A. Heft

695 citations
25 papers · 595 indexed · h-index 15

A. Heft

24 papers receiving 585 citations

Peers

A. Heft
Comparison fields: 5 of 53
  • Ceramics and Composites 127
  • Electrical and Electronic Engineering 423
  • Computational Mechanics 124
  • Materials Chemistry 224
  • Surfaces, Coatings and Films 31
Replace Paul R. Ehrmann with:
Paul R. Ehrmann United States
M. A. Fardad Canada
Xinguang Xu China
G. Zatryb Poland
P. Vitanov Bulgaria
Lu‐Sheng Hong Taiwan
В. И. Нуждин Russia
Din-Guo Chen United States
Ann Rose Abraham India
G. Beshkov Bulgaria
A. Heft relative to Paul R. Ehrmann United States Paul R. Ehrmann's profile →
Citations per field
00.5×1.5×2.1×
Paul R. Ehrmann · 1×
Citations per year

Countries citing papers authored by A. Heft

Since Specialization
Citations

This map shows the geographic impact of A. Heft's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by A. Heft with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites A. Heft more than expected).

Fields of papers citing papers by A. Heft

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by A. Heft. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by A. Heft. The network helps show where A. Heft may publish in the future.

Co-authorship network

The 25 scholars most cited alongside A. Heft, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with A. Heft Line = papers co-authored together A. Heft links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown
#Work
1 20191
2 20193
3 201813
4 20148
5 20134
6 20133
7 201221
8 201122
9 201127
10 201116
11 201017
12 20090
13 200714
14 199911
15 199814
16 199719
17 199626
18 199636
19 199538
20 199539

About A. Heft

A. Heft is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering and Materials Chemistry, having authored 25 papers that have together received 595 indexed citations. Recurring topics across this work include Semiconductor materials and devices (9 papers), ZnO doping and properties (7 papers), Silicon Carbide Semiconductor Technologies (7 papers), Gas Sensing Nanomaterials and Sensors (4 papers), Thin-Film Transistor Technologies (4 papers), Integrated Circuits and Semiconductor Failure Analysis (4 papers), Copper-based nanomaterials and applications (3 papers) and Catalytic Processes in Materials Science (3 papers). The work is most often cited by research in Ceramics and Composites (127 citations), Electrical and Electronic Engineering (423 citations) and Computational Mechanics (124 citations). A. Heft has collaborated with scholars based in Germany, Slovakia and Italy. Frequent co-authors include W. Wesch, E. Wendler, T. Bachmann, E. Glaser, Andreas Pfuch, H. P. Strunk, J. Heindl, K.-D. Lang, A. Schimanski and Heinrich Lang. Their work appears in journals such as Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms, Surface and Coatings Technology, Thin Solid Films, RSC Advances and Solar Energy Materials and Solar Cells.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Rankless by CCL
2026