 1.1×	349 1.6×	264 1.3×	214 1.2×	114	1.1k

Countries citing papers authored by Bas Ketelaars

Since Specialization

Citations

This map shows the geographic impact of Bas Ketelaars's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Bas Ketelaars with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Bas Ketelaars more than expected).

Fields of papers citing papers by Bas Ketelaars

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Bas Ketelaars. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Bas Ketelaars. The network helps show where Bas Ketelaars may publish in the future.

Co-authorship network of co-authors of Bas Ketelaars

This figure shows the co-authorship network connecting the top 25 collaborators of Bas Ketelaars. A scholar is included among the top collaborators of Bas Ketelaars based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Bas Ketelaars. Bas Ketelaars is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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5 of 5 papers shown

1.

Sokolov, Andréy, Stefan Rehbein, Bas Ketelaars, et al.. (2025). Invited Article: High-quality blazed gratings through synergy between e-beam lithography and robust characterization techniques. Review of Scientific Instruments. 96(12).

2.

Hofhuis, Kevin, Konstantins Jefimovs, Frank Siewert, et al.. (2025). Advanced electron beam lithography strategies for fabrication of high-precision VLS x-ray gratings. Review of Scientific Instruments. 96(12).

3.

Ketelaars, Bas, et al.. (2011). Nanoimprinted lithography high performance in-plane organic diodes. Applied Physics Letters. 99(17). 3 indexed citations

4.

Lankhorst, M.H.R., Bas Ketelaars, & R.A.M. Wolters. (2005). Low-cost and nanoscale non-volatile memory concept for future silicon chips. Nature Materials. 4(4). 347–352. 941 indexed citations breakdown →

5.

Kroon, M., F.C.M.J.M. van Delft, & Bas Ketelaars. (2002). Manufacturing sub-50-nm gratings using E-beam lithography and electroplating. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4688. 922–922. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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