Immediate Impact

16 standout
Sub-graph 1 of 8

Citing Papers

A concise review of the Raman spectra of carbon allotropes
2022 Standout
Conformality in atomic layer deposition: Current status overview of analysis and modelling
2019 Standout
2 intermediate papers

Works of J. W. Shon being referenced

Ultrahigh Selective Etching of SiO[sub 2] Using an Amorphous Carbon Mask in Dual-Frequency Capacitively Coupled C[sub 4]F[sub 8]/CH[sub 2]F[sub 2]/O[sub 2]/Ar Plasmas
2010
Highly selective etching of silicon nitride to physical-vapor-deposited a-C mask in dual-frequency capacitively coupled CH2F2∕H2 plasmas
2009

Author Peers

Author Last Decade Papers Cites
J. W. Shon 572 110 253 126 18 602
Sumio Ashida 461 153 217 134 22 517
Alex Paterson 505 98 199 95 22 532
B. P. Aragon 518 86 275 91 12 561
Ken Collins 601 74 287 163 29 614
G. Sauvé 479 109 120 212 15 562
Edward V. Barnat 414 285 173 135 27 660
Min-Hyong Lee 653 92 372 99 21 686
S. Banna 562 197 232 55 34 686
Yukinobu Hikosaka 659 258 237 129 27 717
C. B. Fleddermann 388 129 93 46 33 514

All Works

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Rankless by CCL
2026