Antti Rahtu

3.7k total citations · 1 hit paper
31 papers, 3.2k citations indexed

About

Antti Rahtu is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Antti Rahtu has authored 31 papers receiving a total of 3.2k indexed citations (citations by other indexed papers that have themselves been cited), including 30 papers in Electrical and Electronic Engineering, 26 papers in Materials Chemistry and 5 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Antti Rahtu's work include Semiconductor materials and devices (27 papers), Electronic and Structural Properties of Oxides (22 papers) and Catalytic Processes in Materials Science (17 papers). Antti Rahtu is often cited by papers focused on Semiconductor materials and devices (27 papers), Electronic and Structural Properties of Oxides (22 papers) and Catalytic Processes in Materials Science (17 papers). Antti Rahtu collaborates with scholars based in Finland, United States and Estonia. Antti Rahtu's co-authors include Mikko Ritala, Roy G. Gordon, Booyong S. Lim, Markku Leskelä, Timo Sajavaara, Kaupo Kukli, Raija Matero, Zhengwen Li, Jin‐Seong Park and Petri I. Räisänen and has published in prestigious journals such as Science, Nature Materials and Applied Physics Letters.

In The Last Decade

Antti Rahtu

31 papers receiving 3.1k citations

Hit Papers

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What are hit papers?

Hit papers significantly outperform the citation benchmark for their cohort. A paper qualifies if it has ≥500 total citations, achieves ≥1.5× the top-1% citation threshold for papers in the same subfield and year (this is the minimum needed to enter the top 1%, not the average within it), or reaches the top citation threshold in at least one of its specific research topics.

Atomic layer deposition of transition metals

2003 547 citations Booyong S. Lim, Antti Rahtu et al. Nature Materials profile →

Peers

Countries citing papers authored by Antti Rahtu

Since Specialization

Citations

This map shows the geographic impact of Antti Rahtu's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Antti Rahtu with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Antti Rahtu more than expected).

Fields of papers citing papers by Antti Rahtu

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Antti Rahtu. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Antti Rahtu. The network helps show where Antti Rahtu may publish in the future.

Co-authorship network of co-authors of Antti Rahtu

This figure shows the co-authorship network connecting the top 25 collaborators of Antti Rahtu. A scholar is included among the top collaborators of Antti Rahtu based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Antti Rahtu. Antti Rahtu is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Reaction Mechanism Studies on Atomic Layer Deposition of Nb₂O₅ from Nb(OEt)₅ and Water 2009 ·Langmuir ·Kjell Knapas, Antti Rahtu, Mikko Ritala	14
2	Etching of Nb₂O₅ Thin Films by NbCl₅ 2009 ·Chemical Vapor Deposition ·Kjell Knapas, Antti Rahtu, Mikko Ritala	26
3	Atomic Layer Deposition of Ultrathin Copper Metal Films from a Liquid Copper(I) Amidinate Precursor 2006 ·Journal of The Electrochemical Society ·Zhengwen Li, Antti Rahtu, Roy G. Gordon	194
4	In Situ Reaction Mechanism Studies on the Atomic Layer Deposition of Al₂O₃ from (CH₃)₂AlCl and Water 2005 ·Langmuir ·Raija Matero, Antti Rahtu, Mikko Ritala	22
5	Recent developments in the MOCVD and ALD of rare earth oxides and silicates 2005 ·Materials Science and Engineering B ·Anthony C. Jones, Helen C. Aspinall, Paul R. Chalker, Richard J. Potter, Kaupo Kukli, Antti Rahtu, Mikko Ritala, Markku Leskelä	51
6	Atomic layer deposition of lanthanum aluminum oxide nano-laminates for electrical applications 2004 ·Applied Physics Letters ·Booyong S. Lim, Antti Rahtu, Philippe de Rouffignac, Roy G. Gordon	79
7	Some recent developments in the MOCVD and ALD of high-κ dielectric oxides 2004 ·Journal of Materials Chemistry ·Anthony C. Jones, Helen C. Aspinall, Paul R. Chalker, Richard J. Potter, Kaupo Kukli, Antti Rahtu, Mikko Ritala, Markku Leskelä	70
8	Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films 2004 ·Journal of The Electrochemical Society ·Antti Niskanen, Antti Rahtu, Timo Sajavaara, Kai Arstila, Mikko Ritala, Markku Leskelä	56
9	Atomic layer deposition of transition metals breakdown → 2003 ·Nature Materials ·Booyong S. Lim, Antti Rahtu, Roy G. Gordon	547
10	Reaction Mechanism Studies on Atomic Layer Deposition of Ruthenium and Platinum 2003 ·Electrochemical and Solid-State Letters ·Titta Aaltonen, Antti Rahtu, Mikko Ritala, Markku Leskelä	204
11	Synthesis and Characterization of Volatile, Thermally Stable, Reactive Transition Metal Amidinates 2003 ·Inorganic Chemistry ·Booyong S. Lim, Antti Rahtu, Jin‐Seong Park, Roy G. Gordon	260
12	Atomic Layer Deposition of High Permittivity Oxides: Film Growth and In Situ Studies 2002 ·Työväentutkimus Vuosikirja ·Antti Rahtu	8
13	Reaction Mechanism Studies on the Atomic Layer Deposition of Zr_xTi_yO_z Using the Novel Metal Halide−Metal Alkoxide Approach 2002 ·Langmuir ·Antti Rahtu, Mikko Ritala	16
14	Reaction Mechanism Studies on Titanium Isopropoxide–Water Atomic Layer Deposition Process 2002 ·Chemical Vapor Deposition ·Antti Rahtu, Mikko Ritala	117
15	Reaction mechanism studies on the zirconium chloride–water atomic layer deposition process 2002 ·Journal of Materials Chemistry ·Antti Rahtu, Mikko Ritala	50
16	In situ characterization of atomic layer deposition of SrTiO₃ 2001 ·Journal de Physique IV (Proceedings) ·Antti Rahtu, (unknown), Mikko Ritala	18
17	Atomic Layer Deposition of Zirconium Titanium Oxide from Titanium Isopropoxide and Zirconium Chloride 2001 ·Chemistry of Materials ·Antti Rahtu, Mikko Ritala, Markku Leskelä	33
18	In Situ Mass Spectrometry Study on Surface Reactions in Atomic Layer Deposition of Al₂O₃ Thin Films from Trimethylaluminum and Water 2000 ·Langmuir ·Marika Juppo, Antti Rahtu, Mikko Ritala, Markku Leskelä	102
19	Atomic Layer Deposition of Oxide Thin Films with Metal Alkoxides as Oxygen Sources 2000 ·Science ·Mikko Ritala, Kaupo Kukli, Antti Rahtu, Petri I. Räisänen, Markku Leskelä, Timo Sajavaara, J. Keinonen	416
20	Effect of water dose on the atomic layer deposition rate of oxide thin films 2000 ·Thin Solid Films ·Raija Matero, Antti Rahtu, Mikko Ritala, Markku Leskelä, Timo Sajavaara	231

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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