Standout Papers

Thermal stability and electrical characteristics of ultrathin hafnium oxide gate dielectric re... 2000 2026 2008 2017 503
  1. Thermal stability and electrical characteristics of ultrathin hafnium oxide gate dielectric reoxidized with rapid thermal annealing (2000)
    Byoung Hun Lee, Laegu Kang et al. Applied Physics Letters

Immediate Impact

10 from Science/Nature 62 standout
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Works of R. Nieh being referenced

Thermal stability and electrical characteristics of ultrathin hafnium oxide gate dielectric reoxidized with rapid thermal annealing
2000 Standout

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Author Last Decade Papers Cites
R. Nieh 1667 200 711 201 22 1.7k
K. Xiong 1333 201 1081 249 38 1.7k
R. Wendt 906 137 1004 208 27 1.2k
G. R. Gruzalski 1056 222 463 212 29 1.5k
Jill Becker 1022 155 801 226 23 1.3k
V. V. Afanas’ev 1211 501 850 145 47 1.6k
Chang Seok Kang 1507 149 825 200 50 1.8k
T. Sorsch 1318 243 701 157 29 1.5k
H.‐H. Tseng 1293 384 394 109 35 1.4k
Hag‐Ju Cho 1048 84 876 167 30 1.3k
P. Soininen 952 73 843 219 27 1.2k

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